JPS6271215A - ウエハ接合装置 - Google Patents
ウエハ接合装置Info
- Publication number
- JPS6271215A JPS6271215A JP21143885A JP21143885A JPS6271215A JP S6271215 A JPS6271215 A JP S6271215A JP 21143885 A JP21143885 A JP 21143885A JP 21143885 A JP21143885 A JP 21143885A JP S6271215 A JPS6271215 A JP S6271215A
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- wafers
- peripheral edge
- gradually
- bonding apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 235000012431 wafers Nutrition 0.000 claims abstract description 126
- 230000002093 peripheral effect Effects 0.000 claims abstract description 17
- 238000011084 recovery Methods 0.000 abstract 2
- 238000010586 diagram Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 238000011282 treatment Methods 0.000 description 1
Landscapes
- Recrystallisation Techniques (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21143885A JPS6271215A (ja) | 1985-09-25 | 1985-09-25 | ウエハ接合装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21143885A JPS6271215A (ja) | 1985-09-25 | 1985-09-25 | ウエハ接合装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6271215A true JPS6271215A (ja) | 1987-04-01 |
JPH044743B2 JPH044743B2 (enrdf_load_stackoverflow) | 1992-01-29 |
Family
ID=16605954
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP21143885A Granted JPS6271215A (ja) | 1985-09-25 | 1985-09-25 | ウエハ接合装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6271215A (enrdf_load_stackoverflow) |
Cited By (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01169917A (ja) * | 1987-12-24 | 1989-07-05 | Fujitsu Ltd | ウェーハの接着方法 |
US5131968A (en) * | 1990-07-31 | 1992-07-21 | Motorola, Inc. | Gradient chuck method for wafer bonding employing a convex pressure |
US5273553A (en) * | 1989-08-28 | 1993-12-28 | Kabushiki Kaisha Toshiba | Apparatus for bonding semiconductor substrates |
US5300175A (en) * | 1993-01-04 | 1994-04-05 | Motorola, Inc. | Method for mounting a wafer to a submount |
US5314107A (en) * | 1992-12-31 | 1994-05-24 | Motorola, Inc. | Automated method for joining wafers |
US5478782A (en) * | 1992-05-25 | 1995-12-26 | Sony Corporation | Method bonding for production of SOI transistor device |
US5964978A (en) * | 1997-03-31 | 1999-10-12 | Shin-Etsu Handotai Co., Ltd. | Method and apparatus for adhesion of semiconductor substrate |
USRE36890E (en) * | 1990-07-31 | 2000-10-03 | Motorola, Inc. | Gradient chuck method for wafer bonding employing a convex pressure |
WO2007127825A3 (en) * | 2006-04-28 | 2008-04-10 | Hewlett Packard Development Co | Fabrication tool for bonding |
JP2010087278A (ja) * | 2008-09-30 | 2010-04-15 | Mitsubishi Heavy Ind Ltd | ウェハ接合装置およびウェハ接合方法 |
US7927975B2 (en) | 2009-02-04 | 2011-04-19 | Micron Technology, Inc. | Semiconductor material manufacture |
US10800141B2 (en) | 2016-09-23 | 2020-10-13 | Apple Inc. | Electronic device having a glass component with crack hindering internal stress regions |
US11066322B2 (en) | 2017-12-01 | 2021-07-20 | Apple Inc. | Selectively heat-treated glass-ceramic for an electronic device |
US11419231B1 (en) | 2016-09-22 | 2022-08-16 | Apple Inc. | Forming glass covers for electronic devices |
US11420900B2 (en) | 2018-09-26 | 2022-08-23 | Apple Inc. | Localized control of bulk material properties |
US11460892B2 (en) | 2020-03-28 | 2022-10-04 | Apple Inc. | Glass cover member for an electronic device enclosure |
US11535551B2 (en) | 2016-09-23 | 2022-12-27 | Apple Inc. | Thermoformed cover glass for an electronic device |
US11565506B2 (en) | 2016-09-23 | 2023-01-31 | Apple Inc. | Thermoformed cover glass for an electronic device |
US11666273B2 (en) | 2020-05-20 | 2023-06-06 | Apple Inc. | Electronic device enclosure including a glass ceramic region |
US11680010B2 (en) | 2019-07-09 | 2023-06-20 | Apple Inc. | Evaluation of transparent components for electronic devices |
US11927988B2 (en) | 2020-03-28 | 2024-03-12 | Apple Inc. | Glass cover member for an electronic device enclosure |
US11945048B2 (en) | 2020-12-23 | 2024-04-02 | Apple Inc. | Laser-based cutting of transparent components for an electronic device |
US12065372B2 (en) | 2020-12-17 | 2024-08-20 | Apple Inc. | Fluid forming a glass component for a portable electronic device |
