JPS6232610B2 - - Google Patents

Info

Publication number
JPS6232610B2
JPS6232610B2 JP54068427A JP6842779A JPS6232610B2 JP S6232610 B2 JPS6232610 B2 JP S6232610B2 JP 54068427 A JP54068427 A JP 54068427A JP 6842779 A JP6842779 A JP 6842779A JP S6232610 B2 JPS6232610 B2 JP S6232610B2
Authority
JP
Japan
Prior art keywords
mixer
thin film
types
substrate
molecular beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP54068427A
Other languages
English (en)
Japanese (ja)
Other versions
JPS55160422A (en
Inventor
Tsuneo Tanaka
Seiichi Nagata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP6842779A priority Critical patent/JPS55160422A/ja
Publication of JPS55160422A publication Critical patent/JPS55160422A/ja
Publication of JPS6232610B2 publication Critical patent/JPS6232610B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02612—Formation types
    • H01L21/02617—Deposition types
    • H01L21/02631—Physical deposition at reduced pressure, e.g. MBE, sputtering, evaporation

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Physical Vapour Deposition (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
JP6842779A 1979-05-31 1979-05-31 Method and device for thin film growth Granted JPS55160422A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6842779A JPS55160422A (en) 1979-05-31 1979-05-31 Method and device for thin film growth

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6842779A JPS55160422A (en) 1979-05-31 1979-05-31 Method and device for thin film growth

Publications (2)

Publication Number Publication Date
JPS55160422A JPS55160422A (en) 1980-12-13
JPS6232610B2 true JPS6232610B2 (de) 1987-07-15

Family

ID=13373374

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6842779A Granted JPS55160422A (en) 1979-05-31 1979-05-31 Method and device for thin film growth

Country Status (1)

Country Link
JP (1) JPS55160422A (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4599727B2 (ja) * 2001-02-21 2010-12-15 株式会社デンソー 蒸着装置
KR100651258B1 (ko) * 2004-10-11 2006-11-29 두산디앤디 주식회사 유기 박막 증착 공정용 멀티 노즐 도가니 장치
JP4841872B2 (ja) * 2005-06-23 2011-12-21 株式会社ユーテック 蒸発源及び蒸着装置
JP5685433B2 (ja) * 2010-12-15 2015-03-18 株式会社アルバック 蒸着装置及び蒸着方法
JP5943654B2 (ja) * 2012-03-08 2016-07-05 日立造船株式会社 蒸着材料ガス混合装置
JP6348790B2 (ja) * 2014-07-08 2018-06-27 長州産業株式会社 リング型蒸着源

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53110973A (en) * 1977-03-10 1978-09-28 Futaba Denshi Kogyo Kk Method and apparatus for manufacturing compounds

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53110973A (en) * 1977-03-10 1978-09-28 Futaba Denshi Kogyo Kk Method and apparatus for manufacturing compounds

Also Published As

Publication number Publication date
JPS55160422A (en) 1980-12-13

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