JPS6318763U - - Google Patents

Info

Publication number
JPS6318763U
JPS6318763U JP11225386U JP11225386U JPS6318763U JP S6318763 U JPS6318763 U JP S6318763U JP 11225386 U JP11225386 U JP 11225386U JP 11225386 U JP11225386 U JP 11225386U JP S6318763 U JPS6318763 U JP S6318763U
Authority
JP
Japan
Prior art keywords
ion beam
ion
sample surface
processing apparatus
detectors
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11225386U
Other languages
English (en)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP11225386U priority Critical patent/JPS6318763U/ja
Publication of JPS6318763U publication Critical patent/JPS6318763U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Welding Or Cutting Using Electron Beams (AREA)
  • Physical Vapour Deposition (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)

Description

【図面の簡単な説明】
第１図はエツジ効果説明図であり、第２図は本
考案における測定原理図であり、第３図はイオン
ビーム加工装置の分解斜視図である。

Claims (1)

    【実用新案登録請求の範囲】
  1. イオン源から発生するイオンビームを対物レン
    ズで集光し走査電極で走査させながら試料表面に
    照射する手段と、原料ガスを試料表面に吹付ける
    ガス銃を組合せたイオンビーム局所膜付装置にお
    いて、試料の表面（３次元分布）を観察する為、
    イオン励起によつて放出される２次電子あるいは
    ２次イオンを検出する複数個の検出器を配置した
    ことを特徴とするイオンビーム加工装置。
JP11225386U 1986-07-22 1986-07-22 Pending JPS6318763U (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11225386U JPS6318763U (ja) 1986-07-22 1986-07-22

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11225386U JPS6318763U (ja) 1986-07-22 1986-07-22

Publications (1)

Publication Number Publication Date
JPS6318763U true JPS6318763U (ja) 1988-02-06

Family

ID=30992953

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11225386U Pending JPS6318763U (ja) 1986-07-22 1986-07-22

Country Status (1)

Country Link
JP (1) JPS6318763U (ja)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0299255U (ja) * 1989-01-26 1990-08-07
JP2006127850A (ja) * 2004-10-27 2006-05-18 Hitachi High-Technologies Corp 荷電粒子ビーム装置及び試料作製方法
JP2010230672A (ja) * 2009-03-27 2010-10-14 Fei Co 試料をミリングしながら像を生成する方法
JP2011066005A (ja) * 2010-11-08 2011-03-31 Hitachi High-Technologies Corp 荷電粒子ビーム装置及び試料作製方法

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0299255U (ja) * 1989-01-26 1990-08-07
JP2006127850A (ja) * 2004-10-27 2006-05-18 Hitachi High-Technologies Corp 荷電粒子ビーム装置及び試料作製方法
JP2010230672A (ja) * 2009-03-27 2010-10-14 Fei Co 試料をミリングしながら像を生成する方法
JP2011066005A (ja) * 2010-11-08 2011-03-31 Hitachi High-Technologies Corp 荷電粒子ビーム装置及び試料作製方法

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