JPS6216415B2 - - Google Patents
Info
- Publication number
- JPS6216415B2 JPS6216415B2 JP9952880A JP9952880A JPS6216415B2 JP S6216415 B2 JPS6216415 B2 JP S6216415B2 JP 9952880 A JP9952880 A JP 9952880A JP 9952880 A JP9952880 A JP 9952880A JP S6216415 B2 JPS6216415 B2 JP S6216415B2
- Authority
- JP
- Japan
- Prior art keywords
- master
- mask
- pattern
- alignment
- patterns
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000004519 manufacturing process Methods 0.000 claims description 26
- 238000000034 method Methods 0.000 claims description 9
- 239000004065 semiconductor Substances 0.000 description 7
- 239000003795 chemical substances by application Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 239000000428 dust Substances 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 230000007547 defect Effects 0.000 description 2
- 239000000839 emulsion Substances 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- -1 silver halide Chemical class 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9952880A JPS5723940A (en) | 1980-07-21 | 1980-07-21 | Master-mask manufacturing device and mask plate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9952880A JPS5723940A (en) | 1980-07-21 | 1980-07-21 | Master-mask manufacturing device and mask plate |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5723940A JPS5723940A (en) | 1982-02-08 |
JPS6216415B2 true JPS6216415B2 (zh) | 1987-04-13 |
Family
ID=14249720
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9952880A Granted JPS5723940A (en) | 1980-07-21 | 1980-07-21 | Master-mask manufacturing device and mask plate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5723940A (zh) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0795515B2 (ja) * | 1987-07-24 | 1995-10-11 | 沖電気工業株式会社 | ウエハアライメント装置及びそれに用いるアライメントマ−ク |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS50116175A (zh) * | 1974-02-25 | 1975-09-11 |
-
1980
- 1980-07-21 JP JP9952880A patent/JPS5723940A/ja active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS50116175A (zh) * | 1974-02-25 | 1975-09-11 |
Also Published As
Publication number | Publication date |
---|---|
JPS5723940A (en) | 1982-02-08 |
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