JPS6346839U - - Google Patents
Info
- Publication number
- JPS6346839U JPS6346839U JP14050586U JP14050586U JPS6346839U JP S6346839 U JPS6346839 U JP S6346839U JP 14050586 U JP14050586 U JP 14050586U JP 14050586 U JP14050586 U JP 14050586U JP S6346839 U JPS6346839 U JP S6346839U
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- electrode
- generating
- parallel
- magnetic field
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims description 4
- 238000001312 dry etching Methods 0.000 claims description 3
- 238000005530 etching Methods 0.000 claims 2
- 230000005684 electric field Effects 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
Landscapes
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14050586U JPS6346839U (de) | 1986-09-16 | 1986-09-16 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14050586U JPS6346839U (de) | 1986-09-16 | 1986-09-16 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6346839U true JPS6346839U (de) | 1988-03-30 |
Family
ID=31047415
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14050586U Pending JPS6346839U (de) | 1986-09-16 | 1986-09-16 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6346839U (de) |
-
1986
- 1986-09-16 JP JP14050586U patent/JPS6346839U/ja active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS6346839U (de) | ||
| JPS63153525U (de) | ||
| JPH02312231A (ja) | ドライエッチング装置 | |
| JPS6339253Y2 (de) | ||
| JPS6274332U (de) | ||
| JP2575935Y2 (ja) | ドライエッチング装置 | |
| JPS60122362U (ja) | プラズマエツチング装置 | |
| JPH0242427U (de) | ||
| JPH01111333A (ja) | ドライエッチング装置 | |
| JPS61190132U (de) | ||
| JPS62193660U (de) | ||
| JPH0281037U (de) | ||
| JPS6188236U (de) | ||
| JPH0247030U (de) | ||
| JPH0410998U (de) | ||
| JPS58151666U (ja) | プラズマ・エツチング装置 | |
| JPS61138249U (de) | ||
| JPS6255564U (de) | ||
| JPS6127334U (ja) | ドライエツチング装置 | |
| JPS61171129A (ja) | 半導体製造装置 | |
| JPH0451473Y2 (de) | ||
| JPS6214724U (de) | ||
| JPS60181027U (ja) | 反応性イオンエツチング装置 | |
| JPS6366910B2 (de) | ||
| JPS58154554U (ja) | 高周波イオン源 |