JPS62146265A - 気相化学蒸着装置 - Google Patents

気相化学蒸着装置

Info

Publication number
JPS62146265A
JPS62146265A JP60286055A JP28605585A JPS62146265A JP S62146265 A JPS62146265 A JP S62146265A JP 60286055 A JP60286055 A JP 60286055A JP 28605585 A JP28605585 A JP 28605585A JP S62146265 A JPS62146265 A JP S62146265A
Authority
JP
Japan
Prior art keywords
phase chemical
manifold
vapor deposition
chemical vapor
vapor phase
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60286055A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0548307B2 (enrdf_load_stackoverflow
Inventor
Kazufumi Ogawa
一文 小川
Yoshiko Mino
美濃 美子
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP60286055A priority Critical patent/JPS62146265A/ja
Publication of JPS62146265A publication Critical patent/JPS62146265A/ja
Publication of JPH0548307B2 publication Critical patent/JPH0548307B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Chemical Vapour Deposition (AREA)
JP60286055A 1985-12-19 1985-12-19 気相化学蒸着装置 Granted JPS62146265A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60286055A JPS62146265A (ja) 1985-12-19 1985-12-19 気相化学蒸着装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60286055A JPS62146265A (ja) 1985-12-19 1985-12-19 気相化学蒸着装置

Publications (2)

Publication Number Publication Date
JPS62146265A true JPS62146265A (ja) 1987-06-30
JPH0548307B2 JPH0548307B2 (enrdf_load_stackoverflow) 1993-07-21

Family

ID=17699371

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60286055A Granted JPS62146265A (ja) 1985-12-19 1985-12-19 気相化学蒸着装置

Country Status (1)

Country Link
JP (1) JPS62146265A (enrdf_load_stackoverflow)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01145807A (ja) * 1987-12-01 1989-06-07 Toshiba Ceramics Co Ltd ウェーハ熱処理用治具
US5221201A (en) * 1990-07-27 1993-06-22 Tokyo Electron Sagami Limited Vertical heat treatment apparatus
JPH06173010A (ja) * 1992-11-30 1994-06-21 Nippon Ee S M Kk 熱処理装置
JP2002060947A (ja) * 2000-07-07 2002-02-28 Asm Internatl Nv 原子層のcvd

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4871783A (enrdf_load_stackoverflow) * 1971-12-29 1973-09-28
JPS54160172A (en) * 1978-06-09 1979-12-18 Hitachi Ltd Manufacture of semiconductor device and cvd device used for the said manufacture
JPS59151419A (ja) * 1983-02-18 1984-08-29 Hitachi Electronics Eng Co Ltd 反応処理装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4871783A (enrdf_load_stackoverflow) * 1971-12-29 1973-09-28
JPS54160172A (en) * 1978-06-09 1979-12-18 Hitachi Ltd Manufacture of semiconductor device and cvd device used for the said manufacture
JPS59151419A (ja) * 1983-02-18 1984-08-29 Hitachi Electronics Eng Co Ltd 反応処理装置

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01145807A (ja) * 1987-12-01 1989-06-07 Toshiba Ceramics Co Ltd ウェーハ熱処理用治具
US5221201A (en) * 1990-07-27 1993-06-22 Tokyo Electron Sagami Limited Vertical heat treatment apparatus
JPH06173010A (ja) * 1992-11-30 1994-06-21 Nippon Ee S M Kk 熱処理装置
JP2002060947A (ja) * 2000-07-07 2002-02-28 Asm Internatl Nv 原子層のcvd

Also Published As

Publication number Publication date
JPH0548307B2 (enrdf_load_stackoverflow) 1993-07-21

Similar Documents

Publication Publication Date Title
JP2766774B2 (ja) 大面積ガラス基板の冷却および加熱方法とそのための装置
KR0149442B1 (ko) 기판상의 층용착 방법 및 그 처리 시스템
US6117244A (en) Deposition resistant lining for CVD chamber
JPH03161929A (ja) 連続処理エッチング方法及びその装置
US5370371A (en) Heat treatment apparatus
JPS61191015A (ja) 半導体の気相成長方法及びその装置
JP3162955B2 (ja) プラズマ処理装置
JP3317781B2 (ja) 半導体ウエハの熱処理用サセプタの製造方法
JPS612321A (ja) 垂直ホツトウオール型cvdリアクタ
JPS62146265A (ja) 気相化学蒸着装置
JP3045259B2 (ja) プラズマ装置
JPH0586476A (ja) 化学気相成長装置
JP3056240B2 (ja) 熱処理装置
JPS6256652B2 (enrdf_load_stackoverflow)
JP3029953B2 (ja) 半導体ウェーハの熱処理装置
JP2874186B2 (ja) 低温処理装置
JPH01302816A (ja) 縦型熱処理装置
JPH022284B2 (enrdf_load_stackoverflow)
JP3362420B2 (ja) 半導体装置の製造方法
JPH04109523U (ja) Cvd装置
JPS62244123A (ja) 気相成長装置
JPH05211125A (ja) 気相成長装置
JPS6074543A (ja) ロ−ドロツク装置の試料温度測定方法
JPH04173977A (ja) 気相成長装置用支持台
JPS6298718A (ja) 気相成長装置

Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees