JPS6324276U - - Google Patents

Info

Publication number
JPS6324276U
JPS6324276U JP1986117422U JP11742286U JPS6324276U JP S6324276 U JPS6324276 U JP S6324276U JP 1986117422 U JP1986117422 U JP 1986117422U JP 11742286 U JP11742286 U JP 11742286U JP S6324276 U JPS6324276 U JP S6324276U
Authority
JP
Japan
Prior art keywords
vapor phase
phase growth
nozzle
etching
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1986117422U
Other languages
English (en)
Japanese (ja)
Other versions
JPH0345956Y2 (enExample
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1986117422U priority Critical patent/JPH0345956Y2/ja
Publication of JPS6324276U publication Critical patent/JPS6324276U/ja
Application granted granted Critical
Publication of JPH0345956Y2 publication Critical patent/JPH0345956Y2/ja
Expired legal-status Critical Current

Links

Landscapes

  • Crystals, And After-Treatments Of Crystals (AREA)
JP1986117422U 1986-08-01 1986-08-01 Expired JPH0345956Y2 (enExample)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1986117422U JPH0345956Y2 (enExample) 1986-08-01 1986-08-01

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1986117422U JPH0345956Y2 (enExample) 1986-08-01 1986-08-01

Publications (2)

Publication Number Publication Date
JPS6324276U true JPS6324276U (enExample) 1988-02-17
JPH0345956Y2 JPH0345956Y2 (enExample) 1991-09-27

Family

ID=31002918

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1986117422U Expired JPH0345956Y2 (enExample) 1986-08-01 1986-08-01

Country Status (1)

Country Link
JP (1) JPH0345956Y2 (enExample)

Also Published As

Publication number Publication date
JPH0345956Y2 (enExample) 1991-09-27

Similar Documents

Publication Publication Date Title
JPS592374B2 (ja) プラズマ気相成長装置
JPH0936053A (ja) 半導体の製造方法
JPS6473717A (en) Selective deposition of metal
JPS5821826A (ja) 半導体製造装置の堆積物除去方法
JPH0447955Y2 (enExample)
JP2681469B2 (ja) 半導体基板のエピタキシャル成長方法
JP2582105Y2 (ja) 化学気相成長装置
KR100639517B1 (ko) 확산기를 구비한 ｃｖｄ 장비
JP2792886B2 (ja) 化学気相成長装置
JPH0897154A (ja) 真空成膜装置
JP2500421Y2 (ja) 低圧化学気相生成装置
JPH0530350Y2 (enExample)
JPH04320025A (ja) 化学気相成長装置
JPH0345956Y2 (enExample)
JPS6254081A (ja) 気相成長装置
JPH02146165U (enExample)
JPS62148574U (enExample)
JPH03262123A (ja) 半導体デバイス製造装置
JPS632435Y2 (enExample)
JPH0126105Y2 (enExample)
JPH05251360A (ja) 膜形成装置
JP2501436Y2 (ja) 気相成長装置
JPS62201927U (enExample)
JPH1187249A (ja) 半導体ウェーハ処理装置
JP2003173979A (ja) 減圧気相成長装置