JPS63166533A - Manufacture of metallic core metal-clad laminated board - Google Patents

Manufacture of metallic core metal-clad laminated board

Info

Publication number
JPS63166533A
JPS63166533A JP30937486A JP30937486A JPS63166533A JP S63166533 A JPS63166533 A JP S63166533A JP 30937486 A JP30937486 A JP 30937486A JP 30937486 A JP30937486 A JP 30937486A JP S63166533 A JPS63166533 A JP S63166533A
Authority
JP
Japan
Prior art keywords
metal
ceramic
resin
clad laminate
plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP30937486A
Other languages
Japanese (ja)
Inventor
寛士 長谷川
中川 武寿
岡野 徳雄
光弘 井上
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP30937486A priority Critical patent/JPS63166533A/en
Publication of JPS63166533A publication Critical patent/JPS63166533A/en
Pending legal-status Critical Current

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Landscapes

  • Laminated Bodies (AREA)
  • Insulated Metal Substrates For Printed Circuits (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は高熱伝導性で放熱性にすぐn、またセラミック
チップ、シリコンチップ等と熱j#舐係数のメタルコア
金属慢槓層板の製造方法に関する。
[Detailed Description of the Invention] (Industrial Application Field) The present invention is a method for manufacturing a metal core metal laminated plate with high thermal conductivity, excellent heat dissipation properties, and a heat coefficient of heat j# for ceramic chips, silicon chips, etc. Regarding.

(従来の技術〉 従来、プリント配11jeとしては2エノール樹脂、エ
ポ中7樹脂等の績層截が多く用いらnてきた。しかし、
最近では、電子a器の4g、能化、づ・型化、高密度化
に伴−1七fLによって生ずる熱の高密度発生をいかK
M埋するか、あるいは悟載するセラミックチップ、クリ
コンテツブ等の熱膨張係数に近づける、すなわち基板の
世熱臆張化を台工かり、接続侶稙住を同よさせるカーが
課題になっている。
(Prior art) Conventionally, as a printing material 11je, a resin layer made of 2-enol resin, Epo-7 resin, etc. has often been used.However,
Recently, as electronic A devices have become more compact, more compact, and more dense, how can we reduce the high density of heat generated by -17 fL?
The challenge is to make the thermal expansion coefficient close to that of the ceramic chips, crimped chips, etc. that are buried or mounted, that is, to prevent the substrate from becoming more bulky and to make the connectors more similar to each other.

とr′L、に対し、従来の有機質系基板は熱伝導性が低
いために熱放散性が悪く、茜fj度実装化は困難であっ
た。そのために熱伝導性にすぐれたjk@とじて金M板
を芯材としてその表面に絶縁層を施しにメタルコア基板
が注目さnている。
In contrast, conventional organic substrates have poor heat dissipation properties due to their low thermal conductivity, making it difficult to implement high-temperature mounting. For this reason, metal core substrates are attracting attention, which have a gold plate with excellent thermal conductivity as a core material and an insulating layer on the surface.

(発明が解決しようとする問題点〕 このメタルコア基lIlは、アルミニウムなどの熱伝導
性の良い金属板の表面にエポキシ樹脂などの有機質系絶
縁物の薄い層を設け、さらにそのJ:に回路を形成する
fII4箔などの金属箔管貼りつけた構造のものが生成
である。しかし、このような構造では回路と金msとの
間忙熱伝導性の悪−樹脂層が存在するために、金属板の
高熱伝導性を十分に活かすことができない。こnにつ−
では絶縁層の厚さを薄くする、あるいは樹脂に熱伝導性
の大きな元項剤t−混入する等の対策が考えられている
が、その効果は十分でを工ない。
(Problems to be Solved by the Invention) This metal core substrate is made by providing a thin layer of an organic insulator such as epoxy resin on the surface of a metal plate with good thermal conductivity such as aluminum, and then adding a circuit to the J:. A structure in which a metal foil tube such as fII4 foil is pasted is a product.However, in such a structure, there is a resin layer with poor thermal conductivity between the circuit and the gold, so the metal The high thermal conductivity of the plate cannot be fully utilized.
Countermeasures have been considered, such as reducing the thickness of the insulating layer or incorporating a highly thermally conductive agent into the resin, but these measures are not sufficiently effective.

