JPS621547B2 - - Google Patents

Info

Publication number
JPS621547B2
JPS621547B2 JP58093229A JP9322983A JPS621547B2 JP S621547 B2 JPS621547 B2 JP S621547B2 JP 58093229 A JP58093229 A JP 58093229A JP 9322983 A JP9322983 A JP 9322983A JP S621547 B2 JPS621547 B2 JP S621547B2
Authority
JP
Japan
Prior art keywords
substrate
film
glass substrate
center
uniform thickness
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP58093229A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59216655A (ja
Inventor
Takashi Murata
Yoshiharu Hoshi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Victor Company of Japan Ltd
Original Assignee
Victor Company of Japan Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Victor Company of Japan Ltd filed Critical Victor Company of Japan Ltd
Priority to JP58093229A priority Critical patent/JPS59216655A/ja
Publication of JPS59216655A publication Critical patent/JPS59216655A/ja
Publication of JPS621547B2 publication Critical patent/JPS621547B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Coating Apparatus (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP58093229A 1983-05-26 1983-05-26 回転する基板上に一様な厚さの膜を形成させる塗布装置 Granted JPS59216655A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58093229A JPS59216655A (ja) 1983-05-26 1983-05-26 回転する基板上に一様な厚さの膜を形成させる塗布装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58093229A JPS59216655A (ja) 1983-05-26 1983-05-26 回転する基板上に一様な厚さの膜を形成させる塗布装置

Publications (2)

Publication Number Publication Date
JPS59216655A JPS59216655A (ja) 1984-12-06
JPS621547B2 true JPS621547B2 (cg-RX-API-DMAC7.html) 1987-01-14

Family

ID=14076709

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58093229A Granted JPS59216655A (ja) 1983-05-26 1983-05-26 回転する基板上に一様な厚さの膜を形成させる塗布装置

Country Status (1)

Country Link
JP (1) JPS59216655A (cg-RX-API-DMAC7.html)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2649156B2 (ja) * 1987-02-13 1997-09-03 東京エレクトロン 株式会社 レジスト塗布装置と方法
JPS64737A (en) * 1987-03-27 1989-01-05 Toshiba Corp Applicator for resist
JPH084771B2 (ja) * 1987-04-03 1996-01-24 東京エレクトロン株式会社 塗布装置及びそれを用いた塗布方法
JP3973517B2 (ja) * 2002-08-30 2007-09-12 シーケーディ株式会社 液膜形成方法、または液膜形成装置

Also Published As

Publication number Publication date
JPS59216655A (ja) 1984-12-06

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