JPS6313336B2 - - Google Patents

Info

Publication number
JPS6313336B2
JPS6313336B2 JP54108944A JP10894479A JPS6313336B2 JP S6313336 B2 JPS6313336 B2 JP S6313336B2 JP 54108944 A JP54108944 A JP 54108944A JP 10894479 A JP10894479 A JP 10894479A JP S6313336 B2 JPS6313336 B2 JP S6313336B2
Authority
JP
Japan
Prior art keywords
mask
photomask
cassette
cleaning
cleaning device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP54108944A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5632728A (en
Inventor
Takeshi Yoshizawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP10894479A priority Critical patent/JPS5632728A/ja
Publication of JPS5632728A publication Critical patent/JPS5632728A/ja
Publication of JPS6313336B2 publication Critical patent/JPS6313336B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
JP10894479A 1979-08-27 1979-08-27 Mask washing apparatus Granted JPS5632728A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10894479A JPS5632728A (en) 1979-08-27 1979-08-27 Mask washing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10894479A JPS5632728A (en) 1979-08-27 1979-08-27 Mask washing apparatus

Publications (2)

Publication Number Publication Date
JPS5632728A JPS5632728A (en) 1981-04-02
JPS6313336B2 true JPS6313336B2 (enrdf_load_stackoverflow) 1988-03-25

Family

ID=14497598

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10894479A Granted JPS5632728A (en) 1979-08-27 1979-08-27 Mask washing apparatus

Country Status (1)

Country Link
JP (1) JPS5632728A (enrdf_load_stackoverflow)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57207254A (en) * 1981-06-15 1982-12-18 Toshiba Corp Mask storage system
JPS59195653A (ja) * 1983-04-21 1984-11-06 Nec Corp フオトマスクの洗浄方法および洗浄装置
JPH0695508B2 (ja) * 1986-11-28 1994-11-24 大日本スクリ−ン製造株式会社 基板の両面洗浄装置

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5371565A (en) * 1976-12-08 1978-06-26 Hitachi Ltd Reticule washing equipment

Also Published As

Publication number Publication date
JPS5632728A (en) 1981-04-02

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