このようなことから絶縁層として熱伝導性の良好なアル
ミナなどのセラミックを使用する方法が考えらnている
。すなわち、芯材となる金s41の表面に溶射などの方
法によりセラミック層を設ける方法である。しかし、こ
の方法では金属板とセラミック層の密着性が十分ではな
い、あるいはセラミック層はどうしても気孔が存在する
ために耐電圧、耐温性が劣るなどの欠点がある。またこ
のような構造の場合、回路の形成は導体ペースト、メツ
中など煩雑な工at必資とし、コストアップとなる。
For this reason, a method of using ceramic such as alumina, which has good thermal conductivity, as an insulating layer has been considered. That is, this is a method in which a ceramic layer is provided on the surface of gold s41 serving as a core material by a method such as thermal spraying. However, this method has drawbacks such as insufficient adhesion between the metal plate and the ceramic layer, or poor voltage resistance and temperature resistance due to the presence of pores in the ceramic layer. In addition, in the case of such a structure, the formation of the circuit requires complicated labor such as conductor paste and metal paste, which increases the cost.

また、このよ5なメタに:Iア金属張積層板においては
低熱II彊化の点t−考えると、金m板は421!r金
、インバ一台金等熱膨張係数が竜うばツクやシリコンに
近い、低熱#慢係数のものが使用できる。しかし、絶縁
層は樹脂を主体にしたものであるため、低熱膨張係数の
金属板を用−た場合、金Jllllと樹脂からなる絶縁
層の熱膨張係数には大きな差があるため、1叛のそりの
発生、あるいは熱衛撃などにより剥#11It−生じゃ
すく信鵬性に欠けるものである。
Also, regarding this 5-point meta: Considering the low heat resistance of metal-clad laminates, the gold plate is 421! Materials with low thermal expansion coefficients such as gold and Invar metal, which have thermal expansion coefficients close to those of silver and silicon, can be used. However, since the insulating layer is mainly made of resin, if a metal plate with a low coefficient of thermal expansion is used, there is a large difference in the coefficient of thermal expansion between the insulating layer made of gold and resin. #11 It is unreliable when peeled due to warping or heat damage.

本発明はこnらの欠点を改良し、熱放散性にすぐれ、ま
た低熱I#張係数でセラミックチップ、シリコンチップ
等と熱膨張係数が近いメタルコア金Jll張横層叛會提
供するものである。
The present invention improves these shortcomings and provides a metal core gold-plated lateral layer material that has excellent heat dissipation properties, low thermal expansion coefficient, and a thermal expansion coefficient close to that of ceramic chips, silicon chips, etc. .

(問題点t−解決するための手段) すなわち本発明は、金属箔の片面にセラミックを溶射し
てセラミック浴射層七形成し、該セラミック溶射層の気
孔に未硬化の熱硬化性樹脂を含浸させ、咳金属箔のセラ
ミック溶射層側と接するように金#截を重ね合わせてこ
nら全圧着、一体化することを特命とするものである。
(Problem t - Means for Solving) That is, the present invention sprays ceramic onto one side of a metal foil to form a ceramic sprayed layer, and impregnates the pores of the ceramic sprayed layer with an uncured thermosetting resin. The special mission was to overlay the gold pieces so that they were in contact with the ceramic sprayed layer side of the metal foil, and then crimped and integrated them all.

金属箔としては一般のプリント配線板に広く用いられて
いる銅箔が好適であるが、その他にアルξニウム箔、ニ
ッケル箔、fI&箔等、あるいはそれらのうずネート箔
、曾金陥が用いらnる。
Copper foil, which is widely used for general printed wiring boards, is suitable as the metal foil, but aluminum foil, nickel foil, fI & foil, etc., or their swirled foils, and their spirals can also be used. nru.

七ラミックは電気絶縁性等の電気特性にすぐれたアルミ
ナが好適であるが、その他にスピネル、ムライト、炭化
ケイ素、窒化アルミニウム、などを用−ることができる
。また金I/II4陥へのセラミック溶射tkはガス溶
射法、プラズマ溶射法、水プラズマ溶射法、減圧プラズ
マ溶射法などが通用し得る。
Alumina, which has excellent electrical properties such as electrical insulation, is suitable as the hepteramic material, but other materials such as spinel, mullite, silicon carbide, and aluminum nitride can also be used. Further, for the ceramic spraying tk on the gold I/II4 groove, gas spraying, plasma spraying, water plasma spraying, reduced pressure plasma spraying, etc. can be used.

