JPS6238313B2 - - Google Patents
Info
- Publication number
- JPS6238313B2 JPS6238313B2 JP58016008A JP1600883A JPS6238313B2 JP S6238313 B2 JPS6238313 B2 JP S6238313B2 JP 58016008 A JP58016008 A JP 58016008A JP 1600883 A JP1600883 A JP 1600883A JP S6238313 B2 JPS6238313 B2 JP S6238313B2
- Authority
- JP
- Japan
- Prior art keywords
- vanadium
- film
- vanadium oxide
- glass
- temperature
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000011521 glass Substances 0.000 claims description 66
- XHCLAFWTIXFWPH-UHFFFAOYSA-N [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] XHCLAFWTIXFWPH-UHFFFAOYSA-N 0.000 claims description 55
- 229910001935 vanadium oxide Inorganic materials 0.000 claims description 55
- 239000000758 substrate Substances 0.000 claims description 44
- 238000002834 transmittance Methods 0.000 claims description 25
- 238000000576 coating method Methods 0.000 claims description 22
- 230000007704 transition Effects 0.000 claims description 20
- 239000011248 coating agent Substances 0.000 claims description 19
- 230000003287 optical effect Effects 0.000 claims description 19
- 230000003595 spectral effect Effects 0.000 claims description 9
- 230000005540 biological transmission Effects 0.000 claims description 6
- 239000010408 film Substances 0.000 description 72
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 20
- 239000007789 gas Substances 0.000 description 18
- 238000010438 heat treatment Methods 0.000 description 14
- 238000005229 chemical vapour deposition Methods 0.000 description 13
- 230000001590 oxidative effect Effects 0.000 description 13
- 238000000034 method Methods 0.000 description 12
- 150000003682 vanadium compounds Chemical class 0.000 description 12
- GRUMUEUJTSXQOI-UHFFFAOYSA-N vanadium dioxide Chemical compound O=[V]=O GRUMUEUJTSXQOI-UHFFFAOYSA-N 0.000 description 12
- 229910052757 nitrogen Inorganic materials 0.000 description 10
- 239000000523 sample Substances 0.000 description 10
- 239000007788 liquid Substances 0.000 description 8
- 239000004065 semiconductor Substances 0.000 description 8
- 229910052720 vanadium Inorganic materials 0.000 description 8
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 description 8
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 6
- 239000003570 air Substances 0.000 description 6
- 238000000151 deposition Methods 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 6
- GNTDGMZSJNCJKK-UHFFFAOYSA-N divanadium pentaoxide Chemical compound O=[V](=O)O[V](=O)=O GNTDGMZSJNCJKK-UHFFFAOYSA-N 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 239000002987 primer (paints) Substances 0.000 description 5
- 239000010409 thin film Substances 0.000 description 5
- 230000008016 vaporization Effects 0.000 description 5
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 4
- 238000001816 cooling Methods 0.000 description 4
- 239000005357 flat glass Substances 0.000 description 4
- 229910001887 tin oxide Inorganic materials 0.000 description 4
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 3
- 238000000137 annealing Methods 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 239000005329 float glass Substances 0.000 description 3
- 229930195733 hydrocarbon Natural products 0.000 description 3
- 150000002430 hydrocarbons Chemical class 0.000 description 3
- 239000011261 inert gas Substances 0.000 description 3
- 229910052741 iridium Inorganic materials 0.000 description 3
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 3
- 229910052750 molybdenum Inorganic materials 0.000 description 3
