JPS6337502B2 - - Google Patents
Info
- Publication number
- JPS6337502B2 JPS6337502B2 JP58015952A JP1595283A JPS6337502B2 JP S6337502 B2 JPS6337502 B2 JP S6337502B2 JP 58015952 A JP58015952 A JP 58015952A JP 1595283 A JP1595283 A JP 1595283A JP S6337502 B2 JPS6337502 B2 JP S6337502B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- nitride film
- polycrystalline silicon
- element region
- silicon film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W10/00—Isolation regions in semiconductor bodies between components of integrated devices
- H10W10/01—Manufacture or treatment
- H10W10/011—Manufacture or treatment of isolation regions comprising dielectric materials
- H10W10/012—Manufacture or treatment of isolation regions comprising dielectric materials using local oxidation of silicon [LOCOS]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W10/00—Isolation regions in semiconductor bodies between components of integrated devices
- H10W10/10—Isolation regions comprising dielectric materials
- H10W10/13—Isolation regions comprising dielectric materials formed using local oxidation of silicon [LOCOS], e.g. sealed interface localised oxidation [SILO] or side-wall mask isolation [SWAMI]
Landscapes
- Element Separation (AREA)
- Local Oxidation Of Silicon (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58015952A JPS59150444A (ja) | 1983-02-02 | 1983-02-02 | 半導体装置の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58015952A JPS59150444A (ja) | 1983-02-02 | 1983-02-02 | 半導体装置の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59150444A JPS59150444A (ja) | 1984-08-28 |
| JPS6337502B2 true JPS6337502B2 (enExample) | 1988-07-26 |
Family
ID=11903082
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58015952A Granted JPS59150444A (ja) | 1983-02-02 | 1983-02-02 | 半導体装置の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59150444A (enExample) |
-
1983
- 1983-02-02 JP JP58015952A patent/JPS59150444A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS59150444A (ja) | 1984-08-28 |
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