JPS6329735Y2 - - Google Patents
Info
- Publication number
- JPS6329735Y2 JPS6329735Y2 JP6920384U JP6920384U JPS6329735Y2 JP S6329735 Y2 JPS6329735 Y2 JP S6329735Y2 JP 6920384 U JP6920384 U JP 6920384U JP 6920384 U JP6920384 U JP 6920384U JP S6329735 Y2 JPS6329735 Y2 JP S6329735Y2
- Authority
- JP
- Japan
- Prior art keywords
- temperature
- reactive gas
- lower electrode
- etched
- reaction chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000001020 plasma etching Methods 0.000 claims description 11
- 238000001514 detection method Methods 0.000 claims description 9
- 238000010438 heat treatment Methods 0.000 claims description 8
- 238000005530 etching Methods 0.000 description 10
- 239000000498 cooling water Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 230000000630 rising effect Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000000992 sputter etching Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Landscapes
- Chemical Vapour Deposition (AREA)
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6920384U JPS60181369U (ja) | 1984-05-10 | 1984-05-10 | プラズマエツチング装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6920384U JPS60181369U (ja) | 1984-05-10 | 1984-05-10 | プラズマエツチング装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60181369U JPS60181369U (ja) | 1985-12-02 |
| JPS6329735Y2 true JPS6329735Y2 (enrdf_load_stackoverflow) | 1988-08-09 |
Family
ID=30604653
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6920384U Granted JPS60181369U (ja) | 1984-05-10 | 1984-05-10 | プラズマエツチング装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60181369U (enrdf_load_stackoverflow) |
-
1984
- 1984-05-10 JP JP6920384U patent/JPS60181369U/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60181369U (ja) | 1985-12-02 |
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