JPS57188672A - Formation of glow discharge film - Google Patents

Formation of glow discharge film

Info

Publication number
JPS57188672A
JPS57188672A JP56073465A JP7346581A JPS57188672A JP S57188672 A JPS57188672 A JP S57188672A JP 56073465 A JP56073465 A JP 56073465A JP 7346581 A JP7346581 A JP 7346581A JP S57188672 A JPS57188672 A JP S57188672A
Authority
JP
Japan
Prior art keywords
drum
gas
ports
glow discharge
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP56073465A
Other languages
Japanese (ja)
Inventor
Akira Uchiyama
Satoru Nishikawa
Masahiro Akiyama
Katsuzo Uenishi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oki Electric Industry Co Ltd
Original Assignee
Oki Electric Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oki Electric Industry Co Ltd filed Critical Oki Electric Industry Co Ltd
Priority to JP56073465A priority Critical patent/JPS57188672A/en
Publication of JPS57188672A publication Critical patent/JPS57188672A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
    • C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes
    • C23C16/5093—Coaxial electrodes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

PURPOSE:To form of uniform film quality and film thickness over the entire surfaces of a drum by disposing plural gas introduction ports and release ports alternately two dimensionally on the surface conforming to the drum surface and applying electric fields between the drum and the electrode while the drum is held still. CONSTITUTION:The gas f3 introduced through a gas introduction port 2-3 is released to the gas released ports 2-4, 2-6, 2-8 and 2-14, 2-12, 2-10 provided to an outside cylindrical electrode 2-2 along the drum surface. During this time, the gas f3 is decomposed by the glow discharge by the electric field applied between the drum 2-1 and the electrode 2-2, and a film is formed on the surface of the drum 2-1. While the gas f4 introduced through a gas introduction port 2-9 in the same manner is released to gas release ports 2-4, 2-6, 2-8 and 2-14, 2-12, 2-10, its film is formed by the glow discharge. The same holds true of the gas through gas introduction ports 2-5, 2-7, 2-11 2-13 and in the end the uniform films are formed on the outside surface of the drum 2-1.
JP56073465A 1981-05-18 1981-05-18 Formation of glow discharge film Pending JPS57188672A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56073465A JPS57188672A (en) 1981-05-18 1981-05-18 Formation of glow discharge film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56073465A JPS57188672A (en) 1981-05-18 1981-05-18 Formation of glow discharge film

Publications (1)

Publication Number Publication Date
JPS57188672A true JPS57188672A (en) 1982-11-19

Family

ID=13519033

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56073465A Pending JPS57188672A (en) 1981-05-18 1981-05-18 Formation of glow discharge film

Country Status (1)

Country Link
JP (1) JPS57188672A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0119058A2 (en) * 1983-03-10 1984-09-19 Kabushiki Kaisha Toshiba Method and apparatus for forming thin film
JPS6063561U (en) * 1983-10-07 1985-05-04 富士通株式会社 Plasma CVD equipment
JPS621872A (en) * 1985-06-28 1987-01-07 Canon Inc Method for forming deposited film

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0119058A2 (en) * 1983-03-10 1984-09-19 Kabushiki Kaisha Toshiba Method and apparatus for forming thin film
JPS6063561U (en) * 1983-10-07 1985-05-04 富士通株式会社 Plasma CVD equipment
JPS621872A (en) * 1985-06-28 1987-01-07 Canon Inc Method for forming deposited film
JPH0368948B2 (en) * 1985-06-28 1991-10-30 Canon Kk

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