金J#!箔上に形成されたセラミック溶射層の気孔化未
硬化の熱硬化性樹脂上含浸して封孔するのはセラでツク
溶射層の耐電圧絶縁抵抗などの電気特性、特に吸湿時の
電気特性上改良するためである。セラミック溶射1工C
VD@、PVD法、ゾルグル法等の他のセラミックコー
ティング@に比較して成膜速度が速く童毅性にすぐnる
、大面積へのコーティングが可能であるなどの長所があ
るが、その反面、溶射層には多くの気孔が発生する次点
を有する。この気孔率は一般に:5〜15 vo1%程
度で、減圧溶射によれば少なくすることができるが、そ
れでも1%程度でゼロにすることはできなめ。そのため
に、水が存在すると気孔に侵透し、絶縁抵抗、耐電圧な
どの電気特性の著しい低下を招く。したがってこれらの
気孔を封孔することにより吸水時の特性上改良する必要
があるのである。
Gold J#! The ceramic sprayed layer formed on the foil is impregnated with the uncured thermosetting resin to seal the pores.The ceramic sprayed layer has electrical properties such as withstand voltage and insulation resistance, especially when moisture is absorbed. This is for the purpose of improvement. Ceramic spraying 1C
Compared to other ceramic coatings such as VD@, PVD method, and Sol-Guru method, it has advantages such as faster film formation speed, better stability, and ability to coat large areas. , the sprayed layer has a runner-up in which many pores occur. This porosity is generally about 5 to 15 vol%, and can be reduced by vacuum spraying, but it is still about 1% and cannot be reduced to zero. Therefore, if water is present, it will penetrate into the pores and cause a significant decrease in electrical properties such as insulation resistance and withstand voltage. Therefore, it is necessary to improve the water absorption properties by sealing these pores.

封孔に用いる樹脂は気孔へのtm性が資求さnるため、
低粘度であることが望1れ、封孔後は硬化して電気特性
等に悪影41i[t−与えな一熱硬化性樹脂が好適であ
る。このよ5なm脂としてはエポキシ樹脂、ポリイミド
樹脂、フェノール樹脂、ビニルエステル樹脂、不飽和ポ
リエステル樹脂等が用いろrしる。こnらの樹脂の含浸
性は、金栖箔上に形成されたセラミック溶射層にスプレ
ー法、はけ、ローラー等による温布法、ドクターブレー
ド法等によることができ、真空含浸を行うとより一層含
浸性を向上することができる。また、樹脂が両粘度で含
浸性が不十分な場酋は、樹Jjlを溶剤で希釈して用い
てもよく、その場合を工含浸後加熱処理により浴剤を除
去し、それと四時に樹脂t−Bステージ化して常温での
ベタつきをなくせば取扱い性もよくなる。
Since the resin used for pore sealing is required to have tm property to the pores,
It is desirable that the resin has a low viscosity, and a thermosetting resin that hardens after sealing and does not adversely affect electrical properties etc. is suitable. Epoxy resins, polyimide resins, phenol resins, vinyl ester resins, unsaturated polyester resins, etc. can be used as such 5-carbon resins. The impregnability of these resins can be achieved by spraying, brushing, hot cloth method using a roller, doctor blade method, etc. on the ceramic sprayed layer formed on Kanasu foil, and vacuum impregnation is more effective. Impregnating properties can be further improved. In addition, if the resin has both viscosity and insufficient impregnating properties, the resin may be diluted with a solvent. In that case, the bath agent is removed by heat treatment after impregnation, and then - Handling becomes easier if the product is made into a B stage to eliminate stickiness at room temperature.

このようにして得た気孔t−樹脂で封孔したセラミック
溶射金属箔はセラミック層表面には封孔した樹脂層が存
在し、しかも完全に硬化した状態ではなめため、芯材と
なる金Jli板とともに加圧、加熱することにより樹脂
が接着剤の役目を果たして一体化することができる。な
お、用途に応じて、樹脂層の厚みもある程度確保したい
場酋は、金属板とセラミックI−の間にプリフ。
The thus obtained ceramic thermal sprayed metal foil with pores sealed with T-resin has a sealed resin layer on the surface of the ceramic layer, and is smooth when completely cured, so the gold Jli plate used as the core material By applying pressure and heating at the same time, the resin acts as an adhesive and can be integrated. Depending on the application, if you want to ensure the thickness of the resin layer to a certain extent, it is best to place a pre-plate between the metal plate and the ceramic I-.

