JPS6316901B2 - - Google Patents

Info

Publication number
JPS6316901B2
JPS6316901B2 JP57155917A JP15591782A JPS6316901B2 JP S6316901 B2 JPS6316901 B2 JP S6316901B2 JP 57155917 A JP57155917 A JP 57155917A JP 15591782 A JP15591782 A JP 15591782A JP S6316901 B2 JPS6316901 B2 JP S6316901B2
Authority
JP
Japan
Prior art keywords
concentration
hydrogen peroxide
ammonia
solenoid valve
section
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57155917A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5946032A (ja
Inventor
Masaaki Harazono
Masahiro Watanabe
Yutaka Hiratsuka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP57155917A priority Critical patent/JPS5946032A/ja
Publication of JPS5946032A publication Critical patent/JPS5946032A/ja
Publication of JPS6316901B2 publication Critical patent/JPS6316901B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H10P72/0411—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H10P72/0416—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels

Landscapes

  • Cleaning In General (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Weting (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
JP57155917A 1982-09-09 1982-09-09 洗浄装置 Granted JPS5946032A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57155917A JPS5946032A (ja) 1982-09-09 1982-09-09 洗浄装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57155917A JPS5946032A (ja) 1982-09-09 1982-09-09 洗浄装置

Publications (2)

Publication Number Publication Date
JPS5946032A JPS5946032A (ja) 1984-03-15
JPS6316901B2 true JPS6316901B2 (enExample) 1988-04-11

Family

ID=15616331

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57155917A Granted JPS5946032A (ja) 1982-09-09 1982-09-09 洗浄装置

Country Status (1)

Country Link
JP (1) JPS5946032A (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02722U (enExample) * 1988-06-10 1990-01-05
JP2807069B2 (ja) * 1990-08-14 1998-09-30 川崎製鉄株式会社 半導体装置の製造方法
US5275184A (en) * 1990-10-19 1994-01-04 Dainippon Screen Mfg. Co., Ltd. Apparatus and system for treating surface of a wafer by dipping the same in a treatment solution and a gate device for chemical agent used in the apparatus and the system
JP3146841B2 (ja) * 1994-03-28 2001-03-19 信越半導体株式会社 ウエーハのリンス装置
US5472516A (en) * 1994-04-15 1995-12-05 At&T Corp. Process and apparatus for semiconductor device fabrication
JP4590700B2 (ja) 2000-07-14 2010-12-01 ソニー株式会社 基板洗浄方法及び基板洗浄装置
EP4396575A4 (en) 2021-09-01 2024-12-25 CardioQuip, LLC SYSTEM AND METHOD FOR ONLINE OPTICAL DETECTION OF HYDROGEN PEROXIDE

Also Published As

Publication number Publication date
JPS5946032A (ja) 1984-03-15

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