JPS62145803A - Manufacture of thin film thermistor - Google Patents

Manufacture of thin film thermistor

Info

Publication number
JPS62145803A
JPS62145803A JP28844285A JP28844285A JPS62145803A JP S62145803 A JPS62145803 A JP S62145803A JP 28844285 A JP28844285 A JP 28844285A JP 28844285 A JP28844285 A JP 28844285A JP S62145803 A JPS62145803 A JP S62145803A
Authority
JP
Japan
Prior art keywords
thin film
film thermistor
binder
silver solder
powder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP28844285A
Other languages
Japanese (ja)
Other versions
JPH0553042B2 (en
Inventor
祐 福田
彪 長井
修治 伊藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP28844285A priority Critical patent/JPS62145803A/en
Publication of JPS62145803A publication Critical patent/JPS62145803A/en
Publication of JPH0553042B2 publication Critical patent/JPH0553042B2/ja
Granted legal-status Critical Current

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  • Thermistors And Varistors (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 産業上の利用分野 本発明は温度を検出すべき対象物と機械的に接触して温
度を検出するサーミスタ、例えば、鍋物調理をする際鍋
底を通して鍋内部の調理物の温度を検出するサーミスタ
の製造方法に関するものである。
DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to a thermistor that detects temperature by mechanically contacting an object whose temperature is to be detected. The present invention relates to a method of manufacturing a thermistor that detects temperature.

従来の技術 この種のサーミスタとして高速応答性薄膜サーミスタが
ある。これは、長井、他[第4回センサシンボジクム論
文集JP245〜249 (1984)電気学会電子テ
パイス委員会主催、に報告されている。この高速応答性
薄膜サーミスタは薄膜サーミスタ素子全ステンレス鋼よ
りなる感熱金属容器にろう付して構成され、このろう付
は次のようにしてなされる。
2. Description of the Related Art This type of thermistor includes a fast-response thin film thermistor. This was reported in Nagai et al. [4th Sensor Symbodies Proceedings JP 245-249 (1984) sponsored by the Electronic Tepais Committee of the Institute of Electrical Engineers of Japan. This fast-response thin-film thermistor is constructed by brazing a thin-film thermistor element to a heat-sensitive metal container made entirely of stainless steel, and this brazing is accomplished as follows.

薄膜サーミスタ素子と感熱金属容器との間に、共晶銀ろ
う箔でサンドイッチされたチタン箔を配置したのち、こ
れらを真空中で約820℃に加熱3へ−7 する過程を経て前記薄膜サーミスタ素子と感熱金属容器
はろう付される。
After placing a titanium foil sandwiched with eutectic silver solder foil between the thin film thermistor element and the heat-sensitive metal container, the thin film thermistor element is heated to approximately 820°C in vacuum. and heat-sensitive metal containers are brazed.

発明が解決しようとする問題点 上記ろう付において、共晶銀ろう箔でサンドイッチされ
たチタン箔は熔接により作成されたものを用いているが
、この方法ではサンドインチ箔の作成所要時間全糸く必
要とし、価格が高くなるという問題があった。
Problems to be Solved by the Invention In the above-mentioned brazing, the titanium foil sandwiched with the eutectic silver brazing foil is made by welding, but with this method, the time required to make the sandwiched foil is completely reduced. There was a problem in that the cost was high.

これは、真空中で加熱の際、多量の蒸気を発生する有機
系接着剤を共晶銀ろう箔とチタン箔の接着に利用できな
いことや、この両者を冷間または熱間圧接したクラツド
材自身も工業的に多く利用されていないことにある。
This is due to the fact that organic adhesives, which generate a large amount of vapor when heated in a vacuum, cannot be used to bond eutectic silver solder foil and titanium foil, and the clad material itself, which is made by cold or hot welding the two together. The reason is that it is not widely used industrially.

また、前述の熔接によるサンドイッチ箔はこれを構成す
る共晶銀ろう箔とチタン箔の位置ずれが生じやすく、ろ
う行状態が悪くなり、接着性が損なわれるという問題が
あった。
Furthermore, the aforementioned sandwich foil formed by welding has a problem in that the eutectic silver solder foil and the titanium foil constituting the sandwich foil tend to be misaligned, resulting in poor soldering conditions and impaired adhesion.

本発明は、ろう材として共晶銀ろう粉末とチタン粉末と
バインダーを含む印刷膜を用いることにより、前述の問
題点全解消した薄膜サーミスタの製造方法を提供するも
のである。
The present invention provides a method for manufacturing a thin film thermistor that eliminates all of the above-mentioned problems by using a printed film containing eutectic silver solder powder, titanium powder, and a binder as a brazing material.