US12195379B2 (en) | 2020-12-17 | 2025-01-14 | Apple Inc. | Forming and bonding of glass components for portable electronic devices |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58116734A (ja) * | 1981-12-29 | 1983-07-12 | Canon Inc | 露光装置 |
JPS61145839A (ja) * | 1984-12-20 | 1986-07-03 | Toshiba Corp | 半導体ウエ−ハの接着方法および接着治具 |
-
1985
- 1985-09-25 JP JP21143885A patent/JPS6271215A/ja active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58116734A (ja) * | 1981-12-29 | 1983-07-12 | Canon Inc | 露光装置 |
JPS61145839A (ja) * | 1984-12-20 | 1986-07-03 | Toshiba Corp | 半導体ウエ−ハの接着方法および接着治具 |
Cited By (29)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01169917A (ja) * | 1987-12-24 | 1989-07-05 | Fujitsu Ltd | ウェーハの接着方法 |
US5273553A (en) * | 1989-08-28 | 1993-12-28 | Kabushiki Kaisha Toshiba | Apparatus for bonding semiconductor substrates |
USRE36890E (en) * | 1990-07-31 | 2000-10-03 | Motorola, Inc. | Gradient chuck method for wafer bonding employing a convex pressure |
US5131968A (en) * | 1990-07-31 | 1992-07-21 | Motorola, Inc. | Gradient chuck method for wafer bonding employing a convex pressure |
US5478782A (en) * | 1992-05-25 | 1995-12-26 | Sony Corporation | Method bonding for production of SOI transistor device |
US5523254A (en) * | 1992-05-25 | 1996-06-04 | Sony Corporation | Method for production of SOI transistor device and SOI transistor |
US5314107A (en) * | 1992-12-31 | 1994-05-24 | Motorola, Inc. | Automated method for joining wafers |
US5300175A (en) * | 1993-01-04 | 1994-04-05 | Motorola, Inc. | Method for mounting a wafer to a submount |
US5964978A (en) * | 1997-03-31 | 1999-10-12 | Shin-Etsu Handotai Co., Ltd. | Method and apparatus for adhesion of semiconductor substrate |
WO2007127825A3 (en) * | 2006-04-28 | 2008-04-10 | Hewlett Packard Development Co | Fabrication tool for bonding |
JP2009535823A (ja) * | 2006-04-28 | 2009-10-01 | ヒューレット−パッカード デベロップメント カンパニー エル.ピー. | 接合用の製造ツール |
US7866364B2 (en) | 2006-04-28 | 2011-01-11 | Hewlett-Packard Development Company, L.P. | Fabrication tool for bonding |
JP2010087278A (ja) * | 2008-09-30 | 2010-04-15 | Mitsubishi Heavy Ind Ltd | ウェハ接合装置およびウェハ接合方法 |
US9130000B2 (en) | 2008-09-30 | 2015-09-08 | Mitsubishi Heavy Industries | Wafer bonding device and wafer bonding method |
US8389385B2 (en) | 2009-02-04 | 2013-03-05 | Micron Technology, Inc. | Semiconductor material manufacture |
US7927975B2 (en) | 2009-02-04 | 2011-04-19 | Micron Technology, Inc. | Semiconductor material manufacture |
US11419231B1 (en) | 2016-09-22 | 2022-08-16 | Apple Inc. | Forming glass covers for electronic devices |
US11535551B2 (en) | 2016-09-23 | 2022-12-27 | Apple Inc. | Thermoformed cover glass for an electronic device |
US10800141B2 (en) | 2016-09-23 | 2020-10-13 | Apple Inc. | Electronic device having a glass component with crack hindering internal stress regions |
US11565506B2 (en) | 2016-09-23 | 2023-01-31 | Apple Inc. | Thermoformed cover glass for an electronic device |
US11066322B2 (en) | 2017-12-01 | 2021-07-20 | Apple Inc. | Selectively heat-treated glass-ceramic for an electronic device |
US11420900B2 (en) | 2018-09-26 | 2022-08-23 | Apple Inc. | Localized control of bulk material properties |
US11680010B2 (en) | 2019-07-09 | 2023-06-20 | Apple Inc. | Evaluation of transparent components for electronic devices |
US11460892B2 (en) | 2020-03-28 | 2022-10-04 | Apple Inc. | Glass cover member for an electronic device enclosure |
US11927988B2 (en) | 2020-03-28 | 2024-03-12 | Apple Inc. | Glass cover member for an electronic device enclosure |
US11666273B2 (en) | 2020-05-20 | 2023-06-06 | Apple Inc. | Electronic device enclosure including a glass ceramic region |
US12065372B2 (en) | 2020-12-17 | 2024-08-20 | Apple Inc. | Fluid forming a glass component for a portable electronic device |
US12195379B2 (en) | 2020-12-17 | 2025-01-14 | Apple Inc. | Forming and bonding of glass components for portable electronic devices |
US11945048B2 (en) | 2020-12-23 | 2024-04-02 | Apple Inc. | Laser-based cutting of transparent components for an electronic device |
Also Published As
Publication number | Publication date |
---|---|
JPH044743B2 (enrdf_load_stackoverflow) | 1992-01-29 |
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