レグを介在させることができる。1リプレグとしてはエ
ボキク樹脂、ポリイミド樹脂、フェノール樹脂、不飽和
ポリエステルも脂、ビニルエステル樹脂等をガラス繊維
、ケプラー細組、紙、クォーツ線維などの繊維基材に含
浸したものが用−られる。なお、プリプレグの樹脂と封
孔に用いる樹脂はそれらの間の接着性、相溶性t−考慮
すると同Pji類のものであることが望ましいが、悪影
響がなければ異なってもさしつかえない。
Legs can be interposed. 1 Repregs used include fiber base materials such as glass fiber, Kepler fiber, paper, and quartz fiber impregnated with evoki resin, polyimide resin, phenol resin, unsaturated polyester resin, vinyl ester resin, and the like. Note that it is desirable that the resin for the prepreg and the resin used for sealing the resin be of the same Pji type in consideration of the adhesion and compatibility between them, but they may be different as long as there is no adverse effect.

芯材となる金属板は、アルミニウム板、鋼板、鉄板、ス
テンレス板、真ちゅう截、42甘金板、インバー合金金
などが用いられる。こnらの金S板の中で42台合金金
インバー合金金は熱膨張saカ非常</*−サ< (3
〜4 X 10−’ /”C)、セラミック(657X
10−6IC)、シリコン(3〜4XIQ−6/”C)
に近いため、これらを用いればメタルコア金属張積層板
の熱膨vR廠数を像くすることができ、テップ実@時の
接続信頼性向上に非常に効果がめる。fた、42台金イ
ンバー曾会心必要に応じて銅、アルミニウムなどの他金
楓とクラッドした状態で用いることも可能である。
As the metal plate used as the core material, an aluminum plate, a steel plate, an iron plate, a stainless steel plate, a brass plate, a 42 sweet gold plate, an invar alloy metal, etc. are used. Among these gold S plates, 42 gold alloys and invar alloys have very low thermal expansion sa < (3
~4 X 10-'/”C), Ceramic (657X
10-6IC), silicon (3~4XIQ-6/”C)
Since it is close to , the thermal expansion vR coefficient of the metal core metal clad laminate can be visualized using these, which is very effective in improving the connection reliability during actual step operation. In addition, the 42-base gold invar material can be used in a state where it is clad with copper, aluminum, or other gold, if necessary.

なお、本発明において金JI@板へのセラミック層の形
成は必要に応じて片面のみでも、あるいは両面でも良い
In the present invention, the ceramic layer may be formed on only one side or both sides of the gold JI@ plate, if necessary.

(作用) 本発明の方法により得られるメタルコア金−張積層板は
回路となる金属箔に密着してセラばツク層が存在し、さ
らに薄い接着剤層七通して金属板が存在するために熱放
散性は非常に良好である。従来のものは絶縁性を確保す
るために回路に接しているのは熱伝導性の低い樹脂層で
あるが、本発明の方法では熱伝導性のよいセラミック層
であるために芯材である金属板の熱放散往管有効に利用
することができる。
(Function) The metal core gold-clad laminate obtained by the method of the present invention has a ceramic layer in close contact with the metal foil that forms the circuit, and also has a metal plate through seven thin adhesive layers, so it can be heated easily. The dissipation properties are very good. In the conventional method, a resin layer with low thermal conductivity is in contact with the circuit to ensure insulation, but in the method of the present invention, the metal core material is a ceramic layer with good thermal conductivity. The heat dissipation of the plate can be effectively used.

さらに、セラミック溶射層t−絶縁層としたものは溶射
層に存在する気孔が吸水時の電気特性の著しい低下の原
因となっていたが、樹脂によって封孔することにより改
善される。1k、従来の、金属8iに直接セラミックt
−溶射する方法では、回路の形成は、さらに嘲t−g射
する、あるいは導体ペースト等の工程を必要とするが、
本発明の方法のように金I!I4箔にセラミック七m射
する方法を用いれは、積層板製造波にエツチングにより
容易に回路上形成することができる。
Furthermore, in the ceramic sprayed layer t-insulating layer, the pores present in the sprayed layer caused a significant deterioration in electrical properties when water was absorbed, but this can be improved by sealing the pores with a resin. 1k, conventional, ceramic t directly on metal 8i
- With the thermal spraying method, forming the circuit requires additional processes such as T-G spraying or conductive paste, but
Gold I! as in the method of the invention! By using the method of irradiating ceramics on I4 foil, circuits can be easily formed by etching on the laminated board fabrication wave.