- 239000011733 molybdenum Substances 0.000 description 3
- 229910052758 niobium Inorganic materials 0.000 description 3
- 239000010955 niobium Substances 0.000 description 3
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- -1 silver halides Chemical class 0.000 description 3
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 3
- 229910052721 tungsten Inorganic materials 0.000 description 3
- 239000010937 tungsten Substances 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 2
- 239000005388 borosilicate glass Substances 0.000 description 2
- 239000003638 chemical reducing agent Substances 0.000 description 2
- ZHXZNKNQUHUIGN-UHFFFAOYSA-N chloro hypochlorite;vanadium Chemical compound [V].ClOCl ZHXZNKNQUHUIGN-UHFFFAOYSA-N 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 238000005286 illumination Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 230000004043 responsiveness Effects 0.000 description 2
- 229910052715 tantalum Inorganic materials 0.000 description 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 2
- BMTAFVWTTFSTOG-UHFFFAOYSA-N Butylate Chemical compound CCSC(=O)N(CC(C)C)CC(C)C BMTAFVWTTFSTOG-UHFFFAOYSA-N 0.000 description 1
- 208000030060 Congenital non-bullous ichthyosiform erythroderma Diseases 0.000 description 1
- 241000755266 Kathetostoma giganteum Species 0.000 description 1
- 238000006124 Pilkington process Methods 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- ISKQADXMHQSTHK-UHFFFAOYSA-N [4-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=C(CN)C=C1 ISKQADXMHQSTHK-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000012080 ambient air Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000004061 bleaching Methods 0.000 description 1
- BWKCCRPHMILRGD-UHFFFAOYSA-N chloro hypochlorite;tungsten Chemical compound [W].ClOCl BWKCCRPHMILRGD-UHFFFAOYSA-N 0.000 description 1
- RKTYLMNFRDHKIL-UHFFFAOYSA-N copper;5,10,15,20-tetraphenylporphyrin-22,24-diide Chemical compound [Cu+2].C1=CC(C(=C2C=CC([N-]2)=C(C=2C=CC=CC=2)C=2C=CC(N=2)=C(C=2C=CC=CC=2)C2=CC=C3[N-]2)C=2C=CC=CC=2)=NC1=C3C1=CC=CC=C1 RKTYLMNFRDHKIL-UHFFFAOYSA-N 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- KFAFTZQGYMGWLU-UHFFFAOYSA-N oxo(oxovanadiooxy)vanadium Chemical compound O=[V]O[V]=O KFAFTZQGYMGWLU-UHFFFAOYSA-N 0.000 description 1
- 239000010734 process oil Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 150000003482 tantalum compounds Chemical class 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 150000003658 tungsten compounds Chemical class 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/405—Oxides of refractory metals or yttrium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/245—Oxides by deposition from the vapour phase
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/218—V2O5, Nb2O5, Ta2O5
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/152—Deposition methods from the vapour phase by cvd
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/30—Aspects of methods for coating glass not covered above
- C03C2218/32—After-treatment
- C03C2218/324—De-oxidation
Landscapes
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Geochemistry & Mineralogy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Inorganic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Surface Treatment Of Glass (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US06/344,257 US4393095A (en) | 1982-02-01 | 1982-02-01 | Chemical vapor deposition of vanadium oxide coatings |
| US344906 | 1982-02-01 | ||
