JPS6319861B2 - - Google Patents

Info

Publication number
JPS6319861B2
JPS6319861B2 JP59032841A JP3284184A JPS6319861B2 JP S6319861 B2 JPS6319861 B2 JP S6319861B2 JP 59032841 A JP59032841 A JP 59032841A JP 3284184 A JP3284184 A JP 3284184A JP S6319861 B2 JPS6319861 B2 JP S6319861B2
Authority
JP
Japan
Prior art keywords
plate
pattern
shadow mask
hole pattern
alignment marks
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP59032841A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60176041A (ja
Inventor
Takuro Sen
Kazuo Shirakawa
Naomi Nakayama
Katsujiro Waki
Hideki Awano
Masahiko Matsuyoshi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toppan Inc
Original Assignee
Toppan Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toppan Printing Co Ltd filed Critical Toppan Printing Co Ltd
Priority to JP59032841A priority Critical patent/JPS60176041A/ja
Publication of JPS60176041A publication Critical patent/JPS60176041A/ja
Publication of JPS6319861B2 publication Critical patent/JPS6319861B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Electrodes For Cathode-Ray Tubes (AREA)
JP59032841A 1984-02-23 1984-02-23 シヤドウマスク用パタ−ン版の製造方法 Granted JPS60176041A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59032841A JPS60176041A (ja) 1984-02-23 1984-02-23 シヤドウマスク用パタ−ン版の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59032841A JPS60176041A (ja) 1984-02-23 1984-02-23 シヤドウマスク用パタ−ン版の製造方法

Publications (2)

Publication Number Publication Date
JPS60176041A JPS60176041A (ja) 1985-09-10
JPS6319861B2 true JPS6319861B2 (OSRAM) 1988-04-25

Family

ID=12370040

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59032841A Granted JPS60176041A (ja) 1984-02-23 1984-02-23 シヤドウマスク用パタ−ン版の製造方法

Country Status (1)

Country Link
JP (1) JPS60176041A (OSRAM)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4107762B4 (de) * 1990-03-09 2006-07-13 Dai Nippon Printing Co., Ltd. Verfahren zum Herstellen von Master- und Arbeitsmusterplatten für den Ätzprozess

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5112986B2 (OSRAM) * 1972-10-04 1976-04-23
JPS5355218A (en) * 1976-10-27 1978-05-19 Tokyo Shibaura Electric Co Positioning method of multiilaminated printing
JPS5835538A (ja) * 1981-08-27 1983-03-02 Mitsubishi Electric Corp パタ−ンマスクの作製方法
JPS6319861A (ja) * 1986-07-11 1988-01-27 Mitsubishi Electric Corp 抵抗素子

Also Published As

Publication number Publication date
JPS60176041A (ja) 1985-09-10

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