JPH049872B2 - - Google Patents

Info

Publication number
JPH049872B2
JPH049872B2 JP60158324A JP15832485A JPH049872B2 JP H049872 B2 JPH049872 B2 JP H049872B2 JP 60158324 A JP60158324 A JP 60158324A JP 15832485 A JP15832485 A JP 15832485A JP H049872 B2 JPH049872 B2 JP H049872B2
Authority
JP
Japan
Prior art keywords
reaction tank
deposited film
exhaust
substrate
container
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60158324A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6220874A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP60158324A priority Critical patent/JPS6220874A/ja
Publication of JPS6220874A publication Critical patent/JPS6220874A/ja
Publication of JPH049872B2 publication Critical patent/JPH049872B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
    • C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes
    • C23C16/5093—Coaxial electrodes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Plasma & Fusion (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Light Receiving Elements (AREA)
  • Photoreceptors In Electrophotography (AREA)
JP60158324A 1985-07-19 1985-07-19 堆積膜形成装置 Granted JPS6220874A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60158324A JPS6220874A (ja) 1985-07-19 1985-07-19 堆積膜形成装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60158324A JPS6220874A (ja) 1985-07-19 1985-07-19 堆積膜形成装置

Publications (2)

Publication Number Publication Date
JPS6220874A JPS6220874A (ja) 1987-01-29
JPH049872B2 true JPH049872B2 (enrdf_load_stackoverflow) 1992-02-21

Family

ID=15669149

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60158324A Granted JPS6220874A (ja) 1985-07-19 1985-07-19 堆積膜形成装置

Country Status (1)

Country Link
JP (1) JPS6220874A (enrdf_load_stackoverflow)

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5970761A (ja) * 1982-10-18 1984-04-21 Toshiba Corp 膜形成装置

Also Published As

Publication number Publication date
JPS6220874A (ja) 1987-01-29

Similar Documents

Publication Publication Date Title
US5910342A (en) Process for forming deposition film
US4438188A (en) Method for producing photosensitive film for electrophotography
JPH0713947B2 (ja) 薄膜トランジスタアレイの製造装置
JP2582553B2 (ja) プラズマｃｖｄ法による機能性堆積膜形成装置
JPS6041047A (ja) 堆積膜形成法
JPH0459390B2 (enrdf_load_stackoverflow)
US5582648A (en) Apparatus for preparing a functional deposited film by microwave plasma chemical vapor deposition
JPH06342764A (ja) 超短波を用いたプラズマｃｖｄ法及び該プラズマｃｖｄ装置
JPH049872B2 (enrdf_load_stackoverflow)
US4418645A (en) Glow discharge apparatus with squirrel cage electrode
JPH079059B2 (ja) 炭素薄膜の製造方法
JPS62142783A (ja) プラズマｃｖｄ法による堆積膜形成装置
JP2554867B2 (ja) マイクロ波プラズマｃｖｄ法による機能性堆積膜形成装置
JPH0368948B2 (enrdf_load_stackoverflow)
JPH02110919A (ja) 成膜装置
JPS59213439A (ja) 容量結合型グロ−放電分解装置
JP2553337B2 (ja) マイクロ波プラズマｃｖｄ法による機能性堆積膜形成装置
JPS6257710B2 (enrdf_load_stackoverflow)
JPS5852651A (ja) 電子写真用感光体の製造方法
JP4165855B2 (ja) 薄膜製造方法
JPS63223178A (ja) アモルフアスシリコン系膜の製造方法
JPS62177181A (ja) 電子写真感光体の製造方法
JPH0742570B2 (ja) 炭素薄膜の製造方法
JPS63223181A (ja) アモルフアスシリコン系膜の製造方法
JPH01215982A (ja) 膜形成装置

Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term