JPS63204723A - 縮小投影露光装置 - Google Patents

縮小投影露光装置

Info

Publication number
JPS63204723A
JPS63204723A JP62038181A JP3818187A JPS63204723A JP S63204723 A JPS63204723 A JP S63204723A JP 62038181 A JP62038181 A JP 62038181A JP 3818187 A JP3818187 A JP 3818187A JP S63204723 A JPS63204723 A JP S63204723A
Authority
JP
Japan
Prior art keywords
substrate
semiconductor substrate
substrate holding
cleaning
cleaned
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62038181A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0519296B2 (enExample
Inventor
Hisashi Takahashi
久 高橋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP62038181A priority Critical patent/JPS63204723A/ja
Publication of JPS63204723A publication Critical patent/JPS63204723A/ja
Publication of JPH0519296B2 publication Critical patent/JPH0519296B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
JP62038181A 1987-02-20 1987-02-20 縮小投影露光装置 Granted JPS63204723A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62038181A JPS63204723A (ja) 1987-02-20 1987-02-20 縮小投影露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62038181A JPS63204723A (ja) 1987-02-20 1987-02-20 縮小投影露光装置

Publications (2)

Publication Number Publication Date
JPS63204723A true JPS63204723A (ja) 1988-08-24
JPH0519296B2 JPH0519296B2 (enExample) 1993-03-16

Family

ID=12518214

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62038181A Granted JPS63204723A (ja) 1987-02-20 1987-02-20 縮小投影露光装置

Country Status (1)

Country Link
JP (1) JPS63204723A (enExample)

Also Published As

Publication number Publication date
JPH0519296B2 (enExample) 1993-03-16

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees