JPS60162773A - イオンビ−ム蒸着装置 - Google Patents

イオンビ−ム蒸着装置

Info

Publication number
JPS60162773A
JPS60162773A JP1573184A JP1573184A JPS60162773A JP S60162773 A JPS60162773 A JP S60162773A JP 1573184 A JP1573184 A JP 1573184A JP 1573184 A JP1573184 A JP 1573184A JP S60162773 A JPS60162773 A JP S60162773A
Authority
JP
Japan
Prior art keywords
substrate
ionized
ion beam
electrode
voltage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1573184A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6339667B2 (enrdf_load_stackoverflow
Inventor
Kiyoshi Morimoto
清 森本
Toshinobu Takagi
俊宜 高木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Futaba Corp
Original Assignee
Futaba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Futaba Corp filed Critical Futaba Corp
Priority to JP1573184A priority Critical patent/JPS60162773A/ja
Priority to DE19853502902 priority patent/DE3502902A1/de
Priority to US06/696,518 priority patent/US4559901A/en
Priority to GB08502400A priority patent/GB2156578B/en
Publication of JPS60162773A publication Critical patent/JPS60162773A/ja
Publication of JPS6339667B2 publication Critical patent/JPS6339667B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/221—Ion beam deposition

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP1573184A 1984-01-31 1984-01-31 イオンビ−ム蒸着装置 Granted JPS60162773A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP1573184A JPS60162773A (ja) 1984-01-31 1984-01-31 イオンビ−ム蒸着装置
DE19853502902 DE3502902A1 (de) 1984-01-31 1985-01-29 Ionenstrahl-aufdampfvorrichtung
US06/696,518 US4559901A (en) 1984-01-31 1985-01-30 Ion beam deposition apparatus
GB08502400A GB2156578B (en) 1984-01-31 1985-01-31 Vapour deposition apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1573184A JPS60162773A (ja) 1984-01-31 1984-01-31 イオンビ−ム蒸着装置

Publications (2)

Publication Number Publication Date
JPS60162773A true JPS60162773A (ja) 1985-08-24
JPS6339667B2 JPS6339667B2 (enrdf_load_stackoverflow) 1988-08-05

Family

ID=11896907

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1573184A Granted JPS60162773A (ja) 1984-01-31 1984-01-31 イオンビ−ム蒸着装置

Country Status (1)

Country Link
JP (1) JPS60162773A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6453751U (enrdf_load_stackoverflow) * 1987-09-29 1989-04-03

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5614498A (en) * 1979-07-12 1981-02-12 Sekisui Chem Co Ltd Manufacture of transparent electrically conductive thin film
JPS5668932A (en) * 1979-11-07 1981-06-09 Sekisui Chem Co Ltd Manufacture of magnetic recording medium

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5614498A (en) * 1979-07-12 1981-02-12 Sekisui Chem Co Ltd Manufacture of transparent electrically conductive thin film
JPS5668932A (en) * 1979-11-07 1981-06-09 Sekisui Chem Co Ltd Manufacture of magnetic recording medium

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6453751U (enrdf_load_stackoverflow) * 1987-09-29 1989-04-03

Also Published As

Publication number Publication date
JPS6339667B2 (enrdf_load_stackoverflow) 1988-08-05

Similar Documents

Publication Publication Date Title
US4559901A (en) Ion beam deposition apparatus
US3786359A (en) Ion accelerator and ion species selector
JPS6353259A (ja) 薄膜形成方法
US4549082A (en) Synthetic plasma ion source
JPS63307263A (ja) 薄膜蒸着装置
IL43509A (en) Wide angle isotope separator
JPS60162773A (ja) イオンビ−ム蒸着装置
JPS63279552A (ja) イオンビ−ム照射装置
JPS62112777A (ja) 薄膜形成装置
JPS61124568A (ja) イオンビ−ムスパツタ装置
JPS60124931A (ja) 薄膜蒸着装置
JPS6272110A (ja) 薄膜形成装置
JPH0215630B2 (enrdf_load_stackoverflow)
JPS6329925A (ja) 化合物薄膜形成装置
JPH0390567A (ja) 薄膜形成装置
JPS63216967A (ja) 薄膜形成装置
JPS63271856A (ja) イオンビ−ム蒸着装置
JPS63179060A (ja) 薄膜形成装置
JPS60124915A (ja) 薄膜蒸着装置
Bakeev Modeling the influence of electric field distribution on the formation of a focused electron beam in the accelerating gap of a forevacuum plasma electron source
JPS5836463B2 (ja) イオン源
JPS61235557A (ja) 薄膜蒸着装置
JPH04165065A (ja) 薄膜形成装置
JPH0689684A (ja) 荷電粒子ビーム装置
JPS6342365A (ja) 薄膜形成装置

Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees