JPS633447B2 - - Google Patents
Info
- Publication number
- JPS633447B2 JPS633447B2 JP54089917A JP8991779A JPS633447B2 JP S633447 B2 JPS633447 B2 JP S633447B2 JP 54089917 A JP54089917 A JP 54089917A JP 8991779 A JP8991779 A JP 8991779A JP S633447 B2 JPS633447 B2 JP S633447B2
- Authority
- JP
- Japan
- Prior art keywords
- junction
- layer
- mask
- semiconductor substrate
- deep
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H10P32/14—
Landscapes
- Photovoltaic Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8991779A JPS5615035A (en) | 1979-07-17 | 1979-07-17 | Manufacture of semiconductor device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8991779A JPS5615035A (en) | 1979-07-17 | 1979-07-17 | Manufacture of semiconductor device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5615035A JPS5615035A (en) | 1981-02-13 |
| JPS633447B2 true JPS633447B2 (Direct) | 1988-01-23 |
Family
ID=13984051
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8991779A Granted JPS5615035A (en) | 1979-07-17 | 1979-07-17 | Manufacture of semiconductor device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5615035A (Direct) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57136368A (en) * | 1981-02-17 | 1982-08-23 | Fujitsu Ltd | Manufacture of mis transistor |
| JPS57138157A (en) * | 1981-02-20 | 1982-08-26 | Fujitsu Ltd | Manufacture of semiconductor device |
| US4542580A (en) * | 1983-02-14 | 1985-09-24 | Prime Computer, Inc. | Method of fabricating n-type silicon regions and associated contacts |
| KR100974221B1 (ko) * | 2008-04-17 | 2010-08-06 | 엘지전자 주식회사 | 레이저 어닐링을 이용한 태양전지의 선택적 에미터형성방법 및 이를 이용한 태양전지의 제조방법 |
| KR101037316B1 (ko) * | 2010-09-30 | 2011-05-26 | (유)에스엔티 | 태양전지의 선택적 에미터 형성장치 |
| CN104170095B (zh) * | 2012-03-14 | 2016-10-19 | Imec非营利协会 | 用于制造具有镀敷触点的光伏电池的方法 |
| JP2014072474A (ja) * | 2012-10-01 | 2014-04-21 | Sharp Corp | 光電変換素子の製造方法及び光電変換素子 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4926456A (Direct) * | 1972-07-11 | 1974-03-08 |
-
1979
- 1979-07-17 JP JP8991779A patent/JPS5615035A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5615035A (en) | 1981-02-13 |
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