JPS6222314A - 薄膜製造方法 - Google Patents

薄膜製造方法

Info

Publication number
JPS6222314A
JPS6222314A JP60160216A JP16021685A JPS6222314A JP S6222314 A JPS6222314 A JP S6222314A JP 60160216 A JP60160216 A JP 60160216A JP 16021685 A JP16021685 A JP 16021685A JP S6222314 A JPS6222314 A JP S6222314A
Authority
JP
Japan
Prior art keywords
thin film
insulating
metal
coated
compound
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60160216A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0467724B2 (enrdf_load_stackoverflow
Inventor
笠谷　昌史
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Bosch Corp
Original Assignee
Diesel Kiki Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Diesel Kiki Co Ltd filed Critical Diesel Kiki Co Ltd
Priority to JP60160216A priority Critical patent/JPS6222314A/ja
Priority to KR1019860005952A priority patent/KR920000590B1/ko
Priority to DE19863624772 priority patent/DE3624772A1/de
Priority to GB08617904A priority patent/GB2178064A/en
Publication of JPS6222314A publication Critical patent/JPS6222314A/ja
Publication of JPH0467724B2 publication Critical patent/JPH0467724B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/027—Graded interfaces
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Insulating Bodies (AREA)
JP60160216A 1985-07-22 1985-07-22 薄膜製造方法 Granted JPS6222314A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP60160216A JPS6222314A (ja) 1985-07-22 1985-07-22 薄膜製造方法
KR1019860005952A KR920000590B1 (ko) 1985-07-22 1986-07-22 박막 제조방법
DE19863624772 DE3624772A1 (de) 1985-07-22 1986-07-22 Verfahren zum herstellen eines duennfilms
GB08617904A GB2178064A (en) 1985-07-22 1986-07-22 Producing a thin film by reactive evaporation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60160216A JPS6222314A (ja) 1985-07-22 1985-07-22 薄膜製造方法

Publications (2)

Publication Number Publication Date
JPS6222314A true JPS6222314A (ja) 1987-01-30
JPH0467724B2 JPH0467724B2 (enrdf_load_stackoverflow) 1992-10-29

Family

ID=15710240

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60160216A Granted JPS6222314A (ja) 1985-07-22 1985-07-22 薄膜製造方法

Country Status (4)

Country Link
JP (1) JPS6222314A (enrdf_load_stackoverflow)
KR (1) KR920000590B1 (enrdf_load_stackoverflow)
DE (1) DE3624772A1 (enrdf_load_stackoverflow)
GB (1) GB2178064A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63303054A (ja) * 1987-06-04 1988-12-09 Toyota Motor Corp 多層膜の形成方法

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3726731A1 (de) * 1987-08-11 1989-02-23 Hartec Ges Fuer Hartstoffe Und Verfahren zum aufbringen von ueberzuegen auf gegenstaende mittels magnetfeldunterstuetzter kathodenzerstaeubung im vakuum
DE3737404A1 (de) * 1987-11-04 1989-05-18 Bartl Josef Franz Verfahren und einrichtung zur erzeugung haftfester vakuumbeschichtungen
GB9005321D0 (en) * 1990-03-09 1990-05-02 Matthews Allan Modulated structure composites produced by vapour disposition
JPH04368A (ja) * 1990-04-17 1992-01-06 Riken Corp 耐摩耗性被膜及びその製造法
DE69428253T2 (de) 1993-11-12 2002-06-27 Ppg Industries Ohio, Inc. Haltbare Sputterschicht aus Metalloxid
US5672386A (en) * 1994-10-27 1997-09-30 Kabushiki Kaisha Riken Process for forming a coating of chromium and nitrogen having good wear resistance properties
US5587227A (en) * 1994-10-27 1996-12-24 Kabushiki Kaisha Riken Coating of chromium and nitrogen having good wear resistance properties

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3791852A (en) * 1972-06-16 1974-02-12 Univ California High rate deposition of carbides by activated reactive evaporation
JPS5941510B2 (ja) * 1979-07-24 1984-10-08 双葉電子工業株式会社 酸化ベリリウム膜とその形成方法
JPS58221271A (ja) * 1982-06-18 1983-12-22 Citizen Watch Co Ltd イオンプレ−テイング法による被膜形成方法
JPS60234965A (ja) * 1984-05-04 1985-11-21 Diesel Kiki Co Ltd 薄膜製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63303054A (ja) * 1987-06-04 1988-12-09 Toyota Motor Corp 多層膜の形成方法

Also Published As

Publication number Publication date
JPH0467724B2 (enrdf_load_stackoverflow) 1992-10-29
DE3624772A1 (de) 1987-01-22
KR870001326A (ko) 1987-03-13
KR920000590B1 (ko) 1992-01-16
GB2178064A (en) 1987-02-04
GB8617904D0 (en) 1986-08-28
DE3624772C2 (enrdf_load_stackoverflow) 1988-07-21

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