JPS6255700B2 - - Google Patents

Info

Publication number
JPS6255700B2
JPS6255700B2 JP53086095A JP8609578A JPS6255700B2 JP S6255700 B2 JPS6255700 B2 JP S6255700B2 JP 53086095 A JP53086095 A JP 53086095A JP 8609578 A JP8609578 A JP 8609578A JP S6255700 B2 JPS6255700 B2 JP S6255700B2
Authority
JP
Japan
Prior art keywords
substrate
sputtering method
insulator
bias sputtering
elements
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP53086095A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5513904A (en
Inventor
Sukeyoshi Tsunekawa
Yukyoshi Harada
Yoshio Pponma
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP8609578A priority Critical patent/JPS5513904A/ja
Publication of JPS5513904A publication Critical patent/JPS5513904A/ja
Publication of JPS6255700B2 publication Critical patent/JPS6255700B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Element Separation (AREA)
JP8609578A 1978-07-17 1978-07-17 Semiconductor device and its manufacturing method Granted JPS5513904A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8609578A JPS5513904A (en) 1978-07-17 1978-07-17 Semiconductor device and its manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8609578A JPS5513904A (en) 1978-07-17 1978-07-17 Semiconductor device and its manufacturing method

Publications (2)

Publication Number Publication Date
JPS5513904A JPS5513904A (en) 1980-01-31
JPS6255700B2 true JPS6255700B2 (enExample) 1987-11-20

Family

ID=13877141

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8609578A Granted JPS5513904A (en) 1978-07-17 1978-07-17 Semiconductor device and its manufacturing method

Country Status (1)

Country Link
JP (1) JPS5513904A (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4374011A (en) * 1981-05-08 1983-02-15 Fairchild Camera & Instrument Corp. Process for fabricating non-encroaching planar insulating regions in integrated circuit structures
JPS583248A (ja) * 1981-06-30 1983-01-10 Toshiba Corp バイポ−ラ型半導体装置の製造方法
JPS6070741A (ja) * 1983-09-26 1985-04-22 Mitsubishi Electric Corp 素子間分離方法
JPS6294955A (ja) * 1985-10-21 1987-05-01 Nec Corp 素子分離方法
WO2007000808A1 (ja) * 2005-06-28 2007-01-04 Spansion Llc 半導体装置およびその製造方法

Also Published As

Publication number Publication date
JPS5513904A (en) 1980-01-31

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