JPS6315550U - - Google Patents
Info
- Publication number
- JPS6315550U JPS6315550U JP10918786U JP10918786U JPS6315550U JP S6315550 U JPS6315550 U JP S6315550U JP 10918786 U JP10918786 U JP 10918786U JP 10918786 U JP10918786 U JP 10918786U JP S6315550 U JPS6315550 U JP S6315550U
- Authority
- JP
- Japan
- Prior art keywords
- ion beam
- sample surface
- scanning
- prober
- ion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000523 sample Substances 0.000 claims description 6
- 238000010884 ion-beam technique Methods 0.000 claims description 4
- 239000002184 metal Substances 0.000 claims description 3
- 239000011248 coating agent Substances 0.000 claims 1
- 238000000576 coating method Methods 0.000 claims 1
- 230000001678 irradiating effect Effects 0.000 claims 1
- 239000002994 raw material Substances 0.000 claims 1
- 239000007921 spray Substances 0.000 claims 1
- 238000000034 method Methods 0.000 description 2
- 201000009310 astigmatism Diseases 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
Landscapes
- Welding Or Cutting Using Electron Beams (AREA)
- Physical Vapour Deposition (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Description
図面は金属探針法のプローバ付イオンビーム加
工装置の分解斜視図である。 １……イオン源、２……コンデンサレンズ、３
……上部偏向板、４……絞り、５……非点補正レ
ンズ、６……対物レンズ、７……走査電極、８…
…ガス銃、９……試料、１０……光学顕微鏡、１
１……金属探針法のプローバ。
工装置の分解斜視図である。 １……イオン源、２……コンデンサレンズ、３
……上部偏向板、４……絞り、５……非点補正レ
ンズ、６……対物レンズ、７……走査電極、８…
…ガス銃、９……試料、１０……光学顕微鏡、１
１……金属探針法のプローバ。
Claims (1)
- イオン源から発生するイオンビームを対物レン
ズで集光した走査電極で走査させながら試料表面
に照射する手段と、原料ガスを試料表面に吹付け
るガス銃を組合せたイオンビーム局所膜付装置に
おいて、照射室内に金属探針法のプローバを配置
したことを特徴とするイオンビーム加工装置。
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10918786U JPS6315550U (ja) | 1986-07-16 | 1986-07-16 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10918786U JPS6315550U (ja) | 1986-07-16 | 1986-07-16 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6315550U true JPS6315550U (ja) | 1988-02-01 |
Family
ID=30987060
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10918786U Pending JPS6315550U (ja) | 1986-07-16 | 1986-07-16 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6315550U (ja) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58165338A (ja) * | 1982-03-26 | 1983-09-30 | Hitachi Ltd | 半導体製造装置 |
| JPS60245227A (ja) * | 1984-05-21 | 1985-12-05 | Seiko Instr & Electronics Ltd | パタ−ン膜の形成方法 |
-
1986
- 1986-07-16 JP JP10918786U patent/JPS6315550U/ja active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58165338A (ja) * | 1982-03-26 | 1983-09-30 | Hitachi Ltd | 半導体製造装置 |
| JPS60245227A (ja) * | 1984-05-21 | 1985-12-05 | Seiko Instr & Electronics Ltd | パタ−ン膜の形成方法 |
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