JPS63200316A - 磁気記録媒体 - Google Patents
磁気記録媒体Info
- Publication number
- JPS63200316A JPS63200316A JP3226387A JP3226387A JPS63200316A JP S63200316 A JPS63200316 A JP S63200316A JP 3226387 A JP3226387 A JP 3226387A JP 3226387 A JP3226387 A JP 3226387A JP S63200316 A JPS63200316 A JP S63200316A
- Authority
- JP
- Japan
- Prior art keywords
- film
- magnetic
- alloy
- recording medium
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000005291 magnetic effect Effects 0.000 title claims abstract description 106
- 239000000758 substrate Substances 0.000 claims abstract description 37
- 239000002131 composite material Substances 0.000 claims abstract description 20
- 239000012535 impurity Substances 0.000 claims abstract description 6
- 229910001004 magnetic alloy Inorganic materials 0.000 claims abstract description 5
- 229910052759 nickel Inorganic materials 0.000 claims description 11
- 229910052735 hafnium Inorganic materials 0.000 claims description 8
- 229910052750 molybdenum Inorganic materials 0.000 claims description 8
- 229910052758 niobium Inorganic materials 0.000 claims description 7
- 229910052713 technetium Inorganic materials 0.000 claims description 7
- 229910052720 vanadium Inorganic materials 0.000 claims description 7
- 229910052727 yttrium Inorganic materials 0.000 claims description 7
- 229910052726 zirconium Inorganic materials 0.000 claims description 7
- 229910052748 manganese Inorganic materials 0.000 claims description 6
- 229910052763 palladium Inorganic materials 0.000 claims description 6
- 229910052719 titanium Inorganic materials 0.000 claims description 6
- 229910052802 copper Inorganic materials 0.000 claims description 5
- 229910052703 rhodium Inorganic materials 0.000 claims description 5
- 229910052707 ruthenium Inorganic materials 0.000 claims description 5
- 229910052715 tantalum Inorganic materials 0.000 claims description 5
- 229910052710 silicon Inorganic materials 0.000 claims description 4
- 229910052782 aluminium Inorganic materials 0.000 claims description 3
- 229910045601 alloy Inorganic materials 0.000 abstract description 53
- 239000000956 alloy Substances 0.000 abstract description 53
- 230000000694 effects Effects 0.000 abstract description 12
- 238000004544 sputter deposition Methods 0.000 abstract description 9
- 229910052804 chromium Inorganic materials 0.000 abstract description 7
- 230000005294 ferromagnetic effect Effects 0.000 abstract description 7
- 230000005415 magnetization Effects 0.000 abstract description 7
- 238000001552 radio frequency sputter deposition Methods 0.000 abstract description 5
- 239000005341 toughened glass Substances 0.000 abstract description 5
- 239000010408 film Substances 0.000 description 199
- 239000002585 base Substances 0.000 description 51
- 229910017060 Fe Cr Inorganic materials 0.000 description 36
- 229910002544 Fe-Cr Inorganic materials 0.000 description 36
- UPHIPHFJVNKLMR-UHFFFAOYSA-N chromium iron Chemical compound [Cr].[Fe] UPHIPHFJVNKLMR-UHFFFAOYSA-N 0.000 description 36
- 229910052751 metal Inorganic materials 0.000 description 14
- 239000002184 metal Substances 0.000 description 14
- 239000000654 additive Substances 0.000 description 12
- 230000000996 additive effect Effects 0.000 description 12
- 239000000203 mixture Substances 0.000 description 11
- 238000000034 method Methods 0.000 description 10
- 239000011521 glass Substances 0.000 description 8
- 229910000599 Cr alloy Inorganic materials 0.000 description 7
- 230000007423 decrease Effects 0.000 description 6
- 238000005259 measurement Methods 0.000 description 5
- 239000012071 phase Substances 0.000 description 5
- 238000002441 X-ray diffraction Methods 0.000 description 4
- 238000007792 addition Methods 0.000 description 4
- 229910052799 carbon Inorganic materials 0.000 description 4
- 239000000919 ceramic Substances 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 150000002500 ions Chemical class 0.000 description 4