| US344257 | 1982-02-01 | ||
| US344860 | 1982-02-01 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58135154A JPS58135154A (ja) | 1983-08-11 |
| JPS6238313B2 true JPS6238313B2 (US06534493-20030318-C00166.png) | 1987-08-17 |
Family
ID=23349727
Family Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58016008A Granted JPS58135154A (ja) | 1982-02-01 | 1983-02-01 | 酸化バナジウムコ−ティング製品 |
| JP62062350A Pending JPS62256743A (ja) | 1982-02-01 | 1987-03-17 | サ−モクロミツクウインドガラスの製法 |
| JP62062349A Pending JPS62256742A (ja) | 1982-02-01 | 1987-03-17 | 酸化バナジウムフイルムの化学蒸着法 |
Family Applications After (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62062350A Pending JPS62256743A (ja) | 1982-02-01 | 1987-03-17 | サ−モクロミツクウインドガラスの製法 |
| JP62062349A Pending JPS62256742A (ja) | 1982-02-01 | 1987-03-17 | 酸化バナジウムフイルムの化学蒸着法 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US4393095A (US06534493-20030318-C00166.png) |
| JP (3) | JPS58135154A (US06534493-20030318-C00166.png) |
| BE (1) | BE895752A (US06534493-20030318-C00166.png) |
| CA (1) | CA1198019A (US06534493-20030318-C00166.png) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH041926U (US06534493-20030318-C00166.png) * | 1990-04-23 | 1992-01-09 |
Families Citing this family (67)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4837113A (en) * | 1987-07-16 | 1989-06-06 | Texas Instruments Incorporated | Method for depositing compound from group II-VI |
| US4822450A (en) * | 1987-07-16 | 1989-04-18 | Texas Instruments Incorporated | Processing apparatus and method |
| US4820377A (en) * | 1987-07-16 | 1989-04-11 | Texas Instruments Incorporated | Method for cleanup processing chamber and vacuum process module |
| US4842676A (en) * | 1987-07-16 | 1989-06-27 | Texas Instruments Incorporated | Process for etch of tungsten |
| US4872938A (en) * | 1987-07-16 | 1989-10-10 | Texas Instruments Incorporated | Processing apparatus |
| US4832779A (en) * | 1987-07-16 | 1989-05-23 | Texas Instruments Incorporated | Processing apparatus |
| US4904621A (en) * | 1987-07-16 | 1990-02-27 | Texas Instruments Incorporated | Remote plasma generation process using a two-stage showerhead |
| US4857132A (en) * | 1987-07-16 | 1989-08-15 | Texas Instruments Incorporated | Processing apparatus for wafers |
| US4863558A (en) * | 1987-07-16 | 1989-09-05 | Texas Instruments Incorporated | Method for etching tungsten |
| US4867841A (en) * | 1987-07-16 | 1989-09-19 | Texas Instruments Incorporated | Method for etch of polysilicon film |
| US4832777A (en) * | 1987-07-16 | 1989-05-23 | Texas Instruments Incorporated | Processing apparatus and method |
| US4830705A (en) * | 1987-07-16 | 1989-05-16 | Texas Instruments Incorporated | Method for etch of GaAs |
| US4838990A (en) * | 1987-07-16 | 1989-06-13 | Texas Instruments Incorporated | Method for plasma etching tungsten |
| US4818326A (en) * | 1987-07-16 | 1989-04-04 | Texas Instruments Incorporated | Processing apparatus |
| US4828649A (en) * | 1987-07-16 | 1989-05-09 | Texas Instruments Incorporated | Method for etching an aluminum film doped with silicon |
| US4830700A (en) * | 1987-07-16 | 1989-05-16 | Texas Instruments Incorporated | Processing apparatus and method |
| US4832778A (en) * | 1987-07-16 | 1989-05-23 | Texas Instruments Inc. | Processing apparatus for wafers |
| US4842687A (en) * | 1987-07-16 | 1989-06-27 | Texas Instruments Incorporated | Method for etching tungsten |
| US4849067A (en) * | 1987-07-16 | 1989-07-18 | Texas Instruments Incorporated | Method for etching tungsten |
