JPS6323826B2 - - Google Patents

Info

Publication number
JPS6323826B2
JPS6323826B2 JP10112181A JP10112181A JPS6323826B2 JP S6323826 B2 JPS6323826 B2 JP S6323826B2 JP 10112181 A JP10112181 A JP 10112181A JP 10112181 A JP10112181 A JP 10112181A JP S6323826 B2 JPS6323826 B2 JP S6323826B2
Authority
JP
Japan
Prior art keywords
electrode
plasma
substrate
voltage
chemical vapor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP10112181A
Other languages
English (en)
Japanese (ja)
Other versions
JPS583635A (ja
Inventor
Kanetake Takasaki
Kenji Koyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP10112181A priority Critical patent/JPS583635A/ja
Publication of JPS583635A publication Critical patent/JPS583635A/ja
Publication of JPS6323826B2 publication Critical patent/JPS6323826B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32623—Mechanical discharge control means

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Chemical Vapour Deposition (AREA)
JP10112181A 1981-06-29 1981-06-29 プラズマ中化学気相成長装置 Granted JPS583635A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10112181A JPS583635A (ja) 1981-06-29 1981-06-29 プラズマ中化学気相成長装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10112181A JPS583635A (ja) 1981-06-29 1981-06-29 プラズマ中化学気相成長装置

Publications (2)

Publication Number Publication Date
JPS583635A JPS583635A (ja) 1983-01-10
JPS6323826B2 true JPS6323826B2 (enrdf_load_stackoverflow) 1988-05-18

Family

ID=14292237

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10112181A Granted JPS583635A (ja) 1981-06-29 1981-06-29 プラズマ中化学気相成長装置

Country Status (1)

Country Link
JP (1) JPS583635A (enrdf_load_stackoverflow)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59156333A (ja) * 1983-02-28 1984-09-05 横河メディカルシステム株式会社 超音波診断装置
JPS641959Y2 (enrdf_load_stackoverflow) * 1985-09-24 1989-01-18
JPH04240725A (ja) * 1991-01-24 1992-08-28 Sumitomo Electric Ind Ltd エッチング方法

Also Published As

Publication number Publication date
JPS583635A (ja) 1983-01-10

Similar Documents

Publication Publication Date Title
JPS6323826B2 (enrdf_load_stackoverflow)
JPS63190173A (ja) プラズマ処理方法
JP2689419B2 (ja) イオンドーピング装置
JPH09209155A (ja) プラズマ処理装置
JPH03228321A (ja) プラズマｃｖｄ装置
JPS6124467B2 (enrdf_load_stackoverflow)
JPH01297818A (ja) プラズマｃｖｄ装置
JPS583634A (ja) プラズマ中化学気相成長装置
JPH01185918A (ja) 半導体基体への不純物導入装置
JPH0425017A (ja) 真空成膜装置
JPH02115379A (ja) 薄膜形成装置
JPS6091629A (ja) プラズマ気相成長装置
JPS60189220A (ja) プラズマｃｖｄ装置
JPH06101458B2 (ja) プラズマ気相成長装置
JP3615919B2 (ja) プラズマｃｖｄ装置
JP2541361B2 (ja) ３極プラズマｃｖｄ装置
RU97116747A (ru) Способ получения легированных алмазоподобных покрытий
JPH06280030A (ja) 薄膜作成装置
JPS6091646A (ja) プラズマ気相成長法
JP2001127055A (ja) プラズマ処理装置
JPH0798145B2 (ja) プラズマ処理装置
JPH08143394A (ja) プラズマ化学蒸着装置
JPH01122116A (ja) 薄膜形成方法
JPH06101459B2 (ja) プラズマ気相成長装置
JPS6063920A (ja) 気相処理装置