JPS62230667A - 固体電解質磁器の製造法 - Google Patents
固体電解質磁器の製造法Info
- Publication number
- JPS62230667A JPS62230667A JP62065893A JP6589387A JPS62230667A JP S62230667 A JPS62230667 A JP S62230667A JP 62065893 A JP62065893 A JP 62065893A JP 6589387 A JP6589387 A JP 6589387A JP S62230667 A JPS62230667 A JP S62230667A
- Authority
- JP
- Japan
- Prior art keywords
- crystal grains
- porcelain
- zirconium oxide
- tetragonal
- less
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 13
- 239000000919 ceramic Substances 0.000 title 1
- 239000013078 crystal Substances 0.000 claims description 70
- 229910052573 porcelain Inorganic materials 0.000 claims description 41
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims description 34
- RKTYLMNFRDHKIL-UHFFFAOYSA-N copper;5,10,15,20-tetraphenylporphyrin-22,24-diide Chemical compound [Cu+2].C1=CC(C(=C2C=CC([N-]2)=C(C=2C=CC=CC=2)C=2C=CC(N=2)=C(C=2C=CC=CC=2)C2=CC=C3[N-]2)C=2C=CC=CC=2)=NC1=C3C1=CC=CC=C1 RKTYLMNFRDHKIL-UHFFFAOYSA-N 0.000 claims description 33
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims description 29
- 229910001928 zirconium oxide Inorganic materials 0.000 claims description 29
- 238000005245 sintering Methods 0.000 claims description 13
- 239000000203 mixture Substances 0.000 claims description 12
- 238000010304 firing Methods 0.000 claims description 11
- -1 yttrium compound Chemical class 0.000 claims description 9
- 229910052727 yttrium Inorganic materials 0.000 claims description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 5
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 3
- 239000004927 clay Substances 0.000 claims description 3
- 239000000377 silicon dioxide Substances 0.000 claims description 2
- 229910052570 clay Inorganic materials 0.000 claims 1
- 238000005452 bending Methods 0.000 description 15
- 238000012360 testing method Methods 0.000 description 14
- 239000012071 phase Substances 0.000 description 12
- 230000006866 deterioration Effects 0.000 description 11
- 238000010438 heat treatment Methods 0.000 description 8
- 238000002441 X-ray diffraction Methods 0.000 description 7
- 238000001816 cooling Methods 0.000 description 7
- 238000000034 method Methods 0.000 description 7
- 229910002077 partially stabilized zirconia Inorganic materials 0.000 description 6
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 description 5
- 239000002245 particle Substances 0.000 description 5
- 239000007784 solid electrolyte Substances 0.000 description 5
- 239000000843 powder Substances 0.000 description 4
- 239000002994 raw material Substances 0.000 description 4
- 239000006104 solid solution Substances 0.000 description 4
- 230000032683 aging Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 229910002078 fully stabilized zirconia Inorganic materials 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 239000003381 stabilizer Substances 0.000 description 3
- 230000009466 transformation Effects 0.000 description 3
- 150000003748 yttrium compounds Chemical class 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000006378 damage Effects 0.000 description 2
- 239000003779 heat-resistant material Substances 0.000 description 2
- 230000007774 longterm Effects 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 230000035939 shock Effects 0.000 description 2
- 239000007790 solid phase Substances 0.000 description 2
- 238000005979 thermal decomposition reaction Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- OERNJTNJEZOPIA-UHFFFAOYSA-N zirconium nitrate Chemical compound [Zr+4].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O OERNJTNJEZOPIA-UHFFFAOYSA-N 0.000 description 2
- OBOSXEWFRARQPU-UHFFFAOYSA-N 2-n,2-n-dimethylpyridine-2,5-diamine Chemical compound CN(C)C1=CC=C(N)C=N1 OBOSXEWFRARQPU-UHFFFAOYSA-N 0.000 description 1
- NGDQQLAVJWUYSF-UHFFFAOYSA-N 4-methyl-2-phenyl-1,3-thiazole-5-sulfonyl chloride Chemical compound S1C(S(Cl)(=O)=O)=C(C)N=C1C1=CC=CC=C1 NGDQQLAVJWUYSF-UHFFFAOYSA-N 0.000 description 1
- 230000002745 absorbent Effects 0.000 description 1
- 239000002250 absorbent Substances 0.000 description 1
- 238000001354 calcination Methods 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000008240 homogeneous mixture Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- IBSDADOZMZEYKD-UHFFFAOYSA-H oxalate;yttrium(3+) Chemical compound [Y+3].[Y+3].[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O IBSDADOZMZEYKD-UHFFFAOYSA-H 0.000 description 1
- 238000013001 point bending Methods 0.000 description 1
- 229910052761 rare earth metal Inorganic materials 0.000 description 1
- FKTOIHSPIPYAPE-UHFFFAOYSA-N samarium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[Sm+3].[Sm+3] FKTOIHSPIPYAPE-UHFFFAOYSA-N 0.000 description 1
- 230000035882 stress Effects 0.000 description 1
- 150000003755 zirconium compounds Chemical class 0.000 description 1
- DUNKXUFBGCUVQW-UHFFFAOYSA-J zirconium tetrachloride Chemical group Cl[Zr](Cl)(Cl)Cl DUNKXUFBGCUVQW-UHFFFAOYSA-J 0.000 description 1
- 229910021489 α-quartz Inorganic materials 0.000 description 1
Landscapes
- Compositions Of Oxide Ceramics (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62065893A JPS62230667A (ja) | 1987-03-23 | 1987-03-23 | 固体電解質磁器の製造法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62065893A JPS62230667A (ja) | 1987-03-23 | 1987-03-23 | 固体電解質磁器の製造法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62230667A true JPS62230667A (ja) | 1987-10-09 |
| JPH0235701B2 JPH0235701B2 (enrdf_load_stackoverflow) | 1990-08-13 |
Family
ID=13300098
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62065893A Granted JPS62230667A (ja) | 1987-03-23 | 1987-03-23 | 固体電解質磁器の製造法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62230667A (enrdf_load_stackoverflow) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01108163A (ja) * | 1987-10-20 | 1989-04-25 | Murata Mfg Co Ltd | 固体電解質物質 |
| JPH03218967A (ja) * | 1989-11-06 | 1991-09-26 | Osaka Cement Co Ltd | 高強度アルミナ―ジルコニア系セラミックス焼結体 |
| US5421560A (en) * | 1994-02-15 | 1995-06-06 | Ajf, Inc. | Slag control apparatus for molten metal vessels |
-
1987
- 1987-03-23 JP JP62065893A patent/JPS62230667A/ja active Granted
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01108163A (ja) * | 1987-10-20 | 1989-04-25 | Murata Mfg Co Ltd | 固体電解質物質 |
| JPH03218967A (ja) * | 1989-11-06 | 1991-09-26 | Osaka Cement Co Ltd | 高強度アルミナ―ジルコニア系セラミックス焼結体 |
| US5421560A (en) * | 1994-02-15 | 1995-06-06 | Ajf, Inc. | Slag control apparatus for molten metal vessels |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0235701B2 (enrdf_load_stackoverflow) | 1990-08-13 |