JPS6220874A - 堆積膜形成装置 - Google Patents
堆積膜形成装置Info
- Publication number
- JPS6220874A JPS6220874A JP60158324A JP15832485A JPS6220874A JP S6220874 A JPS6220874 A JP S6220874A JP 60158324 A JP60158324 A JP 60158324A JP 15832485 A JP15832485 A JP 15832485A JP S6220874 A JPS6220874 A JP S6220874A
- Authority
- JP
- Japan
- Prior art keywords
- deposited film
- container
- substrate
- exhaust
- cylindrical
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
- C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes
- C23C16/5093—Coaxial electrodes
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Plasma & Fusion (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
- Light Receiving Elements (AREA)
- Photoreceptors In Electrophotography (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60158324A JPS6220874A (ja) | 1985-07-19 | 1985-07-19 | 堆積膜形成装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60158324A JPS6220874A (ja) | 1985-07-19 | 1985-07-19 | 堆積膜形成装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6220874A true JPS6220874A (ja) | 1987-01-29 |
JPH049872B2 JPH049872B2 (enrdf_load_stackoverflow) | 1992-02-21 |
Family
ID=15669149
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP60158324A Granted JPS6220874A (ja) | 1985-07-19 | 1985-07-19 | 堆積膜形成装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6220874A (enrdf_load_stackoverflow) |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5970761A (ja) * | 1982-10-18 | 1984-04-21 | Toshiba Corp | 膜形成装置 |
-
1985
- 1985-07-19 JP JP60158324A patent/JPS6220874A/ja active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5970761A (ja) * | 1982-10-18 | 1984-04-21 | Toshiba Corp | 膜形成装置 |
Also Published As
Publication number | Publication date |
---|---|
JPH049872B2 (enrdf_load_stackoverflow) | 1992-02-21 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
EXPY | Cancellation because of completion of term |