JPS628513B2 - - Google Patents

Info

Publication number
JPS628513B2
JPS628513B2 JP960080A JP960080A JPS628513B2 JP S628513 B2 JPS628513 B2 JP S628513B2 JP 960080 A JP960080 A JP 960080A JP 960080 A JP960080 A JP 960080A JP S628513 B2 JPS628513 B2 JP S628513B2
Authority
JP
Japan
Prior art keywords
oxide film
silicon oxide
exposed
negative resist
resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP960080A
Other languages
English (en)
Japanese (ja)
Other versions
JPS56108880A (en
Inventor
Akira Abiru
Yoshiaki Tanimoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP960080A priority Critical patent/JPS56108880A/ja
Publication of JPS56108880A publication Critical patent/JPS56108880A/ja
Publication of JPS628513B2 publication Critical patent/JPS628513B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
JP960080A 1980-01-30 1980-01-30 Selectively etching method for silicon oxide film Granted JPS56108880A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP960080A JPS56108880A (en) 1980-01-30 1980-01-30 Selectively etching method for silicon oxide film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP960080A JPS56108880A (en) 1980-01-30 1980-01-30 Selectively etching method for silicon oxide film

Publications (2)

Publication Number Publication Date
JPS56108880A JPS56108880A (en) 1981-08-28
JPS628513B2 true JPS628513B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1987-02-23

Family

ID=11724801

Family Applications (1)

Application Number Title Priority Date Filing Date
JP960080A Granted JPS56108880A (en) 1980-01-30 1980-01-30 Selectively etching method for silicon oxide film

Country Status (1)

Country Link
JP (1) JPS56108880A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0718012B2 (ja) * 1985-11-13 1995-03-01 日本電気株式会社 表面選択処理方法

Also Published As

Publication number Publication date
JPS56108880A (en) 1981-08-28

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