| US4844773A (en) * | 1987-07-16 | 1989-07-04 | Texas Instruments Incorporated | Process for etching silicon nitride film |
| US4816098A (en) * | 1987-07-16 | 1989-03-28 | Texas Instruments Incorporated | Apparatus for transferring workpieces |
| US4855016A (en) * | 1987-07-16 | 1989-08-08 | Texas Instruments Incorporated | Method for etching aluminum film doped with copper |
| US4855160A (en) * | 1987-07-16 | 1989-08-08 | Texas Instruments Incorporated | Method for passivating wafer |
| US4838984A (en) * | 1987-07-16 | 1989-06-13 | Texas Instruments Incorporated | Method for etching films of mercury-cadmium-telluride and zinc sulfid |
| US4842686A (en) * | 1987-07-17 | 1989-06-27 | Texas Instruments Incorporated | Wafer processing apparatus and method |
| JP2588910B2 (ja) * | 1987-10-26 | 1997-03-12 | 日本板硝子株式会社 | 改良された調光体 |
| US5318108A (en) * | 1988-04-15 | 1994-06-07 | Midwest Research Institute | Gas-controlled dynamic vacuum insulation with gas gate |
| US4988533A (en) * | 1988-05-27 | 1991-01-29 | Texas Instruments Incorporated | Method for deposition of silicon oxide on a wafer |
| JPH0723235B2 (ja) * | 1989-02-23 | 1995-03-15 | 旭硝子株式会社 | 熱線反射物品 |
| US5103103A (en) * | 1990-07-19 | 1992-04-07 | Westinghouse Electric Corp. | Microwave shield |
| US5274241A (en) * | 1990-07-19 | 1993-12-28 | Westinghouse Electric Corp. | Optical and electromagnetic field |
| JP2735147B2 (ja) * | 1994-06-08 | 1998-04-02 | 工業技術院長 | サーモクロミック材料の製造法 |
| JP2764539B2 (ja) * | 1994-06-24 | 1998-06-11 | 工業技術院長 | サーモクロミック材料の製造方法 |
| US5580662A (en) * | 1995-03-09 | 1996-12-03 | Chunghwa Picture Tubes, Ltd. | Antistatic coating for video display screen |
| US5572086A (en) * | 1995-05-18 | 1996-11-05 | Chunghwa Picture Tubes, Ltd. | Broadband antireflective and antistatic coating for CRT |
| FR2738813B1 (fr) * | 1995-09-15 | 1997-10-17 | Saint Gobain Vitrage | Substrat a revetement photo-catalytique |
| US5652477A (en) * | 1995-11-08 | 1997-07-29 | Chunghwa Picture Tubes, Ltd. | Multilayer antistatic/antireflective coating for display device |
| US5773150A (en) * | 1995-11-17 | 1998-06-30 | Chunghwa Picture Tubes, Ltd. | Polymeric antistatic coating for cathode ray tubes |
| GB9619781D0 (en) * | 1996-09-23 | 1996-11-06 | Secr Defence | Multi layer interference coatings |
| US20020155299A1 (en) | 1997-03-14 | 2002-10-24 | Harris Caroline S. | Photo-induced hydrophilic article and method of making same |
| US7096692B2 (en) * | 1997-03-14 | 2006-08-29 | Ppg Industries Ohio, Inc. | Visible-light-responsive photoactive coating, coated article, and method of making same |
| US20030039843A1 (en) * | 1997-03-14 | 2003-02-27 | Christopher Johnson | Photoactive coating, coated article, and method of making same |
| US5989514A (en) * | 1997-07-21 | 1999-11-23 | Nanogram Corporation | Processing of vanadium oxide particles with heat |
| US6579612B1 (en) | 1999-06-24 | 2003-06-17 | International Business Machines Corporation | Magnetostrictive sensor structure |
| FR2809388B1 (fr) * | 2000-05-23 | 2002-12-20 | Saint Gobain Vitrage | Vitrage comprenant au moins une couche a proprietes thermochromes |
| US7323249B2 (en) * | 2000-08-31 | 2008-01-29 | Ppg Industries Ohio, Inc. | Methods of obtaining photoactive coatings and/or anatase crystalline phase of titanium oxides and articles made thereby |
| US6677063B2 (en) | 2000-08-31 | 2004-01-13 | Ppg Industries Ohio, Inc. | Methods of obtaining photoactive coatings and/or anatase crystalline phase of titanium oxides and articles made thereby |
