JPS6316903B2 - - Google Patents
Info
- Publication number
- JPS6316903B2 JPS6316903B2 JP57116532A JP11653282A JPS6316903B2 JP S6316903 B2 JPS6316903 B2 JP S6316903B2 JP 57116532 A JP57116532 A JP 57116532A JP 11653282 A JP11653282 A JP 11653282A JP S6316903 B2 JPS6316903 B2 JP S6316903B2
- Authority
- JP
- Japan
- Prior art keywords
- oxide film
- silicon oxide
- silicon
- thermally
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
- H01L21/762—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
- H01L21/76202—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using a local oxidation of silicon, e.g. LOCOS, SWAMI, SILO
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Element Separation (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11653282A JPS596557A (ja) | 1982-07-05 | 1982-07-05 | 半導体装置の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11653282A JPS596557A (ja) | 1982-07-05 | 1982-07-05 | 半導体装置の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS596557A JPS596557A (ja) | 1984-01-13 |
| JPS6316903B2 true JPS6316903B2 (enrdf_load_stackoverflow) | 1988-04-11 |
Family
ID=14689451
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11653282A Granted JPS596557A (ja) | 1982-07-05 | 1982-07-05 | 半導体装置の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS596557A (enrdf_load_stackoverflow) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6321848A (ja) * | 1986-07-16 | 1988-01-29 | Sanyo Electric Co Ltd | 素子分離領域の形成方法 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS50123275U (enrdf_load_stackoverflow) * | 1974-03-22 | 1975-10-08 | ||
| JPS5154378A (en) * | 1974-11-07 | 1976-05-13 | Fujitsu Ltd | Handotaisochino seizohoho |
| JPS56125859A (en) * | 1980-03-06 | 1981-10-02 | Fujitsu Ltd | Manufacture of semiconductor device |
-
1982
- 1982-07-05 JP JP11653282A patent/JPS596557A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS596557A (ja) | 1984-01-13 |
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