JPS60181369U - プラズマエツチング装置 - Google Patents

プラズマエツチング装置

Info

Publication number
JPS60181369U
JPS60181369U JP6920384U JP6920384U JPS60181369U JP S60181369 U JPS60181369 U JP S60181369U JP 6920384 U JP6920384 U JP 6920384U JP 6920384 U JP6920384 U JP 6920384U JP S60181369 U JPS60181369 U JP S60181369U
Authority
JP
Japan
Prior art keywords
temperature
reactive gas
plasma etching
temperature detection
detection mechanism
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6920384U
Other languages
English (en)
Japanese (ja)
Other versions
JPS6329735Y2 (enrdf_load_stackoverflow
Inventor
実 野田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP6920384U priority Critical patent/JPS60181369U/ja
Publication of JPS60181369U publication Critical patent/JPS60181369U/ja
Application granted granted Critical
Publication of JPS6329735Y2 publication Critical patent/JPS6329735Y2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Chemical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
JP6920384U 1984-05-10 1984-05-10 プラズマエツチング装置 Granted JPS60181369U (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6920384U JPS60181369U (ja) 1984-05-10 1984-05-10 プラズマエツチング装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6920384U JPS60181369U (ja) 1984-05-10 1984-05-10 プラズマエツチング装置

Publications (2)

Publication Number Publication Date
JPS60181369U true JPS60181369U (ja) 1985-12-02
JPS6329735Y2 JPS6329735Y2 (enrdf_load_stackoverflow) 1988-08-09

Family

ID=30604653

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6920384U Granted JPS60181369U (ja) 1984-05-10 1984-05-10 プラズマエツチング装置

Country Status (1)

Country Link
JP (1) JPS60181369U (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPS6329735Y2 (enrdf_load_stackoverflow) 1988-08-09

Similar Documents

Publication Publication Date Title
JPS60181369U (ja) プラズマエツチング装置
JPS58146361U (ja) 燃料電池発電装置
JPS6059530U (ja) プラズマ処理装置
JPH0313733U (enrdf_load_stackoverflow)
JPS60151295U (ja) 低温プラズマ発生用電極
JPS616198U (ja) プラズマア−ク加熱用陽極
JPS60139136U (ja) 灰化装置
JPS62107439U (enrdf_load_stackoverflow)
JPS59126439U (ja) プレツシヤスイツチ
JPS6192620U (enrdf_load_stackoverflow)
JPS58109194U (ja) マイクロ波加熱装置
JPS6094821U (ja) プラズマｃｖｄ装置
JPS6351436U (enrdf_load_stackoverflow)
JPS62157138U (enrdf_load_stackoverflow)
JPS60131014U (ja) ガス流量制御装置
JPS60140763U (ja) プラズマ装置
JPH0252300U (enrdf_load_stackoverflow)
JPS60181027U (ja) 反応性イオンエツチング装置
JPS6071137U (ja) プラズマｃｖｄ装置
JPS6430691U (enrdf_load_stackoverflow)
JPS59102029U (ja) 温灸用もぐさ
JPS588894U (ja) ヒ−タ装置
JPS58160489U (ja) 液体加熱用セラミツクヒ−タ
JPS63170937U (enrdf_load_stackoverflow)
JPS5862248U (ja) プロセスガス分析用液体気化器