| US6623662B2 (en) | 2001-05-23 | 2003-09-23 | Chunghwa Picture Tubes, Ltd. | Carbon black coating for CRT display screen with uniform light absorption |
| US6746530B2 (en) | 2001-08-02 | 2004-06-08 | Chunghwa Pictures Tubes, Ltd. | High contrast, moisture resistant antistatic/antireflective coating for CRT display screen |
| JP3849008B2 (ja) * | 2001-09-20 | 2006-11-22 | 独立行政法人産業技術総合研究所 | 高性能自動調光窓コーティング材料 |
| US6521346B1 (en) | 2001-09-27 | 2003-02-18 | Chunghwa Picture Tubes, Ltd. | Antistatic/antireflective coating for video display screen with improved refractivity |
| US6764580B2 (en) * | 2001-11-15 | 2004-07-20 | Chungwa Picture Tubes, Ltd. | Application of multi-layer antistatic/antireflective coating to video display screen by sputtering |
| US6656331B2 (en) | 2002-04-30 | 2003-12-02 | Chunghwa Picture Tubes, Ltd. | Application of antistatic/antireflective coating to a video display screen |
| JP4533996B2 (ja) * | 2005-01-28 | 2010-09-01 | 独立行政法人産業技術総合研究所 | 高断熱自動調光ガラス及びその製造方法 |
| TWI252150B (en) * | 2005-03-22 | 2006-04-01 | Speed Tech Corp | In mold decoration fabrication of injection molding |
| KR100842287B1 (ko) * | 2006-07-06 | 2008-06-30 | 한국전자통신연구원 | 급격한 금속-절연체 전이를 갖는 ｖ2ｏ3 박막의 제조방법 |
| WO2008004787A1 (en) * | 2006-07-06 | 2008-01-10 | Electronics And Telecommunications Research Institute | Method of forming vanadium trioxide thin film showing abrupt metal-insulator transition |
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| CN103014701A (zh) * | 2012-12-22 | 2013-04-03 | 蚌埠玻璃工业设计研究院 | 一种二氧化钒薄膜的制备方法 |
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| CN108515009A (zh) * | 2018-04-12 | 2018-09-11 | 四川星明能源环保科技有限公司 | A相二氧化钒薄膜及其制备方法 |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3483110A (en) * | 1967-05-19 | 1969-12-09 | Bell Telephone Labor Inc | Preparation of thin films of vanadium dioxide |
| JPS4989716A (US06534493-20030318-C00166.png) * | 1972-12-15 | 1974-08-27 | ||
| JPS4990313A (US06534493-20030318-C00166.png) * | 1972-12-21 | 1974-08-29 | ||
| JPS5141643A (ja) * | 1974-10-05 | 1976-04-08 | Daito Kiko Kk | Metsukyokaitenkago |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4307942A (en) * | 1974-05-20 | 1981-12-29 | The Southwall Corporation | Solar control system |
-
1982
- 1982-02-01 US US06/344,257 patent/US4393095A/en not_active Expired - Fee Related
-
1983
- 1983-01-31 CA CA000420619A patent/CA1198019A/en not_active Expired
- 1983-01-31 BE BE0/210006A patent/BE895752A/fr unknown
- 1983-02-01 JP JP58016008A patent/JPS58135154A/ja active Granted
-
1987
- 1987-03-17 JP JP62062350A patent/JPS62256743A/ja active Pending
- 1987-03-17 JP JP62062349A patent/JPS62256742A/ja active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3483110A (en) * | 1967-05-19 | 1969-12-09 | Bell Telephone Labor Inc | Preparation of thin films of vanadium dioxide |
| JPS4989716A (US06534493-20030318-C00166.png) * | 1972-12-15 | 1974-08-27 | ||
| JPS4990313A (US06534493-20030318-C00166.png) * | 1972-12-21 | 1974-08-29 | ||
| JPS5141643A (ja) * | 1974-10-05 | 1976-04-08 | Daito Kiko Kk | Metsukyokaitenkago |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH041926U (US06534493-20030318-C00166.png) * | 1990-04-23 | 1992-01-09 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62256743A (ja) | 1987-11-09 |
| BE895752A (fr) | 1983-08-01 |
| JPS58135154A (ja) | 1983-08-11 |
| CA1198019A (en) | 1985-12-17 |
| JPS62256742A (ja) | 1987-11-09 |
| US4393095A (en) | 1983-07-12 |
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