JPS6339110B2 - - Google Patents
Info
- Publication number
- JPS6339110B2 JPS6339110B2 JP58147990A JP14799083A JPS6339110B2 JP S6339110 B2 JPS6339110 B2 JP S6339110B2 JP 58147990 A JP58147990 A JP 58147990A JP 14799083 A JP14799083 A JP 14799083A JP S6339110 B2 JPS6339110 B2 JP S6339110B2
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor layer
- layer
- impurity concentration
- field effect
- effect transistor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/80—FETs having rectifying junction gate electrodes
- H10D30/87—FETs having Schottky gate electrodes, e.g. metal-semiconductor FETs [MESFET]
- H10D30/871—Vertical FETs having Schottky gate electrodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
- H10D62/113—Isolations within a component, i.e. internal isolations
- H10D62/115—Dielectric isolations, e.g. air gaps
- H10D62/116—Dielectric isolations, e.g. air gaps adjoining the input or output regions of field-effect devices, e.g. adjoining source or drain regions
Landscapes
- Junction Field-Effect Transistors (AREA)
- Recrystallisation Techniques (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58147990A JPS6039872A (ja) | 1983-08-15 | 1983-08-15 | 縦型電界効果トランジスタの製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58147990A JPS6039872A (ja) | 1983-08-15 | 1983-08-15 | 縦型電界効果トランジスタの製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6039872A JPS6039872A (ja) | 1985-03-01 |
| JPS6339110B2 true JPS6339110B2 (OSRAM) | 1988-08-03 |
Family
ID=15442660
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58147990A Granted JPS6039872A (ja) | 1983-08-15 | 1983-08-15 | 縦型電界効果トランジスタの製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6039872A (OSRAM) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6226866A (ja) * | 1985-07-26 | 1987-02-04 | エナ−ジ−・コンバ−シヨン・デバイセス・インコ−ポレ−テツド | 二重注入電界効果トランジスタ |
| KR950000158B1 (ko) * | 1992-03-28 | 1995-01-10 | 삼성전자 주식회사 | 듀얼게이트금속반도체전계효과트랜지스터및그제조방법 |
| JP4742399B2 (ja) * | 1999-03-12 | 2011-08-10 | 住友化学株式会社 | 3−5族化合物半導体の製造方法 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2926741C2 (de) * | 1979-07-03 | 1982-09-09 | Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt | Feldeffekt-Transistor und Verfahren zu seiner Herstellung |
-
1983
- 1983-08-15 JP JP58147990A patent/JPS6039872A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6039872A (ja) | 1985-03-01 |
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