JPH0368948B2 - - Google Patents

Info

Publication number
JPH0368948B2
JPH0368948B2 JP60140396A JP14039685A JPH0368948B2 JP H0368948 B2 JPH0368948 B2 JP H0368948B2 JP 60140396 A JP60140396 A JP 60140396A JP 14039685 A JP14039685 A JP 14039685A JP H0368948 B2 JPH0368948 B2 JP H0368948B2
Authority
JP
Japan
Prior art keywords
gas introduction
substrate
deposited film
gas
forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60140396A
Other languages
English (en)
Japanese (ja)
Other versions
JPS621872A (ja
Inventor
Kyosuke Ogawa
Tomohiro Kimura
Teruo Misumi
Atsushi Koike
Shigehira Iida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP60140396A priority Critical patent/JPS621872A/ja
Publication of JPS621872A publication Critical patent/JPS621872A/ja
Publication of JPH0368948B2 publication Critical patent/JPH0368948B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Photoreceptors In Electrophotography (AREA)
  • Chemical Vapour Deposition (AREA)
  • Light Receiving Elements (AREA)
JP60140396A 1985-06-28 1985-06-28 堆積膜形成法 Granted JPS621872A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60140396A JPS621872A (ja) 1985-06-28 1985-06-28 堆積膜形成法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60140396A JPS621872A (ja) 1985-06-28 1985-06-28 堆積膜形成法

Publications (2)

Publication Number Publication Date
JPS621872A JPS621872A (ja) 1987-01-07
JPH0368948B2 true JPH0368948B2 (enrdf_load_stackoverflow) 1991-10-30

Family

ID=15267817

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60140396A Granted JPS621872A (ja) 1985-06-28 1985-06-28 堆積膜形成法

Country Status (1)

Country Link
JP (1) JPS621872A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101018194B1 (ko) * 2008-03-17 2011-02-28 삼성엘이디 주식회사 화학 기상 증착 장치
CN104674184A (zh) * 2013-12-02 2015-06-03 有研新材料股份有限公司 用于硅基多晶硅膜沉积的气体传输装置及沉积方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57188672A (en) * 1981-05-18 1982-11-19 Oki Electric Ind Co Ltd Formation of glow discharge film

Also Published As

Publication number Publication date
JPS621872A (ja) 1987-01-07

Similar Documents

Publication Publication Date Title
US4466380A (en) Plasma deposition apparatus for photoconductive drums
JP2582553B2 (ja) プラズマｃｖｄ法による機能性堆積膜形成装置
JPH0459390B2 (enrdf_load_stackoverflow)
JP2787148B2 (ja) マイクロ波プラズマｃｖｄ法による堆積膜形成方法及び堆積膜形成装置
US6158382A (en) Method for forming a deposited film by plasma chemical vapor deposition and apparatus for forming a deposited film by plasma chemical vapor deposition
JPS6137354B2 (enrdf_load_stackoverflow)
US6435130B1 (en) Plasma CVD apparatus and plasma processing method
US5338580A (en) Method of preparation of functional deposited film by microwave plasma chemical vapor deposition
JPH0368948B2 (enrdf_load_stackoverflow)
US5106711A (en) Electrophotographic sensitive member
JP2553331B2 (ja) プラズマｃｖｄ法による堆積膜形成装置
JP3428865B2 (ja) 堆積膜の形成装置及び堆積膜形成方法
JPS624874A (ja) 堆積膜形成法及びこれに用いる装置
JPH07288233A (ja) 堆積膜形成装置
JP2554867B2 (ja) マイクロ波プラズマｃｖｄ法による機能性堆積膜形成装置
JP3412957B2 (ja) 光受容部材の製造方法
JPH0943884A (ja) 電子写真感光体の形成方法
JPH0647738B2 (ja) プラズマｃｖｄ法による堆積膜形成方法
JPH049872B2 (enrdf_load_stackoverflow)
JP2004068083A (ja) プラズマｃｖｄ法による堆積膜形成方法及び装置
JP3634485B2 (ja) プラズマｃｖｄ法による堆積膜形成装置及び方法
JPH07288194A (ja) プラズマ処理装置
JPH093652A (ja) プラズマｃｖｄ法による堆積膜形成装置
JPS63230881A (ja) マイクロ波プラズマｃｖｄ法による機能性堆積膜形成装置
JPH08222519A (ja) 高周波プラズマｃｖｄ法による堆積膜形成方法