JPS62146265A - 気相化学蒸着装置 - Google Patents
気相化学蒸着装置Info
- Publication number
- JPS62146265A JPS62146265A JP28605585A JP28605585A JPS62146265A JP S62146265 A JPS62146265 A JP S62146265A JP 28605585 A JP28605585 A JP 28605585A JP 28605585 A JP28605585 A JP 28605585A JP S62146265 A JPS62146265 A JP S62146265A
- Authority
- JP
- Japan
- Prior art keywords
- manifold
- vapor deposition
- chemical vapor
- face plate
- deposition device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005229 chemical vapour deposition Methods 0.000 title claims abstract description 9
- 239000007795 chemical reaction product Substances 0.000 claims abstract description 13
- 239000002184 metal Substances 0.000 claims abstract description 4
- 239000012808 vapor phase Substances 0.000 claims description 7
- 239000000758 substrate Substances 0.000 abstract description 4
- 238000010186 staining Methods 0.000 abstract 1
- 239000010409 thin film Substances 0.000 description 5
- 230000000694 effects Effects 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- 241000609816 Pantholops hodgsonii Species 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 239000005380 borophosphosilicate glass Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000013021 overheating Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 238000000427 thin-film deposition Methods 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Landscapes
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP28605585A JPS62146265A (ja) | 1985-12-19 | 1985-12-19 | 気相化学蒸着装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP28605585A JPS62146265A (ja) | 1985-12-19 | 1985-12-19 | 気相化学蒸着装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62146265A true JPS62146265A (ja) | 1987-06-30 |
| JPH0548307B2 JPH0548307B2 (enrdf_load_stackoverflow) | 1993-07-21 |
Family
ID=17699371
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP28605585A Granted JPS62146265A (ja) | 1985-12-19 | 1985-12-19 | 気相化学蒸着装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62146265A (enrdf_load_stackoverflow) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01145807A (ja) * | 1987-12-01 | 1989-06-07 | Toshiba Ceramics Co Ltd | ウェーハ熱処理用治具 |
| US5221201A (en) * | 1990-07-27 | 1993-06-22 | Tokyo Electron Sagami Limited | Vertical heat treatment apparatus |
| JPH06173010A (ja) * | 1992-11-30 | 1994-06-21 | Nippon Ee S M Kk | 熱処理装置 |
| JP2002060947A (ja) * | 2000-07-07 | 2002-02-28 | Asm Internatl Nv | 原子層のｃｖｄ |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4871783A (enrdf_load_stackoverflow) * | 1971-12-29 | 1973-09-28 | ||
| JPS54160172A (en) * | 1978-06-09 | 1979-12-18 | Hitachi Ltd | Manufacture of semiconductor device and cvd device used for the said manufacture |
| JPS59151419A (ja) * | 1983-02-18 | 1984-08-29 | Hitachi Electronics Eng Co Ltd | 反応処理装置 |
-
1985
- 1985-12-19 JP JP28605585A patent/JPS62146265A/ja active Granted
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4871783A (enrdf_load_stackoverflow) * | 1971-12-29 | 1973-09-28 | ||
| JPS54160172A (en) * | 1978-06-09 | 1979-12-18 | Hitachi Ltd | Manufacture of semiconductor device and cvd device used for the said manufacture |
| JPS59151419A (ja) * | 1983-02-18 | 1984-08-29 | Hitachi Electronics Eng Co Ltd | 反応処理装置 |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01145807A (ja) * | 1987-12-01 | 1989-06-07 | Toshiba Ceramics Co Ltd | ウェーハ熱処理用治具 |
| US5221201A (en) * | 1990-07-27 | 1993-06-22 | Tokyo Electron Sagami Limited | Vertical heat treatment apparatus |
| JPH06173010A (ja) * | 1992-11-30 | 1994-06-21 | Nippon Ee S M Kk | 熱処理装置 |
| JP2002060947A (ja) * | 2000-07-07 | 2002-02-28 | Asm Internatl Nv | 原子層のｃｖｄ |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0548307B2 (enrdf_load_stackoverflow) | 1993-07-21 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |