JPS63119553A - 半導体製造装置 - Google Patents

半導体製造装置

Info

Publication number
JPS63119553A
JPS63119553A JP26621186A JP26621186A JPS63119553A JP S63119553 A JPS63119553 A JP S63119553A JP 26621186 A JP26621186 A JP 26621186A JP 26621186 A JP26621186 A JP 26621186A JP S63119553 A JPS63119553 A JP S63119553A
Authority
JP
Japan
Prior art keywords
flame
hydrogen
semiconductor device
dry air
marking
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP26621186A
Other languages
English (en)
Japanese (ja)
Other versions
JPH047105B2 (enExample
Inventor
Tetsuji Miyamoto
宮本　哲次
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP26621186A priority Critical patent/JPS63119553A/ja
Publication of JPS63119553A publication Critical patent/JPS63119553A/ja
Publication of JPH047105B2 publication Critical patent/JPH047105B2/ja
Granted legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/08—Surface shaping of articles, e.g. embossing; Apparatus therefor by flame treatment ; using hot gases

Landscapes

  • Non-Volatile Memory (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP26621186A 1986-11-07 1986-11-07 半導体製造装置 Granted JPS63119553A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP26621186A JPS63119553A (ja) 1986-11-07 1986-11-07 半導体製造装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP26621186A JPS63119553A (ja) 1986-11-07 1986-11-07 半導体製造装置

Publications (2)

Publication Number Publication Date
JPS63119553A true JPS63119553A (ja) 1988-05-24
JPH047105B2 JPH047105B2 (enExample) 1992-02-07

Family

ID=17427804

Family Applications (1)

Application Number Title Priority Date Filing Date
JP26621186A Granted JPS63119553A (ja) 1986-11-07 1986-11-07 半導体製造装置

Country Status (1)

Country Link
JP (1) JPS63119553A (enExample)

Also Published As

Publication number Publication date
JPH047105B2 (enExample) 1992-02-07

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