JPS57188671A - Formation of glow discharge film - Google Patents
Formation of glow discharge filmInfo
- Publication number
- JPS57188671A JPS57188671A JP7346481A JP7346481A JPS57188671A JP S57188671 A JPS57188671 A JP S57188671A JP 7346481 A JP7346481 A JP 7346481A JP 7346481 A JP7346481 A JP 7346481A JP S57188671 A JPS57188671 A JP S57188671A
- Authority
- JP
- Japan
- Prior art keywords
- drums
- electrode
- glow discharge
- films
- cylindrical shape
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
- C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes
- C23C16/5093—Coaxial electrodes
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Photoreceptors In Electrophotography (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
PURPOSE:To form uniform films of the same quality on plural drums by applying electric fields between the plural drums provided in a single furnace and an electrode placed to face the side faces of the drums thereby forming the decomposted films of gaseous raw materials on the surfaces of the respective drums. CONSTITUTION:Films are formed by a capacity coupling type glow discharge film forming method on the surfaces of drums 2-1, 2-2, 2-3, 2-4, 2-5, 2-6 of a cylindrical shape disposed in a growing furnace of a cylindrical shape. At this time, a plurality of said drums are provided in the single furnace, and an electrode 2-7 of a cylindrical shape enclosing the drums is provided. The distances l1-l6 between the drums and the electrode 2-7 are set at l1=l2=l3=l4=l5= l6, and while the respective drums are rotated in arrows y1, y2, y3, y4, y5, y6 directions, glow discharge is generated between the drum surfaces and the electrode 2-7. Then, the gaseous raw materials existing between the drums and the electrode 2-7 are decomposed by the glow discharge and films are formed on the outside surfaces of the drums.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7346481A JPS57188671A (en) | 1981-05-18 | 1981-05-18 | Formation of glow discharge film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7346481A JPS57188671A (en) | 1981-05-18 | 1981-05-18 | Formation of glow discharge film |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS57188671A true JPS57188671A (en) | 1982-11-19 |
Family
ID=13519001
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7346481A Pending JPS57188671A (en) | 1981-05-18 | 1981-05-18 | Formation of glow discharge film |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57188671A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58132755A (en) * | 1982-02-03 | 1983-08-08 | Toshiba Corp | Method and device for production of amorphous silicon photoreceptor |
JPS60133478U (en) * | 1984-02-14 | 1985-09-05 | 三洋電機株式会社 | photoreceptor drum |
JPH0354573A (en) * | 1990-08-08 | 1991-03-08 | Sanyo Electric Co Ltd | Production of photosensitive drum |
-
1981
- 1981-05-18 JP JP7346481A patent/JPS57188671A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58132755A (en) * | 1982-02-03 | 1983-08-08 | Toshiba Corp | Method and device for production of amorphous silicon photoreceptor |
JPH0338586B2 (en) * | 1982-02-03 | 1991-06-11 | Tokyo Shibaura Electric Co | |
JPS60133478U (en) * | 1984-02-14 | 1985-09-05 | 三洋電機株式会社 | photoreceptor drum |
JPH0354573A (en) * | 1990-08-08 | 1991-03-08 | Sanyo Electric Co Ltd | Production of photosensitive drum |
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