問題点を解決するための手段 前記問題点を解決するための本発明の技術的手段は、薄
膜サーミスタ素子の平板状絶縁性基板の一方の表面に、
共晶銀ろう粉末とチタン粉末とバインダーよりなる印刷
膜を形成し、さらにこの印刷膜の上に感熱金属容器を配
置した後、真空中で加熱する点にある。
Means for Solving the Problems The technical means of the present invention for solving the problems described above is that on one surface of the flat insulating substrate of the thin film thermistor element,
A printed film made of eutectic silver solder powder, titanium powder, and a binder is formed, and a heat-sensitive metal container is placed on top of the printed film, followed by heating in a vacuum.

作  用 本発明は、上述したように、薄膜サーミスタ素子の平板
状絶縁基板の一方の表面に共晶銀ろう粉末とチタン粉末
とバインダーよりなる印刷膜が形成される構成となるの
で、従来のように、共晶銀ろう箔とチタン箔とを熔接す
る必要がない。また、印刷法を用いることにより印刷膜
中の共晶銀ろうとチタンは一体化されるので従来の共晶
銀ろう箔とチタン箔の熔接のように両者の位置ずれが生
じることはない。
Function As described above, the present invention has a configuration in which a printed film made of eutectic silver solder powder, titanium powder, and binder is formed on one surface of the flat insulating substrate of the thin film thermistor element, so that it is not necessary to use the conventional method. Moreover, there is no need to weld the eutectic silver solder foil and the titanium foil. Further, by using the printing method, the eutectic silver solder and titanium in the printed film are integrated, so there is no misalignment between the two, unlike in conventional welding of eutectic silver solder foil and titanium foil.

実施例 以下、本発明の一実施例を添付図面にもとづい5へ一7
゛ て説明する。
EXAMPLE Hereinafter, an example of the present invention will be described based on the attached drawings.
Let me explain.

第1図は、本発明の薄膜サーミスタの概略断面図であり
、真空加熱によるろう付前の状態を示す。
FIG. 1 is a schematic cross-sectional view of the thin film thermistor of the present invention, showing the state before brazing by vacuum heating.

1はアルミナなどの平板状絶縁性基板で、この一方の表
面に金属酸化物、炭化ケイ素などの感温抵抗体膜2と一
対の金−白金などの電極膜3を形成することにより、薄
膜サーミスタ素子が構成される。一方、平板状絶縁性基
板1の他の表面には、共晶銀ろう粉末4aとチタン粉末
4bとバインダーの混合物による印刷膜4が形成される
。この印刷膜4は一例として粒径が約10μmの共晶銀
ろう粉末30重量部、粒径が約70μmのチタン粉末1
重量部、エチルセルロースとカルピトールよりなるバイ
ンダー15重量部を混合分散により得うレるペース+−
i用い、これ全スクリーン印刷上た後、乾燥・焼成によ
って得られる。
1 is a flat insulating substrate made of alumina or the like, and by forming a temperature sensitive resistor film 2 made of metal oxide, silicon carbide, etc. and a pair of electrode films 3 made of gold-platinum etc. on one surface of the substrate, a thin film thermistor is formed. The element is configured. On the other hand, on the other surface of the flat insulating substrate 1, a printed film 4 made of a mixture of eutectic silver solder powder 4a, titanium powder 4b, and a binder is formed. This printed film 4 includes, for example, 30 parts by weight of eutectic silver solder powder with a particle size of about 10 μm and 1 part of titanium powder with a particle size of about 70 μm.
A paste +- obtained by mixing and dispersing 15 parts by weight of a binder consisting of ethyl cellulose and calpitol.
It is obtained by screen printing, drying and firing.

さらに、感電金属容器5の上に、印刷膜4が接触するよ
うに前記薄膜サーミスタ素子を配置した後、104To
rr以下の真空中で約800〜850°Cに加熱するこ
とにより、印刷膜4が溶融6ページ し、感熱金属容器5と前記薄膜サーミスタ素子が接着(
ろう付)される。
Furthermore, after arranging the thin film thermistor element on top of the electric shock metal container 5 so that the printed film 4 is in contact with it, 104To
By heating to about 800 to 850°C in a vacuum below rr, the printed film 4 is melted and the heat-sensitive metal container 5 and the thin film thermistor element are bonded (
brazing).

このようにして製造された薄膜サーミスタは、従来例と
同様の高速応答性を有するとともに、(400℃)−水
冷の繰返し試験を1000サイクル実施しても接着性は
損なわれず、優れた耐熱衝撃性が得られ、実用に供り得
る性能を有する。
The thin film thermistor manufactured in this way has the same high-speed response as the conventional example, and has excellent thermal shock resistance with no loss of adhesion even after 1000 cycles of (400°C) - water cooling tests. is obtained, and the performance is suitable for practical use.

