JPS6319859B2 - - Google Patents

Info

Publication number
JPS6319859B2
JPS6319859B2 JP14019784A JP14019784A JPS6319859B2 JP S6319859 B2 JPS6319859 B2 JP S6319859B2 JP 14019784 A JP14019784 A JP 14019784A JP 14019784 A JP14019784 A JP 14019784A JP S6319859 B2 JPS6319859 B2 JP S6319859B2
Authority
JP
Japan
Prior art keywords
lid
lower lid
cassette
mask
upper lid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP14019784A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6118959A (ja
Inventor
Shinji Tsutsui
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP59140197A priority Critical patent/JPS6118959A/ja
Priority to US06/750,282 priority patent/US4611967A/en
Publication of JPS6118959A publication Critical patent/JPS6118959A/ja
Publication of JPS6319859B2 publication Critical patent/JPS6319859B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/70741—Handling masks outside exposure position, e.g. reticle libraries
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Library & Information Science (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Warehouses Or Storage Devices (AREA)
  • Sheets, Magazines, And Separation Thereof (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP59140197A 1984-07-06 1984-07-06 防塵カセツト Granted JPS6118959A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP59140197A JPS6118959A (ja) 1984-07-06 1984-07-06 防塵カセツト
US06/750,282 US4611967A (en) 1984-07-06 1985-07-01 Cassette-type container for a sheet-like member

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59140197A JPS6118959A (ja) 1984-07-06 1984-07-06 防塵カセツト

Publications (2)

Publication Number Publication Date
JPS6118959A JPS6118959A (ja) 1986-01-27
JPS6319859B2 true JPS6319859B2 (enrdf_load_stackoverflow) 1988-04-25

Family

ID=15263167

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59140197A Granted JPS6118959A (ja) 1984-07-06 1984-07-06 防塵カセツト

Country Status (1)

Country Link
JP (1) JPS6118959A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2796131B2 (ja) * 1989-06-29 1998-09-10 沖電気工業株式会社 ホトマスクケース及びホトマスクの保管方法
TWI685711B (zh) * 2018-08-27 2020-02-21 家登精密工業股份有限公司 光罩盒及其作動方法

Also Published As

Publication number Publication date
JPS6118959A (ja) 1986-01-27

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term