JPS5632728A - Mask washing apparatus - Google Patents
Mask washing apparatusInfo
- Publication number
- JPS5632728A JPS5632728A JP10894479A JP10894479A JPS5632728A JP S5632728 A JPS5632728 A JP S5632728A JP 10894479 A JP10894479 A JP 10894479A JP 10894479 A JP10894479 A JP 10894479A JP S5632728 A JPS5632728 A JP S5632728A
- Authority
- JP
- Japan
- Prior art keywords
- mask
- washing
- clampers
- cassette
- vertically positioned
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
PURPOSE:To prevent the injury of the fingers by carrying a photo-mask; washing both surfaces of the mask with the mask being vertically positioned; and automatically performing the uniform washing. CONSTITUTION:A cassette 6 enclosing a mask 7 is placed on a slider 3, and washing drums 20 and 20' are rotated. When clampers 9 and 9' are diven to hold the mask 7 in the cassette 6, the upper and lower ends of the mask 7 move the tapered channels of the clampers and the mask 7 is vertically positioned. At this time, an air cylinder 12 is driven to draw holders 17 and 17' nearer and to compress and hold the right and left edges 7b and 7b' of the mask. Then, the clampers are brought back, and an air cylinder 11 is driven to send te mask 7 to rotary drums 20 and 20' on a rail 19. Pure water is supplied from holes 20b and 20b', and washing is performed by sponges 20a and 20a'. Since the mask 7 is vertically positioned by the drums 20 and 20', both surfaces are washed completely independently, and one surface is not contaminated by the other surface. After the washing, the mask and the holders are brought back and enclosed in the grooves of the cassette, thereby, the holding is released, and the mask washing is finished.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10894479A JPS5632728A (en) | 1979-08-27 | 1979-08-27 | Mask washing apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10894479A JPS5632728A (en) | 1979-08-27 | 1979-08-27 | Mask washing apparatus |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5632728A true JPS5632728A (en) | 1981-04-02 |
JPS6313336B2 JPS6313336B2 (en) | 1988-03-25 |
Family
ID=14497598
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10894479A Granted JPS5632728A (en) | 1979-08-27 | 1979-08-27 | Mask washing apparatus |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5632728A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57207254A (en) * | 1981-06-15 | 1982-12-18 | Toshiba Corp | Mask storage system |
JPS59195653A (en) * | 1983-04-21 | 1984-11-06 | Nec Corp | Method and device for washing photomask |
JPS63137429A (en) * | 1986-11-28 | 1988-06-09 | Dainippon Screen Mfg Co Ltd | Apparatus for washing both surface of substrate |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5371565A (en) * | 1976-12-08 | 1978-06-26 | Hitachi Ltd | Reticule washing equipment |
-
1979
- 1979-08-27 JP JP10894479A patent/JPS5632728A/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5371565A (en) * | 1976-12-08 | 1978-06-26 | Hitachi Ltd | Reticule washing equipment |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57207254A (en) * | 1981-06-15 | 1982-12-18 | Toshiba Corp | Mask storage system |
JPS59195653A (en) * | 1983-04-21 | 1984-11-06 | Nec Corp | Method and device for washing photomask |
JPS63137429A (en) * | 1986-11-28 | 1988-06-09 | Dainippon Screen Mfg Co Ltd | Apparatus for washing both surface of substrate |
Also Published As
Publication number | Publication date |
---|---|
JPS6313336B2 (en) | 1988-03-25 |
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