JPS6339667B2 - - Google Patents
Info
- Publication number
- JPS6339667B2 JPS6339667B2 JP59015731A JP1573184A JPS6339667B2 JP S6339667 B2 JPS6339667 B2 JP S6339667B2 JP 59015731 A JP59015731 A JP 59015731A JP 1573184 A JP1573184 A JP 1573184A JP S6339667 B2 JPS6339667 B2 JP S6339667B2
- Authority
- JP
- Japan
- Prior art keywords
- ionized
- substrate
- voltage
- vaporized substance
- ionization
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/221—Ion beam deposition
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1573184A JPS60162773A (ja) | 1984-01-31 | 1984-01-31 | イオンビ−ム蒸着装置 |
DE19853502902 DE3502902A1 (de) | 1984-01-31 | 1985-01-29 | Ionenstrahl-aufdampfvorrichtung |
US06/696,518 US4559901A (en) | 1984-01-31 | 1985-01-30 | Ion beam deposition apparatus |
GB08502400A GB2156578B (en) | 1984-01-31 | 1985-01-31 | Vapour deposition apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1573184A JPS60162773A (ja) | 1984-01-31 | 1984-01-31 | イオンビ−ム蒸着装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS60162773A JPS60162773A (ja) | 1985-08-24 |
JPS6339667B2 true JPS6339667B2 (enrdf_load_stackoverflow) | 1988-08-05 |
Family
ID=11896907
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1573184A Granted JPS60162773A (ja) | 1984-01-31 | 1984-01-31 | イオンビ−ム蒸着装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS60162773A (enrdf_load_stackoverflow) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6453751U (enrdf_load_stackoverflow) * | 1987-09-29 | 1989-04-03 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5614498A (en) * | 1979-07-12 | 1981-02-12 | Sekisui Chem Co Ltd | Manufacture of transparent electrically conductive thin film |
JPS5668932A (en) * | 1979-11-07 | 1981-06-09 | Sekisui Chem Co Ltd | Manufacture of magnetic recording medium |
-
1984
- 1984-01-31 JP JP1573184A patent/JPS60162773A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS60162773A (ja) | 1985-08-24 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
LAPS | Cancellation because of no payment of annual fees |