JPS6333660Y2 - - Google Patents
Info
- Publication number
- JPS6333660Y2 JPS6333660Y2 JP1983180830U JP18083083U JPS6333660Y2 JP S6333660 Y2 JPS6333660 Y2 JP S6333660Y2 JP 1983180830 U JP1983180830 U JP 1983180830U JP 18083083 U JP18083083 U JP 18083083U JP S6333660 Y2 JPS6333660 Y2 JP S6333660Y2
- Authority
- JP
- Japan
- Prior art keywords
- rotary chuck
- coated
- cylinder
- spinner device
- distance
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000011248 coating agent Substances 0.000 description 10
- 239000007788 liquid Substances 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- 239000003595 mist Substances 0.000 description 4
- 238000000034 method Methods 0.000 description 3
- 230000002349 favourable effect Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Landscapes
- Coating Apparatus (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18083083U JPS6091282U (ja) | 1983-11-22 | 1983-11-22 | スピナ−装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18083083U JPS6091282U (ja) | 1983-11-22 | 1983-11-22 | スピナ−装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6091282U JPS6091282U (ja) | 1985-06-22 |
JPS6333660Y2 true JPS6333660Y2 (de) | 1988-09-07 |
Family
ID=30391989
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP18083083U Granted JPS6091282U (ja) | 1983-11-22 | 1983-11-22 | スピナ−装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6091282U (de) |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59211226A (ja) * | 1983-05-17 | 1984-11-30 | Nec Kyushu Ltd | 半導体基板のレジスト塗布装置 |
-
1983
- 1983-11-22 JP JP18083083U patent/JPS6091282U/ja active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59211226A (ja) * | 1983-05-17 | 1984-11-30 | Nec Kyushu Ltd | 半導体基板のレジスト塗布装置 |
Also Published As
Publication number | Publication date |
---|---|
JPS6091282U (ja) | 1985-06-22 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US7470344B1 (en) | Chemical dispensing system for semiconductor wafer processing | |
JPH0669545B2 (ja) | 塗布装置 | |
JPS6064436A (ja) | スピンドライヤ | |
JPS6333660Y2 (de) | ||
JPH0512990B2 (de) | ||
JP3574790B2 (ja) | 基板を処理するための方法および装置 | |
JP2001110714A (ja) | 薬液塗布装置および薬液塗布方法 | |
JP2576914B2 (ja) | スピンナ装置 | |
JPS5952563A (ja) | コ−テイング装置 | |
JPH04369210A (ja) | 半導体ウエハ用回転塗布装置 | |
JPH09122560A (ja) | 回転式塗布装置 | |
US6395086B1 (en) | Shield for wafer station | |
JP2537611B2 (ja) | 塗布材料の塗布装置 | |
JPS60234323A (ja) | 半導体集積回路装置の製造装置 | |
JP2849539B2 (ja) | 回転式塗布装置 | |
JP2608136B2 (ja) | 回転塗布装置 | |
JPH02149367A (ja) | スピン塗布装置 | |
JPH11168051A (ja) | スピンコータ | |
JPS58209744A (ja) | 回転式表面処理装置 | |
JPH0684776A (ja) | 回転機構 | |
JPS6146028A (ja) | レジスト塗布装置 | |
JPS61206221A (ja) | スピン塗布装置 | |
JPH05228413A (ja) | 塗布装置 | |
JPH0555137A (ja) | 半導体基板処理装置 | |
JPS62136265A (ja) | 処理液塗布装置 |