JPS62211920A - レジスト液供給装置 - Google Patents

レジスト液供給装置

Info

Publication number
JPS62211920A
JPS62211920A JP5431286A JP5431286A JPS62211920A JP S62211920 A JPS62211920 A JP S62211920A JP 5431286 A JP5431286 A JP 5431286A JP 5431286 A JP5431286 A JP 5431286A JP S62211920 A JPS62211920 A JP S62211920A
Authority
JP
Japan
Prior art keywords
resist
resist liquid
bubbles
liquid
filter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5431286A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0248137B2 (enrdf_load_stackoverflow
Inventor
Terumi Rokushiya
六車　輝美
Tetsuhiro Ukiana
浮穴　哲宏
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Toshiba Electronic Device Solutions Corp
Original Assignee
Toshiba Corp
Toshiba Microelectronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Toshiba Microelectronics Corp filed Critical Toshiba Corp
Priority to JP5431286A priority Critical patent/JPS62211920A/ja
Publication of JPS62211920A publication Critical patent/JPS62211920A/ja
Publication of JPH0248137B2 publication Critical patent/JPH0248137B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Coating Apparatus (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP5431286A 1986-03-12 1986-03-12 レジスト液供給装置 Granted JPS62211920A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5431286A JPS62211920A (ja) 1986-03-12 1986-03-12 レジスト液供給装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5431286A JPS62211920A (ja) 1986-03-12 1986-03-12 レジスト液供給装置

Publications (2)

Publication Number Publication Date
JPS62211920A true JPS62211920A (ja) 1987-09-17
JPH0248137B2 JPH0248137B2 (enrdf_load_stackoverflow) 1990-10-24

Family

ID=12967060

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5431286A Granted JPS62211920A (ja) 1986-03-12 1986-03-12 レジスト液供給装置

Country Status (1)

Country Link
JP (1) JPS62211920A (enrdf_load_stackoverflow)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63121436U (enrdf_load_stackoverflow) * 1987-01-30 1988-08-05
JPH0294517A (ja) * 1988-09-30 1990-04-05 Tokyo Electron Ltd レジスト処理装置
JPH03114565A (ja) * 1989-09-29 1991-05-15 Hitachi Ltd 流動体供給装置およびその制御方法
JPH08131909A (ja) * 1994-11-04 1996-05-28 Dainippon Screen Mfg Co Ltd 基板処理装置用処理液供給装置
KR19990018143A (ko) * 1997-08-26 1999-03-15 윤종용 반도체장치 제조용 시너 분사장치
JP2008282907A (ja) * 2007-05-09 2008-11-20 Nec Electronics Corp 液体材料供給装置およびこれを用いた液体材料供給方法
US7654414B2 (en) 2002-02-07 2010-02-02 Pall Corporation Liquids dispensing systems and methods
JP2010135535A (ja) * 2008-12-04 2010-06-17 Tokyo Electron Ltd 処理液供給装置
JP2012152661A (ja) * 2011-01-24 2012-08-16 Seiko Epson Corp 描画装置

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5528706A (en) * 1978-08-18 1980-02-29 Senko Ika Kogyo Kk Bubble removing method
JPS6061011A (ja) * 1983-09-14 1985-04-08 Hitachi Ltd 脱気・消泡装置
JPS60135064A (ja) * 1983-11-29 1985-07-18 ガムブロ　ルンデイア　アクチーボラグ 液体のガス抜き装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5528706A (en) * 1978-08-18 1980-02-29 Senko Ika Kogyo Kk Bubble removing method
JPS6061011A (ja) * 1983-09-14 1985-04-08 Hitachi Ltd 脱気・消泡装置
JPS60135064A (ja) * 1983-11-29 1985-07-18 ガムブロ　ルンデイア　アクチーボラグ 液体のガス抜き装置

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63121436U (enrdf_load_stackoverflow) * 1987-01-30 1988-08-05
JPH0294517A (ja) * 1988-09-30 1990-04-05 Tokyo Electron Ltd レジスト処理装置
JPH03114565A (ja) * 1989-09-29 1991-05-15 Hitachi Ltd 流動体供給装置およびその制御方法
JPH08131909A (ja) * 1994-11-04 1996-05-28 Dainippon Screen Mfg Co Ltd 基板処理装置用処理液供給装置
KR19990018143A (ko) * 1997-08-26 1999-03-15 윤종용 반도체장치 제조용 시너 분사장치
US7654414B2 (en) 2002-02-07 2010-02-02 Pall Corporation Liquids dispensing systems and methods
JP2008282907A (ja) * 2007-05-09 2008-11-20 Nec Electronics Corp 液体材料供給装置およびこれを用いた液体材料供給方法
JP2010135535A (ja) * 2008-12-04 2010-06-17 Tokyo Electron Ltd 処理液供給装置
KR101487364B1 (ko) * 2008-12-04 2015-01-29 도쿄엘렉트론가부시키가이샤 처리액 공급 장치
JP2012152661A (ja) * 2011-01-24 2012-08-16 Seiko Epson Corp 描画装置

Also Published As

Publication number Publication date
JPH0248137B2 (enrdf_load_stackoverflow) 1990-10-24

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