- 229910052742 iron Inorganic materials 0.000 description 4
- 239000010936 titanium Substances 0.000 description 4
- 229910052721 tungsten Inorganic materials 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 229910002056 binary alloy Inorganic materials 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 230000005389 magnetism Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 230000001681 protective effect Effects 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- 238000007740 vapor deposition Methods 0.000 description 3
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 230000010365 information processing Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 229910017112 Fe—C Inorganic materials 0.000 description 1
- 229910018487 Ni—Cr Inorganic materials 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 230000003292 diminished effect Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 230000005307 ferromagnetism Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 238000001659 ion-beam spectroscopy Methods 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 230000001050 lubricating effect Effects 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000002233 thin-film X-ray diffraction Methods 0.000 description 1
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
Landscapes
- Magnetic Record Carriers (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3226387A JPS63200316A (ja) | 1987-02-14 | 1987-02-14 | 磁気記録媒体 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3226387A JPS63200316A (ja) | 1987-02-14 | 1987-02-14 | 磁気記録媒体 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63200316A true JPS63200316A (ja) | 1988-08-18 |
| JPH0451884B2 JPH0451884B2 (enrdf_load_stackoverflow) | 1992-08-20 |
Family
ID=12354125
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3226387A Granted JPS63200316A (ja) | 1987-02-14 | 1987-02-14 | 磁気記録媒体 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63200316A (enrdf_load_stackoverflow) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57208631A (en) * | 1981-06-19 | 1982-12-21 | Hitachi Ltd | Vertical magnetic recording medium |
| JPS6339128A (ja) * | 1986-08-04 | 1988-02-19 | Furukawa Electric Co Ltd:The | 磁気記録媒体 |
-
1987
- 1987-02-14 JP JP3226387A patent/JPS63200316A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57208631A (en) * | 1981-06-19 | 1982-12-21 | Hitachi Ltd | Vertical magnetic recording medium |
| JPS6339128A (ja) * | 1986-08-04 | 1988-02-19 | Furukawa Electric Co Ltd:The | 磁気記録媒体 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0451884B2 (enrdf_load_stackoverflow) | 1992-08-20 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP6112117B2 (ja) | 磁気記録媒体 | |
| JP5999290B2 (ja) | 磁気記録媒体 | |
| KR20070047678A (ko) | 탄탈륨 합금계 스퍼터 타겟을 이용한 개선된 씨드층의 증착 | |
| US7105240B2 (en) | Perpendicular media with improved corrosion performance | |
| US4786553A (en) | Magnetic recording medium | |
| JPS61253622A (ja) | 磁気記録媒体およびその製造方法 | |
| JPH08147665A (ja) | 磁気記録媒体及びこれを用いた磁気記憶装置 | |
| JP6406462B2 (ja) | 磁気記録媒体 | |
| JP6327357B2 (ja) | 磁気記録媒体 | |
| JPS63200316A (ja) | 磁気記録媒体 | |
| US10741207B2 (en) | Magnetic recording medium having an FePtRh magnetic layer | |
| WO2006030961A1 (en) | Method for manufacturing perpedicular magnetic recording medium, perpendicular magnetic recording medium, and magnetic recording/ reproducing apparatus | |
| JPH0817032A (ja) | 磁気記録媒体およびその製造方法 | |
| JPS63102033A (ja) | 磁気記録媒体 | |
| JPS6313118A (ja) | 磁気記録媒体 | |
| JPS63102043A (ja) | 磁気記録媒体の製造方法 | |
| JPS63184913A (ja) | 磁気記録媒体 | |
| JPS61246914A (ja) | 磁気記録媒体およびその製造方法 | |
| JPS62293512A (ja) | 磁気記録媒体 | |
| JPS62293511A (ja) | 磁気記録媒体 | |
| JP3194578B2 (ja) | 多層状強磁性体 | |
| JP2001243618A (ja) | 磁気記録媒体、その製造方法、スパッタリングターゲット、および磁気記録再生装置 | |
| JPS61224122A (ja) | 磁気記録媒体およびその製造方法 | |
| JPS6154017A (ja) | 保護層をもつ磁気記録媒体 | |
| KR20080096335A (ko) | 수직 자기기록 매체용 육방밀집 세라믹 시드층 |