JPS6257263A - ジヨセフソン集積回路の製造方法 - Google Patents
ジヨセフソン集積回路の製造方法Info
- Publication number
- JPS6257263A JPS6257263A JP60195946A JP19594685A JPS6257263A JP S6257263 A JPS6257263 A JP S6257263A JP 60195946 A JP60195946 A JP 60195946A JP 19594685 A JP19594685 A JP 19594685A JP S6257263 A JPS6257263 A JP S6257263A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- etching mask
- junction
- bonding
- etching
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 20
- 238000005530 etching Methods 0.000 claims abstract description 58
- 230000004888 barrier function Effects 0.000 claims abstract description 16
- 239000000758 substrate Substances 0.000 claims abstract description 12
- 239000000463 material Substances 0.000 claims abstract description 6
- 239000000470 constituent Substances 0.000 claims description 23
- 238000000034 method Methods 0.000 claims description 8
- 239000002887 superconductor Substances 0.000 claims description 2
- 229910052758 niobium Inorganic materials 0.000 description 7
- 239000010955 niobium Substances 0.000 description 7
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 7
- 229920002120 photoresistant polymer Polymers 0.000 description 7
- 230000003647 oxidation Effects 0.000 description 6
- 238000007254 oxidation reaction Methods 0.000 description 6
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- 238000007740 vapor deposition Methods 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 3
- 238000000059 patterning Methods 0.000 description 3
- 238000001020 plasma etching Methods 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 230000010354 integration Effects 0.000 description 2
- 238000005304 joining Methods 0.000 description 2
- 230000001737 promoting effect Effects 0.000 description 2
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000008054 signal transmission Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N69/00—Integrated devices, or assemblies of multiple devices, comprising at least one superconducting element covered by group H10N60/00
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N60/00—Superconducting devices
- H10N60/01—Manufacture or treatment
- H10N60/0912—Manufacture or treatment of Josephson-effect devices
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Superconductor Devices And Manufacturing Methods Thereof (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60195946A JPS6257263A (ja) | 1985-09-06 | 1985-09-06 | ジヨセフソン集積回路の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60195946A JPS6257263A (ja) | 1985-09-06 | 1985-09-06 | ジヨセフソン集積回路の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6257263A true JPS6257263A (ja) | 1987-03-12 |
| JPH0322711B2 JPH0322711B2 (enrdf_load_stackoverflow) | 1991-03-27 |
Family
ID=16349601
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60195946A Granted JPS6257263A (ja) | 1985-09-06 | 1985-09-06 | ジヨセフソン集積回路の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6257263A (enrdf_load_stackoverflow) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP3422412A3 (en) * | 2009-02-27 | 2019-05-01 | D-Wave Systems Inc. | Superconducting integrated circuit |
| US11856871B2 (en) | 2018-11-13 | 2023-12-26 | D-Wave Systems Inc. | Quantum processors |
| US11930721B2 (en) | 2012-03-08 | 2024-03-12 | 1372934 B.C. Ltd. | Systems and methods for fabrication of superconducting integrated circuits |
| US11957065B2 (en) | 2017-02-01 | 2024-04-09 | 1372934 B.C. Ltd. | Systems and methods for fabrication of superconducting integrated circuits |
| US12102017B2 (en) | 2019-02-15 | 2024-09-24 | D-Wave Systems Inc. | Kinetic inductance for couplers and compact qubits |
| US12367412B2 (en) | 2019-12-05 | 2025-07-22 | 1372934 B.C. Ltd. | Systems and methods for fabricating flux trap mitigating superconducting integrated circuits |
| US12376501B2 (en) | 2020-05-11 | 2025-07-29 | 1372934 B.C. Ltd. | Kinetic inductance devices, methods for fabricating kinetic inductance devices, and articles employing the same |
| US12392823B2 (en) | 2021-11-05 | 2025-08-19 | D-Wave Systems Inc. | Systems and methods for on-chip noise measurements |
-
1985
- 1985-09-06 JP JP60195946A patent/JPS6257263A/ja active Granted
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP3422412A3 (en) * | 2009-02-27 | 2019-05-01 | D-Wave Systems Inc. | Superconducting integrated circuit |
| US10991755B2 (en) | 2009-02-27 | 2021-04-27 | D-Wave Systems Inc. | Systems and methods for fabrication of superconducting integrated circuits |
| US11930721B2 (en) | 2012-03-08 | 2024-03-12 | 1372934 B.C. Ltd. | Systems and methods for fabrication of superconducting integrated circuits |
| US11957065B2 (en) | 2017-02-01 | 2024-04-09 | 1372934 B.C. Ltd. | Systems and methods for fabrication of superconducting integrated circuits |
| US11856871B2 (en) | 2018-11-13 | 2023-12-26 | D-Wave Systems Inc. | Quantum processors |
| US12102017B2 (en) | 2019-02-15 | 2024-09-24 | D-Wave Systems Inc. | Kinetic inductance for couplers and compact qubits |
| US12367412B2 (en) | 2019-12-05 | 2025-07-22 | 1372934 B.C. Ltd. | Systems and methods for fabricating flux trap mitigating superconducting integrated circuits |
| US12376501B2 (en) | 2020-05-11 | 2025-07-29 | 1372934 B.C. Ltd. | Kinetic inductance devices, methods for fabricating kinetic inductance devices, and articles employing the same |
| US12392823B2 (en) | 2021-11-05 | 2025-08-19 | D-Wave Systems Inc. | Systems and methods for on-chip noise measurements |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0322711B2 (enrdf_load_stackoverflow) | 1991-03-27 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |