JPS6240375A - 硬質カ−ボン膜 - Google Patents
硬質カ−ボン膜Info
- Publication number
- JPS6240375A JPS6240375A JP60179025A JP17902585A JPS6240375A JP S6240375 A JPS6240375 A JP S6240375A JP 60179025 A JP60179025 A JP 60179025A JP 17902585 A JP17902585 A JP 17902585A JP S6240375 A JPS6240375 A JP S6240375A
- Authority
- JP
- Japan
- Prior art keywords
- carbon film
- hard carbon
- film
- plasma cvd
- cvd method
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Carbon And Carbon Compounds (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60179025A JPS6240375A (ja) | 1985-08-14 | 1985-08-14 | 硬質カ−ボン膜 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60179025A JPS6240375A (ja) | 1985-08-14 | 1985-08-14 | 硬質カ−ボン膜 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6240375A true JPS6240375A (ja) | 1987-02-21 |
| JPH0510426B2 JPH0510426B2 (en:Method) | 1993-02-09 |
Family
ID=16058796
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60179025A Granted JPS6240375A (ja) | 1985-08-14 | 1985-08-14 | 硬質カ−ボン膜 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6240375A (en:Method) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5275850A (en) * | 1988-04-20 | 1994-01-04 | Hitachi, Ltd. | Process for producing a magnetic disk having a metal containing hard carbon coating by plasma chemical vapor deposition under a negative self bias |
| JPH0649645A (ja) * | 1992-07-31 | 1994-02-22 | Yoshida Kogyo Kk <Ykk> | 硬質多層膜形成体およびその製造方法 |
| GB2338716A (en) * | 1998-06-26 | 1999-12-29 | Mclaughlin James A | RF plasma enhanced CVD where the substrate acts as a cathode |
| JP2007320142A (ja) * | 2006-05-31 | 2007-12-13 | Meisho Kiko Kk | ナノインプリント用モールド |
| JP2022023933A (ja) * | 2017-06-08 | 2022-02-08 | アプライド マテリアルズ インコーポレイテッド | ハードマスク及びその他のパターニング応用のための高密度低温炭素膜 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60145375A (ja) * | 1984-01-09 | 1985-07-31 | Nippon Telegr & Teleph Corp <Ntt> | Νb膜表面の不動態化処理方法 |
-
1985
- 1985-08-14 JP JP60179025A patent/JPS6240375A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60145375A (ja) * | 1984-01-09 | 1985-07-31 | Nippon Telegr & Teleph Corp <Ntt> | Νb膜表面の不動態化処理方法 |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5275850A (en) * | 1988-04-20 | 1994-01-04 | Hitachi, Ltd. | Process for producing a magnetic disk having a metal containing hard carbon coating by plasma chemical vapor deposition under a negative self bias |
| JPH0649645A (ja) * | 1992-07-31 | 1994-02-22 | Yoshida Kogyo Kk <Ykk> | 硬質多層膜形成体およびその製造方法 |
| GB2338716A (en) * | 1998-06-26 | 1999-12-29 | Mclaughlin James A | RF plasma enhanced CVD where the substrate acts as a cathode |
| GB2338716B (en) * | 1998-06-26 | 2003-04-02 | Mclaughlin James A | An apparatus and a method for coating diamond like carbon (DLC) or other vacuum depositable coatings onto a substrate |
| JP2007320142A (ja) * | 2006-05-31 | 2007-12-13 | Meisho Kiko Kk | ナノインプリント用モールド |
| JP2022023933A (ja) * | 2017-06-08 | 2022-02-08 | アプライド マテリアルズ インコーポレイテッド | ハードマスク及びその他のパターニング応用のための高密度低温炭素膜 |
| JP2023134494A (ja) * | 2017-06-08 | 2023-09-27 | アプライド マテリアルズ インコーポレイテッド | ハードマスク及びその他のパターニング応用のための高密度低温炭素膜 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0510426B2 (en:Method) | 1993-02-09 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US5227196A (en) | Method of forming a carbon film on a substrate made of an oxide material | |
| US5275850A (en) | Process for producing a magnetic disk having a metal containing hard carbon coating by plasma chemical vapor deposition under a negative self bias | |
| EP0221531A2 (en) | High heat conductive insulated substrate and method of manufacturing the same | |
| JPH07109034B2 (ja) | 硬質多層膜形成体およびその製造方法 | |
| JPS6171626A (ja) | グロー放電による硬質の炭素質膜の堆積方法及び該方法により堆積された膜を有する半導体デバイス | |
| JPS63239103A (ja) | 立方晶窒化硼素被覆体およびその製造法 | |
| US5431963A (en) | Method for adhering diamondlike carbon to a substrate | |
| WO1982003636A1 (fr) | Procede de gravure par voie seche de l'aluminium ou d'un alliage d'aluminium | |
| JPS6240375A (ja) | 硬質カ−ボン膜 | |
| Wendel et al. | Thin zirconium nitride films prepared by plasma-enhanced CVD | |
| JPH0643243B2 (ja) | タングステンカーバイトの製造方法 | |
| JPH02239622A (ja) | 安定化層のための保護層及びその製法 | |
| JPH06952B2 (ja) | 硬質カ−ボン膜 | |
| JP2006291355A (ja) | 非晶質炭素被膜部材 | |
| Zhang et al. | Optical transmittance of antireflective diamond-like coatings on ZnS substrates | |
| US5643637A (en) | Method of grading the electric field of an electrode | |
| JPS635468B2 (en:Method) | ||
| Ianno et al. | Plasma-enhanced chemical vapor deposition of molybdenum | |
| Biederman et al. | Carbon and composite carbon-metal films deposited in an rf glow discharge operated in organic gases | |
| EP0635871A2 (en) | High heat conductive insulated substrate and method of manufacturing the same | |
| JPH02149673A (ja) | カーボン硬質膜を被覆した部材 | |
| Alterovitz et al. | Ellipsometric and optical study of amorphous hydrogenated carbon films | |
| Aubry et al. | Molecular beam mass spectrometry analysis of gaseous species responsible for diamond deposition in microwave plasmas | |
| JPH0361369A (ja) | ダイヤモンド状炭素膜の製造方法 | |
| JPS62116767A (ja) | カ−ボン硬質膜を被覆した金属部材 |