感熱金属容器5の材料としては。コパール合金、チタン
、クンクル、モリブデン、タングステン、ステンレス鋼
、鉄−ニッケル合金などから選ばれた材料で構成される
ことが望ましい。これは、平板状絶縁性基板1として用
いられるアルミナ、ステアタイト、ムライトなどのセラ
ミックの熱膨張係数と類似の値であるので、ろう付後に
生じる歪が小さくなるためである。
The material for the heat-sensitive metal container 5 is as follows. Preferably, the material is selected from copal alloy, titanium, Kunkle, molybdenum, tungsten, stainless steel, iron-nickel alloy, and the like. This is because the coefficient of thermal expansion is similar to the coefficient of thermal expansion of ceramics such as alumina, steatite, and mullite used as the flat insulating substrate 1, so that the strain that occurs after brazing is reduced.

また、共晶銀ろう粉末とチタン粉末の粒径は、70μm
以下であることが望ましい。これは、スクリーン印刷す
る場合、200メツシュ以上のスクリーンが好’EL<
、このメツシュの開孔部の大きさが約74μmであるこ
とによる。
In addition, the particle size of the eutectic silver solder powder and titanium powder is 70 μm.
The following is desirable. When screen printing, a screen with a mesh size of 200 or more is preferable.
This is because the size of the openings in this mesh is approximately 74 μm.

7 へ− 次に、本発明の他の実施例を第2図を用いて説明する。Go to 7- Next, another embodiment of the present invention will be described using FIG. 2.

第2図において前記実施例と相違する点は、印刷膜4の
構成にある。すなわち、平板状絶縁性基板1の他方の表
面に、共晶銀ろう粉末4aとバインダーよりなる層、チ
タン粉末4bとバインダーよりなる層、さらに共晶銀ろ
う粉末4aとバインダーよりなる層をスクリーン印刷に
よりMi4次積層して印刷膜4が形成される。
The difference in FIG. 2 from the previous embodiment lies in the structure of the printed film 4. In FIG. That is, on the other surface of the flat insulating substrate 1, a layer consisting of eutectic silver solder powder 4a and a binder, a layer consisting of titanium powder 4b and a binder, and a further layer consisting of eutectic silver solder powder 4a and a binder are screen printed. The printed film 4 is formed by four-dimensionally stacking Mi.

これを前記実施例と同様に真空中で加熱処理により、薄
膜ブーミスタ素子と感熱金属容器5全ろう付して得られ
た薄膜サーミスタも前記実施例の上方と同等の性能が得
られた。
The thin film thermistor obtained by heating the thin film boomister element and the heat-sensitive metal container 5 in the same way as in the above example by brazing the entire thin film boomister element in a vacuum also had the same performance as that of the above example.

薄膜サーミスタ素子を構成する平板状絶縁性基板と感熱
金属容器が強固にろう付されるのは真空加熱処理の過程
でチタン原子がチタン粉末〃・らアルミナなどの平板状
絶縁性基板表面に向かって速やかに拡散し、平板状絶縁
性基板表面に吸着びれることによる。
The reason why the flat insulating substrate and the heat-sensitive metal container that make up the thin film thermistor element are firmly brazed is that during the vacuum heat treatment process, titanium atoms move toward the surface of the flat insulating substrate made of titanium powder, alumina, etc. This is due to rapid diffusion and adsorption to the surface of the flat insulating substrate.

事実、共晶銀ろう粉末のみでろう付を試みたところ、平
板状絶縁性基板と感熱金属容器は簡単にはずれ、ろう付
されないことが確認された。
In fact, when brazing was attempted using only eutectic silver solder powder, it was confirmed that the flat insulating substrate and the heat-sensitive metal container were easily separated and could not be brazed.

なお、本発明において、印刷膜は、平板状絶縁性基板の
表面に形成しているが、これに限定されるものでなく、
感熱金属容器の表面に形成しても差し支えない。
In the present invention, the printed film is formed on the surface of the flat insulating substrate, but is not limited to this.
It may be formed on the surface of a heat-sensitive metal container.

発明の効果 以上のように本発明によれば次の効果を得ることができ
る。
Effects of the Invention As described above, according to the present invention, the following effects can be obtained.

(1)  ろう材である共晶銀ろう粉末とチタン粉末が
直接、平板状絶縁性基板表面にスクリーン印刷により印
刷膜として形成されるので従来のように共晶銀ろう箔と
チタン箔を溶接する必要がない。
(1) The eutectic silver solder powder and titanium powder, which are the brazing materials, are directly formed as a printed film on the surface of the flat insulating substrate by screen printing, so the eutectic silver solder foil and titanium foil can be welded as in the conventional method. There's no need.

