JPS6247663B2 - - Google Patents
Info
- Publication number
- JPS6247663B2 JPS6247663B2 JP58155178A JP15517883A JPS6247663B2 JP S6247663 B2 JPS6247663 B2 JP S6247663B2 JP 58155178 A JP58155178 A JP 58155178A JP 15517883 A JP15517883 A JP 15517883A JP S6247663 B2 JPS6247663 B2 JP S6247663B2
- Authority
- JP
- Japan
- Prior art keywords
- fine powder
- polishing
- polished
- less
- crystallized glass
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000005498 polishing Methods 0.000 claims description 37
- 239000000843 powder Substances 0.000 claims description 26
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 20
- 239000011521 glass Substances 0.000 claims description 19
- 238000000034 method Methods 0.000 claims description 16
- 239000002270 dispersing agent Substances 0.000 claims description 13
- 239000002245 particle Substances 0.000 claims description 12
- 239000007788 liquid Substances 0.000 claims description 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 8
- 229910052751 metal Inorganic materials 0.000 claims description 5
- 239000002184 metal Substances 0.000 claims description 5
- 125000005372 silanol group Chemical group 0.000 claims description 5
- 239000000377 silicon dioxide Substances 0.000 claims description 4
- 239000000725 suspension Substances 0.000 claims description 2
- 230000003746 surface roughness Effects 0.000 description 16
- 239000010409 thin film Substances 0.000 description 11
- 239000000758 substrate Substances 0.000 description 10
- 239000006061 abrasive grain Substances 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 7
- 238000005054 agglomeration Methods 0.000 description 5
- 230000002776 aggregation Effects 0.000 description 5
- 238000005520 cutting process Methods 0.000 description 5
- 239000000463 material Substances 0.000 description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229920006395 saturated elastomer Polymers 0.000 description 2
- 230000002393 scratching effect Effects 0.000 description 2
- 229910052718 tin Inorganic materials 0.000 description 2
- 229910052684 Cerium Inorganic materials 0.000 description 1
- 229910018068 Li 2 O Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910000420 cerium oxide Inorganic materials 0.000 description 1
- 230000002925 chemical effect Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229910052745 lead Inorganic materials 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 1
- 229910000889 permalloy Inorganic materials 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
- 238000004439 roughness measurement Methods 0.000 description 1
- 229910000702 sendust Inorganic materials 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58155178A JPS6048254A (ja) | 1983-08-24 | 1983-08-24 | 結晶化ガラスの精密研摩方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58155178A JPS6048254A (ja) | 1983-08-24 | 1983-08-24 | 結晶化ガラスの精密研摩方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6048254A JPS6048254A (ja) | 1985-03-15 |
| JPS6247663B2 true JPS6247663B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1987-10-08 |
Family
ID=15600194
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58155178A Granted JPS6048254A (ja) | 1983-08-24 | 1983-08-24 | 結晶化ガラスの精密研摩方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6048254A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
-
1983
- 1983-08-24 JP JP58155178A patent/JPS6048254A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6048254A (ja) | 1985-03-15 |