JPS6217031B2 - - Google Patents
Info
- Publication number
- JPS6217031B2 JPS6217031B2 JP58109136A JP10913683A JPS6217031B2 JP S6217031 B2 JPS6217031 B2 JP S6217031B2 JP 58109136 A JP58109136 A JP 58109136A JP 10913683 A JP10913683 A JP 10913683A JP S6217031 B2 JPS6217031 B2 JP S6217031B2
- Authority
- JP
- Japan
- Prior art keywords
- etching
- sio
- film
- mixture
- hydrofluoric acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000005530 etching Methods 0.000 claims description 32
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims description 24
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 24
- 238000000034 method Methods 0.000 claims description 16
- 239000000203 mixture Substances 0.000 claims description 11
- 239000000758 substrate Substances 0.000 claims description 9
- DDFHBQSCUXNBSA-UHFFFAOYSA-N 5-(5-carboxythiophen-2-yl)thiophene-2-carboxylic acid Chemical compound S1C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)S1 DDFHBQSCUXNBSA-UHFFFAOYSA-N 0.000 claims description 6
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims description 6
- 229910006404 SnO 2 Inorganic materials 0.000 claims description 6
- 229910017604 nitric acid Inorganic materials 0.000 claims description 6
- 238000000206 photolithography Methods 0.000 claims description 6
- 239000011259 mixed solution Substances 0.000 claims description 4
- 229920002120 photoresistant polymer Polymers 0.000 description 16
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 4
- 239000000243 solution Substances 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F71/00—Manufacture or treatment of devices covered by this subclass
- H10F71/138—Manufacture of transparent electrodes, e.g. transparent conductive oxides [TCO] or indium tin oxide [ITO] electrodes
Landscapes
- ing And Chemical Polishing (AREA)
- Weting (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58109136A JPS602680A (ja) | 1983-06-20 | 1983-06-20 | エツチング方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58109136A JPS602680A (ja) | 1983-06-20 | 1983-06-20 | エツチング方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS602680A JPS602680A (ja) | 1985-01-08 |
| JPS6217031B2 true JPS6217031B2 (enrdf_load_stackoverflow) | 1987-04-15 |
Family
ID=14502496
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58109136A Granted JPS602680A (ja) | 1983-06-20 | 1983-06-20 | エツチング方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS602680A (enrdf_load_stackoverflow) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3053576B2 (ja) * | 1996-08-07 | 2000-06-19 | オリンパス光学工業株式会社 | コードイメージデータ出力装置及び出力方法 |
-
1983
- 1983-06-20 JP JP58109136A patent/JPS602680A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS602680A (ja) | 1985-01-08 |
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