(2)印刷膜はスクリーン印刷法で形成されるので、従
来のような共晶銀ろう箔とチタン箔の位置ずれの問題は
無くなり、これが原因で起こるろう行不良全防止できる
(2) Since the printed film is formed by screen printing, the conventional problem of misalignment between the eutectic silver solder foil and the titanium foil is eliminated, and defects in soldering caused by this can be completely prevented.

(3)従来の薄膜ブーミスタと同等の高速応答性および
耐熱衝撃性を有しており、実用性が高い0
(3) Has high-speed response and thermal shock resistance equivalent to conventional thin-film boomisters, making it highly practical.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の一実施例を示す薄膜ブーミス9へ−7 タの断面図、第2図は同他の実施例における断面図であ
る。 1・・・・・・平板状絶縁性基板、4・・・・・・印刷
膜、4a・・・・・・共晶銀ろう粉末、4b・・・・・
チタン粉末、5・・・・感熱金属容器。 代理人の氏名 弁理士 中 尾 敏 男 ほか1名第2
FIG. 1 is a sectional view of a thin film boom 9 to 7 showing one embodiment of the present invention, and FIG. 2 is a sectional view of another embodiment of the same. 1... Flat insulating substrate, 4... Printed film, 4a... Eutectic silver solder powder, 4b...
Titanium powder, 5... Heat-sensitive metal container. Name of agent: Patent attorney Toshio Nakao and 1 other person 2nd
figure

Claims (3)

【特許請求の範囲】[Claims] (1)平板状絶縁性基板の一方の表面に形成された感温
抵抗体膜と一対の電極膜とから成る薄膜サーミスタ素子
の前記平板状絶縁性基板の他方の表面に、金属粉末とバ
インダーよりなる印刷膜を形成し、さらに、前記印刷膜
の上に前記薄膜サーミスタ素子を固定する感熱金属容器
を配置した後、真空中で800〜850℃に加熱し、前
記薄膜サーミスタ素子と前記感熱金属容器をろう付した
薄膜サーミスタの製造方法。
(1) A thin film thermistor element consisting of a temperature-sensitive resistor film and a pair of electrode films formed on one surface of a flat insulating substrate is coated with metal powder and a binder on the other surface of the flat insulating substrate. A heat-sensitive metal container for fixing the thin-film thermistor element is placed on top of the printed film, and then heated to 800 to 850°C in a vacuum to remove the thin-film thermistor element and the heat-sensitive metal container. A method for manufacturing a thin film thermistor with brazed.
(2)印刷膜が共晶銀ろう粉末とチタン粉末とバインダ
ーの混合物の層よりなる特許請求の範囲第1項記載の薄
膜サーミスタの製造方法。
(2) The method for manufacturing a thin film thermistor according to claim 1, wherein the printed film is a layer of a mixture of eutectic silver solder powder, titanium powder, and binder.
(3)印刷膜が共晶銀ろう粉末とバインダーよりなる層
、チタン粉末とバインダーよりなる層、共晶銀ろう粉末
とバインダーよりなる層を順次積層した特許請求の範囲
第1項記載の薄膜サーミスタの製造方法。
(3) The thin film thermistor according to claim 1, wherein the printed film is a layer made of a eutectic silver solder powder and a binder, a layer made of a titanium powder and a binder, and a layer made of a eutectic silver solder powder and a binder. manufacturing method.
JP28844285A 1985-12-20 1985-12-20 Manufacture of thin film thermistor Granted JPS62145803A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP28844285A JPS62145803A (en) 1985-12-20 1985-12-20 Manufacture of thin film thermistor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP28844285A JPS62145803A (en) 1985-12-20 1985-12-20 Manufacture of thin film thermistor

Publications (2)

Publication Number Publication Date
JPS62145803A true JPS62145803A (en) 1987-06-29
JPH0553042B2 JPH0553042B2 (en) 1993-08-09

Family

ID=17730263

Family Applications (1)

Application Number Title Priority Date Filing Date
JP28844285A Granted JPS62145803A (en) 1985-12-20 1985-12-20 Manufacture of thin film thermistor

Country Status (1)

Country Link
JP (1) JPS62145803A (en)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5497766A (en) * 1978-01-19 1979-08-02 Matsushita Electric Ind Co Ltd Thermistor
JPS60130495A (en) * 1983-12-17 1985-07-11 Toshiba Chem Corp Conductive paste
JPS60179619A (en) * 1984-02-28 1985-09-13 Matsushita Electric Ind Co Ltd Thin film thermistor

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5497766A (en) * 1978-01-19 1979-08-02 Matsushita Electric Ind Co Ltd Thermistor
JPS60130495A (en) * 1983-12-17 1985-07-11 Toshiba Chem Corp Conductive paste
JPS60179619A (en) * 1984-02-28 1985-09-13 Matsushita Electric Ind Co Ltd Thin film thermistor

Also Published As

Publication number Publication date
JPH0553042B2 (en) 1993-08-09

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