JPS6221216A - 電子ビ−ム露光装置 - Google Patents

電子ビ−ム露光装置

Info

Publication number
JPS6221216A
JPS6221216A JP15984185A JP15984185A JPS6221216A JP S6221216 A JPS6221216 A JP S6221216A JP 15984185 A JP15984185 A JP 15984185A JP 15984185 A JP15984185 A JP 15984185A JP S6221216 A JPS6221216 A JP S6221216A
Authority
JP
Japan
Prior art keywords
electron beam
deflector
beam exposure
rectangular
exposure apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15984185A
Other languages
English (en)
Japanese (ja)
Other versions
JPH047585B2 (enrdf_load_stackoverflow
Inventor
Shinji Miyagi
宮城　慎司
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP15984185A priority Critical patent/JPS6221216A/ja
Publication of JPS6221216A publication Critical patent/JPS6221216A/ja
Publication of JPH047585B2 publication Critical patent/JPH047585B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Electron Beam Exposure (AREA)
JP15984185A 1985-07-19 1985-07-19 電子ビ−ム露光装置 Granted JPS6221216A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15984185A JPS6221216A (ja) 1985-07-19 1985-07-19 電子ビ−ム露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15984185A JPS6221216A (ja) 1985-07-19 1985-07-19 電子ビ−ム露光装置

Publications (2)

Publication Number Publication Date
JPS6221216A true JPS6221216A (ja) 1987-01-29
JPH047585B2 JPH047585B2 (enrdf_load_stackoverflow) 1992-02-12

Family

ID=15702404

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15984185A Granted JPS6221216A (ja) 1985-07-19 1985-07-19 電子ビ−ム露光装置

Country Status (1)

Country Link
JP (1) JPS6221216A (enrdf_load_stackoverflow)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5283440A (en) * 1990-10-05 1994-02-01 Hitachi, Ltd. Electron beam writing system used in a cell projection method
US6577052B1 (en) 1997-04-01 2003-06-10 Hitachi, Ltd. Electron gun for cathode ray tube
US6815913B2 (en) 2001-07-30 2004-11-09 Hitachi, Ltd. Cathode ray tube
US6853122B2 (en) 2000-06-19 2005-02-08 Kabushiki Kaisha Toshiba Cathode-ray tube apparatus

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5283440A (en) * 1990-10-05 1994-02-01 Hitachi, Ltd. Electron beam writing system used in a cell projection method
US6577052B1 (en) 1997-04-01 2003-06-10 Hitachi, Ltd. Electron gun for cathode ray tube
US6853122B2 (en) 2000-06-19 2005-02-08 Kabushiki Kaisha Toshiba Cathode-ray tube apparatus
US6815913B2 (en) 2001-07-30 2004-11-09 Hitachi, Ltd. Cathode ray tube

Also Published As

Publication number Publication date
JPH047585B2 (enrdf_load_stackoverflow) 1992-02-12

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