JPS6327642B2 - - Google Patents
Info
- Publication number
- JPS6327642B2 JPS6327642B2 JP17162080A JP17162080A JPS6327642B2 JP S6327642 B2 JPS6327642 B2 JP S6327642B2 JP 17162080 A JP17162080 A JP 17162080A JP 17162080 A JP17162080 A JP 17162080A JP S6327642 B2 JPS6327642 B2 JP S6327642B2
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- level
- signal
- register
- edge
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000001514 detection method Methods 0.000 claims description 51
- 238000005259 measurement Methods 0.000 claims description 29
- 230000001678 irradiating effect Effects 0.000 claims description 4
- 230000000903 blocking effect Effects 0.000 claims description 3
- 238000007493 shaping process Methods 0.000 claims 2
- 238000000605 extraction Methods 0.000 description 36
- 238000010586 diagram Methods 0.000 description 20
- 238000010894 electron beam technology Methods 0.000 description 19
- 230000000694 effects Effects 0.000 description 17
- 239000000523 sample Substances 0.000 description 16
- 238000006243 chemical reaction Methods 0.000 description 7
- 238000007689 inspection Methods 0.000 description 4
- 230000008929 regeneration Effects 0.000 description 4
- 238000011069 regeneration method Methods 0.000 description 4
- 238000003708 edge detection Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 230000007423 decrease Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 239000000284 extract Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B15/00—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17162080A JPS5796207A (en) | 1980-12-05 | 1980-12-05 | Measuring apparatus for pattern dimensions |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17162080A JPS5796207A (en) | 1980-12-05 | 1980-12-05 | Measuring apparatus for pattern dimensions |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5796207A JPS5796207A (en) | 1982-06-15 |
| JPS6327642B2 true JPS6327642B2 (en, 2012) | 1988-06-03 |
Family
ID=15926543
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17162080A Granted JPS5796207A (en) | 1980-12-05 | 1980-12-05 | Measuring apparatus for pattern dimensions |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5796207A (en, 2012) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0108497B1 (en) * | 1982-10-08 | 1987-05-13 | National Research Development Corporation | Irradiative probe system |
| JPS61140811A (ja) * | 1984-12-14 | 1986-06-27 | Hitachi Ltd | 電子ビ−ム測長装置 |
| JP2011192837A (ja) * | 2010-03-15 | 2011-09-29 | Toshiba Corp | 評価装置および評価方法 |
-
1980
- 1980-12-05 JP JP17162080A patent/JPS5796207A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5796207A (en) | 1982-06-15 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP1288862B1 (en) | Image evaluation method and microscope | |
| US4675528A (en) | Method for measurement of spotsize and edgewidth in electron beam lithography | |
| US5182454A (en) | Scanning electron microscope | |
| JPS6327642B2 (en, 2012) | ||
| US5130550A (en) | Electron beam lithography apparatus having device for correcting beam shape | |
| JP3472127B2 (ja) | ビームの測定方法 | |
| JPH04105010A (ja) | 形状寸法測定装置および測定方法 | |
| JP3351671B2 (ja) | 荷電粒子ビームの測定方法 | |
| JPH09293477A (ja) | 荷電ビームの調整方法 | |
| JPH07286842A (ja) | 寸法検査方法及びその装置 | |
| JPH0282515A (ja) | 電子ビーム描画方法 | |
| JPH1050244A (ja) | ビーム検出信号の処理回路 | |
| JP2786662B2 (ja) | 荷電ビーム描画方法 | |
| JPS61114116A (ja) | 寸法測長装置 | |
| JPH11237230A (ja) | 電子顕微鏡における試料測定法及び装置 | |
| JPH04274711A (ja) | 荷電ビームを用いたパターン寸法測定方法 | |
| JPH0445046B2 (en, 2012) | ||
| JPH0749943B2 (ja) | 膜厚測定方法 | |
| JPH02215120A (ja) | 荷電粒子ビーム描画方法における歪補正方法 | |
| SU884005A1 (ru) | Способ измерени диаметра электронного зонда в растровом электронном микроскопе | |
| JPH0756447B2 (ja) | 測長方法 | |
| JPH08114436A (ja) | 電子ビーム測長方法 | |
| JPH03289507A (ja) | パターン寸法測定方法及び装置 | |
| JPH0372923B2 (en, 2012) | ||
| JPH07302741A (ja) | 電子線露光におけるマーク位置検出方法およびその装置 |