そのため、工程も簡素化され、コストl低減することが
できる。
Therefore, the process is also simplified and costs can be reduced.

また、金属板として低熱II#彊係微係数2酋金、イン
バー合金等を用いれば、基壜全体を低熱膨張化すること
が容易であり、それに伴うそりの発生、絶縁層の密着性
低下も改良することができる。。
In addition, if a metal plate with low heat resistance II #coefficient of coefficient 2 is used, an invar alloy, etc. is used, it is easy to reduce the thermal expansion of the entire base bottle, and the resulting warpage and decrease in the adhesion of the insulating layer can be avoided. It can be improved. .

以下、笑施例を挙げて本発明を説明する。The present invention will be described below with reference to Examples.

(11!施例) 第1図は本発明のメタルコア金属張積層板の積層構成図
、絽2図は得られたメタルコア金属張積層板の断面模式
図である。
(11! Example) Fig. 1 is a laminated configuration diagram of a metal core metal clad laminate of the present invention, and Fig. 2 is a schematic cross-sectional view of the obtained metal core metal clad laminate.

厚さ55μの銅箔1の片面にプラズマ沼射法忙よってア
ルミナを約100μの厚さに溶射して片面にアルばす層
2をもつ銅箔を得た。次にこのようにして得たアルミナ
層に未硬化のエポ中シ樹脂を浴剤で希釈した液を會工け
により塗布して含浸させ、加熱炉忙投入して浦剤を除去
すると同時に樹脂のBステージ化を進め、室温でべたつ
かなiよう和した。このa脂で封孔処理したアルミナ溶
射1ll11箔と芯材となる厚さ1allの42@金板
4t−第1−のごとく重ね酋わせ、熱圧成形する仁とに
より一体化し、第2図に示す構成のメタルコア鋼張積層
1III′f:得た。
Alumina was thermally sprayed to a thickness of about 100 μm on one side of a copper foil 1 having a thickness of 55 μm by plasma spraying to obtain a copper foil having an aluminum layer 2 on one side. Next, a solution of uncured epoxy medium resin diluted with a bath agent is applied to the alumina layer obtained in this way to impregnate it, and the alumina layer is heated in a heating furnace to remove the surfactant and at the same time, the resin is The mixture was made into a B stage, and the mixture was heated to a sticky state at room temperature. The alumina thermal sprayed 1ll11 foil sealed with this A fat and the core material of 1all thick 42@gold plate 4t - No. 1 - are stacked together as shown in Figure 2. A metal core steel clad laminate 1III'f having the configuration shown was obtained.

このメタルコア鋼張積層板は非常に萬−熱放散性を有し
、吸湿時の電気特性の低下はみられなかった。また、回
゛路の形成は一般の鋼張メタルコア基板と同様の方法で
行うことができた。
This metal core steel clad laminate had excellent heat dissipation properties, and no deterioration in electrical properties was observed when moisture was absorbed. Furthermore, the circuit could be formed in the same manner as for a general steel-clad metal core substrate.

さら忙基板にそりの発生は酷められす、熱膨饋係数は5
X6X10−・7℃と従来のメタルコア金属張積層板の
12へ15X10’″′/℃に比べて非常に低いもので
あった。
Furthermore, warpage is more likely to occur on busy boards, and the coefficient of thermal expansion is 5.
The temperature was very low compared to the conventional metal core metal clad laminate which was 12 to 15 x 10''''/°C.

(発明の効果ン 本発明の方法により、従来のメタルコア基板では得られ
なかった熱放散性にすぐn、しかも吸湿時の電気特性に
もすぐれた基板、また、シリコンチップ、セラミックチ
ップ等の搭載m品に近−低熱膨張係数をもち、これらナ
ツツとの接続信頼性にすぐれた基板t−容易に得ること
ができる。
(Effects of the invention) By the method of the present invention, a substrate with excellent heat dissipation properties that could not be obtained with conventional metal core substrates, as well as excellent electrical properties when absorbing moisture, and mounting of silicon chips, ceramic chips, etc. A substrate having a low coefficient of thermal expansion and excellent connection reliability with these nuts can be easily obtained.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明のメタルコア金sr’s層職の積層構成
図、第2図は得らnたメタルコア金属張積層板の断面模
式図である。 符号の説明 1℃陥        2 アルミナ層3 エポキシ徊
脂層  442台金敬 第1図 第2図
FIG. 1 is a laminated structure diagram of the metal core gold SR's layer structure of the present invention, and FIG. 2 is a schematic cross-sectional view of the obtained metal core metal clad laminate. Explanation of code: 1°C drop 2 Alumina layer 3 Epoxy resin layer 442 units Kinkyo Figure 1 Figure 2

