JPS6226175B2 - - Google Patents
Info
- Publication number
- JPS6226175B2 JPS6226175B2 JP19720782A JP19720782A JPS6226175B2 JP S6226175 B2 JPS6226175 B2 JP S6226175B2 JP 19720782 A JP19720782 A JP 19720782A JP 19720782 A JP19720782 A JP 19720782A JP S6226175 B2 JPS6226175 B2 JP S6226175B2
- Authority
- JP
- Japan
- Prior art keywords
- thin plate
- plate material
- tubular shaft
- guide body
- cleaning device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000463 material Substances 0.000 claims description 26
- 238000004140 cleaning Methods 0.000 claims description 25
- 239000011521 glass Substances 0.000 claims description 25
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 14
- 239000007788 liquid Substances 0.000 claims description 9
- 239000004065 semiconductor Substances 0.000 claims description 3
- 101100269850 Caenorhabditis elegans mask-1 gene Proteins 0.000 description 14
- 239000002184 metal Substances 0.000 description 4
- 239000007921 spray Substances 0.000 description 3
- 229910021642 ultra pure water Inorganic materials 0.000 description 3
- 239000012498 ultrapure water Substances 0.000 description 3
- 235000012431 wafers Nutrition 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000007261 regionalization Effects 0.000 description 1
- 238000006748 scratching Methods 0.000 description 1
- 230000002393 scratching effect Effects 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67046—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly scrubbing means, e.g. brushes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B1/00—Cleaning by methods involving the use of tools
- B08B1/30—Cleaning by methods involving the use of tools by movement of cleaning members over a surface
- B08B1/32—Cleaning by methods involving the use of tools by movement of cleaning members over a surface using rotary cleaning members
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Cleaning In General (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57197207A JPS5986226A (ja) | 1982-11-08 | 1982-11-08 | 薄板状材の洗浄装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57197207A JPS5986226A (ja) | 1982-11-08 | 1982-11-08 | 薄板状材の洗浄装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5986226A JPS5986226A (ja) | 1984-05-18 |
JPS6226175B2 true JPS6226175B2 (fr) | 1987-06-08 |
Family
ID=16370598
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP57197207A Granted JPS5986226A (ja) | 1982-11-08 | 1982-11-08 | 薄板状材の洗浄装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5986226A (fr) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE69620037T2 (de) * | 1995-10-13 | 2002-11-07 | Lam Res Corp | VORRICHTUNG ZUR aBGABE VON ZWEI CHEMISCHEN PRODUKTEN DURCH EINE BÜRSTE |
US5875507A (en) * | 1996-07-15 | 1999-03-02 | Oliver Design, Inc. | Wafer cleaning apparatus |
US6230753B1 (en) | 1996-07-15 | 2001-05-15 | Lam Research Corporation | Wafer cleaning apparatus |
US6247197B1 (en) | 1998-07-09 | 2001-06-19 | Lam Research Corporation | Brush interflow distributor |
US6240588B1 (en) * | 1999-12-03 | 2001-06-05 | Lam Research Corporation | Wafer scrubbing brush core |
WO2005065849A1 (fr) * | 2003-12-26 | 2005-07-21 | Aion Co., Ltd. | Mandrin pour rouleau éponge de lavage |
-
1982
- 1982-11-08 JP JP57197207A patent/JPS5986226A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS5986226A (ja) | 1984-05-18 |
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