JPS623944B2 - - Google Patents
Info
- Publication number
- JPS623944B2 JPS623944B2 JP20904481A JP20904481A JPS623944B2 JP S623944 B2 JPS623944 B2 JP S623944B2 JP 20904481 A JP20904481 A JP 20904481A JP 20904481 A JP20904481 A JP 20904481A JP S623944 B2 JPS623944 B2 JP S623944B2
- Authority
- JP
- Japan
- Prior art keywords
- alignment mark
- alignment
- mark
- area
- wafer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000758 substrate Substances 0.000 claims description 24
- 239000000463 material Substances 0.000 claims description 6
- 229920002120 photoresistant polymer Polymers 0.000 claims description 4
- 238000000034 method Methods 0.000 description 19
- 239000011521 glass Substances 0.000 description 5
- 238000000206 photolithography Methods 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56209044A JPS58111037A (ja) | 1981-12-25 | 1981-12-25 | ホトマスク基板 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56209044A JPS58111037A (ja) | 1981-12-25 | 1981-12-25 | ホトマスク基板 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58111037A JPS58111037A (ja) | 1983-07-01 |
| JPS623944B2 true JPS623944B2 (fr) | 1987-01-28 |
Family
ID=16566324
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56209044A Granted JPS58111037A (ja) | 1981-12-25 | 1981-12-25 | ホトマスク基板 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58111037A (fr) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0750328B2 (ja) * | 1985-12-18 | 1995-05-31 | 株式会社日立製作所 | レチクル |
| CN103941541B (zh) * | 2014-04-11 | 2017-05-24 | 京东方科技集团股份有限公司 | 一种掩膜板污染区域的位置标识方法和装置 |
-
1981
- 1981-12-25 JP JP56209044A patent/JPS58111037A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS58111037A (ja) | 1983-07-01 |
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