JPS6334226B2 - - Google Patents
Info
- Publication number
- JPS6334226B2 JPS6334226B2 JP18875985A JP18875985A JPS6334226B2 JP S6334226 B2 JPS6334226 B2 JP S6334226B2 JP 18875985 A JP18875985 A JP 18875985A JP 18875985 A JP18875985 A JP 18875985A JP S6334226 B2 JPS6334226 B2 JP S6334226B2
- Authority
- JP
- Japan
- Prior art keywords
- sputtering
- substrate
- target
- magnetic field
- protrusion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000004544 sputter deposition Methods 0.000 claims description 46
- 239000000758 substrate Substances 0.000 claims description 38
- 230000005291 magnetic effect Effects 0.000 claims description 32
- 239000010409 thin film Substances 0.000 claims description 17
- 239000000463 material Substances 0.000 claims description 5
- 239000010408 film Substances 0.000 description 11
- 238000010586 diagram Methods 0.000 description 7
- 239000013078 crystal Substances 0.000 description 3
- 230000004907 flux Effects 0.000 description 3
- 238000001755 magnetron sputter deposition Methods 0.000 description 3
- BGPVFRJUHWVFKM-UHFFFAOYSA-N N1=C2C=CC=CC2=[N+]([O-])C1(CC1)CCC21N=C1C=CC=CC1=[N+]2[O-] Chemical compound N1=C2C=CC=CC2=[N+]([O-])C1(CC1)CCC21N=C1C=CC=CC1=[N+]2[O-] BGPVFRJUHWVFKM-UHFFFAOYSA-N 0.000 description 2
- 238000002441 X-ray diffraction Methods 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 238000004804 winding Methods 0.000 description 2
- 238000005336 cracking Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005294 ferromagnetic effect Effects 0.000 description 1
- 125000001475 halogen functional group Chemical group 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 230000005426 magnetic field effect Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000013077 target material Substances 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18875985A JPS6247477A (ja) | 1985-08-28 | 1985-08-28 | スパツタリング装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18875985A JPS6247477A (ja) | 1985-08-28 | 1985-08-28 | スパツタリング装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6247477A JPS6247477A (ja) | 1987-03-02 |
| JPS6334226B2 true JPS6334226B2 (enrdf_load_stackoverflow) | 1988-07-08 |
Family
ID=16229272
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18875985A Granted JPS6247477A (ja) | 1985-08-28 | 1985-08-28 | スパツタリング装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6247477A (enrdf_load_stackoverflow) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| MXPA05006762A (es) * | 2002-12-19 | 2005-09-08 | Unaxis Balzers Aktiengesellsch | Fuente de arco al vacio que comprende un dispositivo para generar un campo magnetico. |
| EP2720249B1 (de) * | 2007-04-17 | 2019-07-10 | Oerlikon Surface Solutions AG, Pfäffikon | Lichtbogenverdampfungskammer mit einer Vakuum Lichtbogenverdampfungsquelle |
-
1985
- 1985-08-28 JP JP18875985A patent/JPS6247477A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6247477A (ja) | 1987-03-02 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |