JPS6220874A - 堆積膜形成装置 - Google Patents

堆積膜形成装置

Info

Publication number
JPS6220874A
JPS6220874A JP60158324A JP15832485A JPS6220874A JP S6220874 A JPS6220874 A JP S6220874A JP 60158324 A JP60158324 A JP 60158324A JP 15832485 A JP15832485 A JP 15832485A JP S6220874 A JPS6220874 A JP S6220874A
Authority
JP
Japan
Prior art keywords
deposited film
container
substrate
exhaust
cylindrical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60158324A
Other languages
English (en)
Japanese (ja)
Other versions
JPH049872B2 (enrdf_load_stackoverflow
Inventor
Shigehira Iida
茂平 飯田
Teruo Misumi
三角　輝男
Takeshi Kurokawa
岳 黒川
Minoru Kato
実 加藤
Takahisa Kawamura
川村　高久
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP60158324A priority Critical patent/JPS6220874A/ja
Publication of JPS6220874A publication Critical patent/JPS6220874A/ja
Publication of JPH049872B2 publication Critical patent/JPH049872B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
    • C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes
    • C23C16/5093—Coaxial electrodes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Plasma & Fusion (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Chemical Vapour Deposition (AREA)
  • Light Receiving Elements (AREA)
JP60158324A 1985-07-19 1985-07-19 堆積膜形成装置 Granted JPS6220874A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60158324A JPS6220874A (ja) 1985-07-19 1985-07-19 堆積膜形成装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60158324A JPS6220874A (ja) 1985-07-19 1985-07-19 堆積膜形成装置

Publications (2)

Publication Number Publication Date
JPS6220874A true JPS6220874A (ja) 1987-01-29
JPH049872B2 JPH049872B2 (enrdf_load_stackoverflow) 1992-02-21

Family

ID=15669149

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60158324A Granted JPS6220874A (ja) 1985-07-19 1985-07-19 堆積膜形成装置

Country Status (1)

Country Link
JP (1) JPS6220874A (enrdf_load_stackoverflow)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5970761A (ja) * 1982-10-18 1984-04-21 Toshiba Corp 膜形成装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5970761A (ja) * 1982-10-18 1984-04-21 Toshiba Corp 膜形成装置

Also Published As

Publication number Publication date
JPH049872B2 (enrdf_load_stackoverflow) 1992-02-21

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term