JPS62193660U - - Google Patents
Info
- Publication number
- JPS62193660U JPS62193660U JP8097186U JP8097186U JPS62193660U JP S62193660 U JPS62193660 U JP S62193660U JP 8097186 U JP8097186 U JP 8097186U JP 8097186 U JP8097186 U JP 8097186U JP S62193660 U JPS62193660 U JP S62193660U
- Authority
- JP
- Japan
- Prior art keywords
- plasma
- expansion chamber
- ion source
- plasma generation
- chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000003058 plasma substitute Substances 0.000 claims description 4
- 238000010586 diagram Methods 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
Landscapes
- Electron Sources, Ion Sources (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8097186U JPS62193660U (de) | 1986-05-30 | 1986-05-30 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8097186U JPS62193660U (de) | 1986-05-30 | 1986-05-30 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS62193660U true JPS62193660U (de) | 1987-12-09 |
Family
ID=30932273
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8097186U Pending JPS62193660U (de) | 1986-05-30 | 1986-05-30 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62193660U (de) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0340342A (ja) * | 1989-07-06 | 1991-02-21 | Akira Oota | イオンビーム照射装置 |
JPH03215665A (ja) * | 1990-01-19 | 1991-09-20 | Hitachi Ltd | イオン源 |
-
1986
- 1986-05-30 JP JP8097186U patent/JPS62193660U/ja active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0340342A (ja) * | 1989-07-06 | 1991-02-21 | Akira Oota | イオンビーム照射装置 |
JPH03215665A (ja) * | 1990-01-19 | 1991-09-20 | Hitachi Ltd | イオン源 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP2002088472A5 (de) | ||
JPH0669026B2 (ja) | 半導体処理装置 | |
JPS62193660U (de) | ||
JPS62169776U (de) | ||
JPH0241584B2 (de) | ||
JPH02129650U (de) | ||
JPS6339253Y2 (de) | ||
JP2531052Y2 (ja) | マグネトロンスパッタ装置 | |
JPS63112745U (de) | ||
JPH079335Y2 (ja) | 放電トリガ− | |
JPS6361748U (de) | ||
JPH0176033U (de) | ||
JP2514830Y2 (ja) | マグネトロンスパッタ装置 | |
JPS63171954U (de) | ||
JPH0394753U (de) | ||
JPH0339882Y2 (de) | ||
JPS63143799A (ja) | 高速原子線源 | |
JPS6375936U (de) | ||
JPH0410998U (de) | ||
JPH0650109B2 (ja) | Rf型イオン源 | |
JPS63200334U (de) | ||
JPS6274332U (de) | ||
JPH0197549U (de) | ||
JPH0295148U (de) | ||
JPS6422029A (en) | Plasma etching system |