Claims (1)

【特許請求の範囲】 1、金属箔の片面にセラミック溶射層を形成し、該セラ
ミック溶射層の気孔に未硬化の熱硬化性樹脂を含浸させ
、該金属箔のセラミック溶射層側と接するように金属板
を重ね合わせ、これらを圧着して一体化することを特徴
とするメタルコア金属張積層板の製造方法。 2、セラミック溶射層と金属板の間にプリプレグを介在
させて圧着して一体化することを特徴とする特許請求の
範囲第1項記載のメタルコア金属張積層板の製造方法。 3、セラミックがアルミナを主成分とするものである特
許請求の範囲第1項または第2項記載のメタルコア金属
張積層板の製造方法。 4、セラミックの気孔に含浸する樹脂がエポキシ樹脂で
ある特許請求の範囲第1項または第2項記載のメタルコ
ア金属張積層板の製造方法。 5、セラミックの気孔に含浸する樹脂がポリイミド樹脂
である特許請求の範囲第1項または第2項記載のメタル
コア金属張積層板の製造方法。 6、金属箔が銅箔である特許請求の範囲第1項または第
2項記載のメタルコア金属張積層板の製造方法。 7、金属板が42合金または42合金を主体としたクラ
ッド板である特許請求の範囲第1項または第2項記載の
メタルコア金属張積層板の製造方法。 8、金属板がインバー合金、またをはインバー合金を主
体としたクラッド板である特許請求の範囲第1項または
第2項記載のメタルコア金属張積層板の製造方法。
[Claims] 1. A ceramic sprayed layer is formed on one side of a metal foil, and the pores of the ceramic sprayed layer are impregnated with an uncured thermosetting resin, so that the ceramic sprayed layer is in contact with the ceramic sprayed layer side of the metal foil. A method for manufacturing a metal core metal clad laminate, which comprises stacking metal plates and pressing them together to integrate them. 2. The method for manufacturing a metal core metal clad laminate according to claim 1, wherein the ceramic sprayed layer and the metal plate are integrated by interposing a prepreg and press-bonding the ceramic spray layer and the metal plate. 3. The method for manufacturing a metal core metal clad laminate according to claim 1 or 2, wherein the ceramic is mainly composed of alumina. 4. The method for manufacturing a metal core metal clad laminate according to claim 1 or 2, wherein the resin impregnated into the pores of the ceramic is an epoxy resin. 5. The method for manufacturing a metal core metal clad laminate according to claim 1 or 2, wherein the resin impregnated into the pores of the ceramic is a polyimide resin. 6. The method for manufacturing a metal core metal clad laminate according to claim 1 or 2, wherein the metal foil is copper foil. 7. The method for producing a metal core metal clad laminate according to claim 1 or 2, wherein the metal plate is a 42 alloy or a clad plate mainly composed of a 42 alloy. 8. The method for manufacturing a metal core metal clad laminate according to claim 1 or 2, wherein the metal plate is an invar alloy or a clad plate mainly composed of an invar alloy.
JP30937486A 1986-12-29 1986-12-29 Manufacture of metallic core metal-clad laminated board Pending JPS63166533A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP30937486A JPS63166533A (en) 1986-12-29 1986-12-29 Manufacture of metallic core metal-clad laminated board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP30937486A JPS63166533A (en) 1986-12-29 1986-12-29 Manufacture of metallic core metal-clad laminated board

Publications (1)

Publication Number Publication Date
JPS63166533A true JPS63166533A (en) 1988-07-09

Family

ID=17992231

Family Applications (1)

Application Number Title Priority Date Filing Date
JP30937486A Pending JPS63166533A (en) 1986-12-29 1986-12-29 Manufacture of metallic core metal-clad laminated board

Country Status (1)

Country Link
JP (1) JPS63166533A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1035164A (en) * 1996-04-25 1998-02-10 Samsung Aerospace Ind Ltd Ic card and manufacture thereof

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1035164A (en) * 1996-04-25 1998-02-10 Samsung Aerospace Ind Ltd Ic card and manufacture thereof

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